title: Direct nano-scale patterning of Ag films using hard X-ray induced oxidation.
abstract: The morphological change of silver nano-particles (AgNPs) exposed to an intense synchrotron X-ray beam was investigated for the purpose of direct nano-scale patterning of metal thin films. AgNPs irradiated by hard X-rays in oxygen ambient were oxidized and migrated out of the illuminated region. The observed X-ray induced oxidation was utilized to fabricate nano-scale metal line patterns using sectioned WSi2/Si multilayers as masks. Lines with a width as small as 21 nm were successfully fabricated on Ag films on silicon nitride. Au/Ag nano-lines were also fabricated using the proposed method.
authors.affiliation: Department of Physics and Photon Science and School of Materials Science and Engineering, Gwangju Institute of Science and Technology, Gwangju 500-712, Korea.
authors.forename: Jae Myung
authors.initials: JM
authors.lastname: Kim
authors.affiliation: Pohang Light Source, Pohang Accelerator Laboratory, Pohang 790-834, Korea.
authors.forename: Su Yong
authors.initials: SY
authors.lastname: Lee
authors.affiliation: Department of Materials Science and Engineering, Chosun University, Gwangju 501-759, Korea.
authors.forename: Hyon Chol
authors.initials: HC
authors.lastname: Kang
authors.affiliation: Department of Physics and Photon Science and School of Materials Science and Engineering, Gwangju Institute of Science and Technology, Gwangju 500-712, Korea.
authors.forename: Do Young
authors.initials: do Y
authors.lastname: Noh
keywords: Fresnel zone plate; X-ray lithography; hard X-ray focusing