title: Multiphoton microscopy as a detection tool for photobleaching of EO materials.
abstract: Multi-photon microscopy operating at 1550 nm is employed as a rapid characterization tool for studying the photostability of three well-known electro-optical materials. Different nonlinear optical responses such as multi-photon excitation fluoresence, second-, and third-harmonic generation can be used as detection probes to reveal the degradation mechanisms. This technique is rapid, accurate, and can be used to study the photostability of a broad range of materials.
authors.forename: Shiva
authors.initials: S
authors.lastname: Shahin
authors.forename: Soroush
authors.initials: S
authors.lastname: Mehravar
authors.forename: Palash
authors.initials: P
authors.lastname: Gangopadhyay
authors.forename: Nasser
authors.initials: N
authors.lastname: Peyghambarian
authors.forename: Robert A
authors.initials: RA
authors.lastname: Norwood
authors.forename: Khanh
authors.initials: K
authors.lastname: Kieu