title: Fabrication and electrochemical comparison of SIROF-AIROF-EIROF microelectrodes for neural interfaces.
abstract: Iridium oxide has been widely used in neural recording and stimulation due to its good stability and large charge storage capacity (CSC). In general, the iridium oxide film used in the electrophysiological application can be grouped into three principal classifications: sputtering iridium oxide film (SIROF), activated iridium oxide film (AIROF) and electrodeposited iridium oxide film (EIROF). Although these kinds of iridium oxide all can remarkably reduce the impedance and increase the CSC of the microelectrode, they also exhibit markedly differences in electrochemical performances. After activation, the CSC of EIROF is 68.20 mC/cm(2), which is 88.7 % larger than that of the SIROF and 67.6 % larger than that of the AIROF. The impedance at 1 kHz of the three kinds of iridium oxide microelectrode is around 4000 ohm, it is acceptable for the neural interface application. The phase at 1 kHz of the AIROF microelectrode is the largest which is -6.1 degree, about 22.6 % of the SIROF and 44.5 % of the EIROF.
authors.forename: Xiao-Yang
authors.initials: XY
authors.lastname: Kang
authors.forename: Jing-Quan
authors.initials: JQ
authors.lastname: Liu
authors.forename: Hong-Chang
authors.initials: HC
authors.lastname: Tian
authors.forename: Bin
authors.initials: B
authors.lastname: Yang
authors.forename: Yanna
authors.initials: Y
authors.lastname: NuLi
authors.forename: Chun-Sheng
authors.initials: CS
authors.lastname: Yang
mesh_terms: D004595:Electroplating; D058542:Implantable Neurostimulators; D007495:Iridium / Q000737:chemistry*; D008839:Microelectrodes
chemical_list: C044458:iridium oxide; D007495:Iridium