title: In situ synchrotron X-ray diffraction analysis of deformation behaviour in Ti-Ni-based thin films.
abstract: Deformation mechanisms of as-deposited and post-annealed Ti50.2Ni49.6, Ti50.3Ni46.2Cu3.5 and Ti48.5Ni40.8Cu7.5 thin films were investigated using the in situ synchrotron X-ray diffraction technique. Results showed that initial crystalline phases determined the deformation mechanisms of all the films during tensile loading. For the films dominated by monoclinic martensites (B19'), tensile stress induced the detwinning of 〈011〉 type-II twins and resulted in the preferred orientations of (002)B19' parallel to the loading direction (∥ LD) and (020)B19' perpendicular to the LD (⊥ LD). For the films dominated by austenite (B2), the austenite directly transformed into martensitic variants (B19') with preferred orientations of (002)B19' ∥ LD and (020)B19' ⊥ LD. For the Ti50.3Ni46.2Cu3.5 and Ti48.1Ni40.8Cu7.5 films, martensitic transformation temperatures decreased apparently after post-annealing because of the large thermal stress generated in the films due to the large differences in thermal expansion coefficients between the film and substrate.
authors.affiliation: Institute of Nuclear Physics and Chemistry, Mianyang 621900, People's Republic of China.
authors.forename: Hong
authors.initials: H
authors.lastname: Wang
authors.affiliation: Institute of Nuclear Physics and Chemistry, Mianyang 621900, People's Republic of China.
authors.forename: Guangai
authors.initials: G
authors.lastname: Sun
authors.affiliation: Institute of Nuclear Physics and Chemistry, Mianyang 621900, People's Republic of China.
authors.forename: Xiaolin
authors.initials: X
authors.lastname: Wang
authors.affiliation: Institute of Nuclear Physics and Chemistry, Mianyang 621900, People's Republic of China.
authors.forename: Bo
authors.initials: B
authors.lastname: Chen
authors.affiliation: Department of Applied Physics, University of Electronic Science and Technology of China, Chengdu 610054, People's Republic of China.
authors.forename: Xiaotao
authors.initials: X
authors.lastname: Zu
authors.affiliation: College of Nuclear Science and Technology, University of Science and Technology of China, Hefei 230029, People's Republic of China.
authors.forename: Yanping
authors.initials: Y
authors.lastname: Liu
authors.affiliation: College of Nuclear Science and Technology, University of Science and Technology of China, Hefei 230029, People's Republic of China.
authors.forename: Liangbin
authors.initials: L
authors.lastname: Li
authors.affiliation: National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, People's Republic of China.
authors.forename: Guoqiang
authors.initials: G
authors.lastname: Pan
authors.affiliation: College of Nuclear Science and Technology, University of Science and Technology of China, Hefei 230029, People's Republic of China.
authors.forename: Liusi
authors.initials: L
authors.lastname: Sheng
authors.affiliation: Institute of Nuclear Physics and Chemistry, Mianyang 621900, People's Republic of China.
authors.forename: Yaoguang
authors.initials: Y
authors.lastname: Liu
authors.affiliation: Thin Film Centre, Scottish Universities of Physics Alliance (SUPA), University of the West of Scotland, Paisley PA1 2BE, UK.
authors.forename: Yong Qing
authors.initials: YQ
authors.lastname: Fu
keywords: Ti–Ni; deformation behaviour; detwinning; shape memory; synchrotron X-ray diffraction; thin film