title: Advances in lithography: introduction to the feature.
abstract: Optical projection lithography has been the key technology for the ongoing miniaturization in semiconductor devices over the past 40 years. This issue features original research covering mask and image modeling methods and computational techniques for various inverse problems in advanced lithography, including source and mask optimization, wavefront retrieval, and design of Fresnel lenses.
authors.forename: Andreas
authors.initials: A
authors.lastname: Erdmann
authors.forename: Rongguang
authors.initials: R
authors.lastname: Liang
authors.forename: Apo
authors.initials: A
authors.lastname: Sezginer
authors.forename: Bruce
authors.initials: B
authors.lastname: Smith