title: Quantitative analysis and optimization of gravure printed metal ink, dielectric, and organic semiconductor films.
abstract: Here we demonstrate the optimization of gravure printed metal ink, dielectric, and semiconductor formulations. We present a technique for nondestructively imaging printed films using a commercially available flatbed scanner, combined with image analysis to quantify print behavior. Print speed, cliché screen density, nip pressure, the orientation of print structures, and doctor blade extension were found to have a significant impact on the quality of printed films, as characterized by the spreading of printed structures and variation in print homogeneity. Organic semiconductor prints were observed to exhibit multiple periodic modulations, which are correlated to the underlying cell structure.
authors: Department of Physics and Centre for Plastic Electronics and ‡Department of Chemistry, Imperial College London, South Kensington Campus , London SW7 2AZ, United Kingdom.
authors: Stuart G
authors: SG
authors: Higgins
authors: Francesca L
authors: FL
authors: Boughey
authors: Russell
authors: R
authors: Hills
authors: Joachim H G
authors: JH
authors: Steinke
authors: Beinn V O
authors: BV
authors: Muir
authors: Alasdair J
authors: AJ
authors: Campbell
keywords: Fourier transform; gravure printing; image analysis; nanoparticle metal ink; optical scanning; organic semiconductor; plastic electronics; structure−property relationship