title: Electronic structure and stability of fluorophore-nitroxide radicals from ultrahigh vacuum to air exposure.
abstract: Thin film processes of organic radicals remain widely unknown, although these materials may have a significant technological potential. In aiming at their use in applications, we explore the electronic structure of thin films of a nitronyl nitroxide radical attached to a fluorophore core. According to our findings, this molecule maintains its radical function and, consequently, its sensing capabilities in the thin films. The films are characterized by a high structural degree of the molecular arrangement, coupled to strong vacuum and air stability that make this fluorophore-nitroxide radical an extremely promising candidate for application in electronics. Our work also identifies a quantitative correlation between the results obtained by the simultaneous use of X-ray photoemission and electron paramagnetic resonance spectroscopy. This result can be used as a standard diagnostic tool in order to link the (in situ-measured) electronic structure with classical ex situ paramagnetic investigations.
authors.affiliation: Institute of Physical and Theoretical Chemistry, University of Tübingen , Auf der Morgenstelle 18, D-72076 Tübingen, Germany.
authors.forename: R
authors.initials: R
authors.lastname: Kakavandi
authors.forename: P
authors.initials: P
authors.lastname: Ravat
authors.forename: S-A
authors.initials: SA
authors.lastname: Savu
authors.forename: Y B
authors.initials: YB
authors.lastname: Borozdina
authors.forename: M
authors.initials: M
authors.lastname: Baumgarten
authors.forename: M B
authors.initials: MB
authors.lastname: Casu
keywords: X-ray photoelectron spectroscopy; electron paramagnetic resonance spectroscopy; magnetism; nitronyl nitroxides; organic paramagnets on surfaces; thin film growth