title: Note: A stand on the basis of atomic force microscope to study substrates for imaging optics.
abstract: A description of a stand based on atomic force microscopy (AFM) for roughness measurements of large optical components with arbitrary surfaces is given. The sample under study is mounted on a uniaxial goniometer which allows the sample to be tilted in the range of ±30°. The inclination enables the local normal along the axis of the probe to be established at any point of the surface under study. A comparison of the results of the measurement of noise and roughness of a flat quartz sample, in the range of spatial frequencies 0.025-70 μm(-1), obtained from "standard" AFM and developed versions is given. Within the experimental error, the measurement results were equivalent. Examples of applications of the stand for the study of substrates for X-ray optics are presented.
authors: Department of Multilayer Optics, Institute for Physics of Microstructures of the Russian Academy of Sciences, GSP-105, 603950 Nizhny Novgorod, Russia.
authors: N I
authors: NI
authors: Chkhalo
authors: Department of Multilayer Optics, Institute for Physics of Microstructures of the Russian Academy of Sciences, GSP-105, 603950 Nizhny Novgorod, Russia.
authors: N N
authors: NN
authors: Salashchenko
authors: Department of Multilayer Optics, Institute for Physics of Microstructures of the Russian Academy of Sciences, GSP-105, 603950 Nizhny Novgorod, Russia.
authors: M V
authors: MV
authors: Zorina