title: Applications of atomic layer deposition in solar cells.
abstract: Atomic layer deposition (ALD) provides a unique tool for the growth of thin films with excellent conformity and thickness control down to atomic levels. The application of ALD in energy research has received increasing attention in recent years. In this review, the versatility of ALD in solar cells will be discussed. This is specifically focused on the fabrication of nanostructured photoelectrodes, surface passivation, surface sensitization, and band-structure engineering of solar cell materials. Challenges and future directions of ALD in the applications of solar cells are also discussed.
authors.affiliation: School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, 639798, Singapore.
authors.forename: Wenbin
authors.initials: W
authors.lastname: Niu
authors.forename: Xianglin
authors.initials: X
authors.lastname: Li
authors.forename: Siva Krishna
authors.initials: SK
authors.lastname: Karuturi
authors.forename: Derrick Wenhui
authors.initials: DW
authors.lastname: Fam
authors.forename: Hongjin
authors.initials: H
authors.lastname: Fan
authors.forename: Santosh
authors.initials: S
authors.lastname: Shrestha
authors.forename: Lydia Helena
authors.initials: LH
authors.lastname: Wong
authors.forename: Alfred Iing Yoong
authors.initials: AI
authors.lastname: Tok