title: Inverse metal-assisted chemical etching produces smooth high aspect ratio InP nanostructures.
abstract: Creating high aspect ratio (AR) nanostructures by top-down fabrication without surface damage remains challenging for III-V semiconductors. Here, we demonstrate uniform, array-based InP nanostructures with lateral dimensions as small as sub-20 nm and AR > 35 using inverse metal-assisted chemical etching (I-MacEtch) in hydrogen peroxide (H2O2) and sulfuric acid (H2SO4), a purely solution-based yet anisotropic etching method. The mechanism of I-MacEtch, in contrast to regular MacEtch, is explored through surface characterization. Unique to I-MacEtch, the sidewall etching profile is remarkably smooth, independent of metal pattern edge roughness. The capability of this simple method to create various InP nanostructures, including high AR fins, can potentially enable the aggressive scaling of InP based transistors and optoelectronic devices with better performance and at lower cost than conventional etching methods.
authors.affiliation: Department of Electrical and Computer Engineering, Micro and Nanotechnology Laboratory, University of Illinois at Urbana-Champaign , Urbana, Illinois 61801, United States.
authors.forename: Seung Hyun
authors.initials: SH
authors.lastname: Kim
authors.forename: Parsian K
authors.initials: PK
authors.lastname: Mohseni
authors.forename: Yi
authors.initials: Y
authors.lastname: Song
authors.forename: Tatsumi
authors.initials: T
authors.lastname: Ishihara
authors.forename: Xiuling
authors.initials: X
authors.lastname: Li
keywords: I-MacEtch; InP; MACE; MacEtch; finFET; inverse MacEtch; metal-assisted chemical etching; nanowires