title: A general design strategy for block copolymer directed self-assembly patterning of integrated circuits contact holes using an alphabet approach.
abstract: Directed self-assembly (DSA) is a promising lithography candidate for technology nodes beyond 14 nm. Researchers have shown contact hole patterning for random logic circuits using DSA with small physical templates. This paper introduces an alphabet approach that uses a minimal set of small physical templates to pattern all contacts configurations on integrated circuits. We illustrate, through experiments, a general and scalable template design strategy that links the DSA material properties to the technology node requirements.
authors.affiliation: Department of Electrical Engineering, Stanford University , Stanford, California 94305, United States.
authors.forename: He
authors.initials: H
authors.lastname: Yi
authors.forename: Xin-Yu
authors.initials: XY
authors.lastname: Bao
authors.forename: Richard
authors.initials: R
authors.lastname: Tiberio
authors.forename: H-S Philip
authors.initials: HS
authors.lastname: Wong
keywords: Block copolymer; alphabet approach; contact hole patterning; design strategy; directed self-assembly