title: Plasma-enhanced atomic layer deposition of nanoscale yttria-stabilized zirconia electrolyte for solid oxide fuel cells with porous substrate.
abstract: Nanoscale yttria-stabilized zirconia (YSZ) electrolyte film was deposited by plasma-enhanced atomic layer deposition (PEALD) on a porous anodic aluminum oxide supporting substrate for solid oxide fuel cells. The minimum thickness of PEALD-YSZ electrolyte required for a consistently high open circuit voltage of 1.17 V at 500 °C is 70 nm, which is much thinner than the reported thickness of 180 nm using nonplasmatic ALD and is also the thinnest attainable value reported in the literatures on a porous supporting substrate. By further reducing the electrolyte thickness, the grain size reduction resulted in high surface grain boundary density at the cathode/electrolyte interface.
authors.affiliation: Graduate School of Convergence Science and Technology, Seoul National University , Iui-dong, Yeongtong-gu, Suwon 443-270, South Korea.
authors.forename: Sanghoon
authors.initials: S
authors.lastname: Ji
authors.forename: Gu Young
authors.initials: GY
authors.lastname: Cho
authors.forename: Wonjong
authors.initials: W
authors.lastname: Yu
authors.forename: Pei-Chen
authors.initials: PC
authors.lastname: Su
authors.forename: Min Hwan
authors.initials: MH
authors.lastname: Lee
authors.forename: Suk Won
authors.initials: SW
authors.lastname: Cha
keywords: anodic aluminum oxide; plasma-enhanced atomic layer deposition; solid oxide fuel cell; thin film; yttria-stabilized zirconia