title: Fractional Talbot lithography with extreme ultraviolet light.
abstract: Fractional Talbot effect leads to the possibility to implement patterning of structures with smaller periods than the master mask. This is particularly attractive when using short wavelength illumination in the extreme ultraviolet because of attainable resolution in the sub-100-nm range. In this Letter, we demonstrate the Talbot lithography with the fractional Talbot effect under coherent illumination generated with a capillary discharge Ne-like Ar extreme ultraviolet laser. Various spatial frequency multiplications up to 5x are achieved using a parent grating. This technique allows a fabrication of nanostructures with high-resolution patterns, which is of high interest in many applications such as the manufacturing of plasmonic surfaces and photonic devices.
authors.forename: Hyun-su
authors.initials: HS
authors.lastname: Kim
authors.forename: Wei
authors.initials: W
authors.lastname: Li
authors.forename: Serhiy
authors.initials: S
authors.lastname: Danylyuk
authors.forename: William S
authors.initials: WS
authors.lastname: Brocklesby
authors.forename: Mario C
authors.initials: MC
authors.lastname: Marconi
authors.forename: Larissa
authors.initials: L
authors.lastname: Juschkin