title: Improving yield and performance in ZnO thin-film transistors made using selective area deposition.
abstract: We describe improvements in both yield and performance for thin-film transistors (TFTs) fabricated by spatial atomic layer deposition (SALD). These improvements are shown to be critical in forming high-quality devices using selective area deposition (SAD) as the patterning method. Selective area deposition occurs when the precursors for the deposition are prevented from reacting with some areas of the substrate surface. Controlling individual layer quality and the interfaces between layers is essential for obtaining good-quality thin-film transistors and capacitors. The integrity of the gate insulator layer is particularly critical, and we describe a method for forming a multilayer dielectric using an oxygen plasma treatment between layers that improves crossover yield. We also describe a method to achieve improved mobility at the important interface between the semiconductor and the gate insulator by, conversely, avoiding oxygen plasma treatment. Integration of the best designs results in wide design flexibility, transistors with mobility above 15 cm(2)/(V s), and good yield of circuits.
authors.affiliation: Eastman Kodak Company , Rochester, New York 14650, United States.
authors.forename: Shelby F
authors.initials: SF
authors.lastname: Nelson
authors.forename: Carolyn R
authors.initials: CR
authors.lastname: Ellinger
authors.forename: David H
authors.initials: DH
authors.lastname: Levy
keywords: TFT yield; atomic layer deposition; metal oxide; selective area deposition; spatial ALD; thin-film transistor; zinc oxide