title: Highly-ordered silicon inverted nanocone arrays with broadband light antireflectance.
abstract: In this work, highly-ordered silicon inverted nanocone arrays are fabricated by integration of nanosphere lithography with reactive ion etching (RIE) method. The optical characteristics of as-prepared Si inverted nanocone arrays are investigated both by experiments and simulations. It is found that the Si nanocone arrays present excellent broadband light antireflectance properties, which are attributed to the gradient in the effective refractive index of nanocones and enhanced light trapping owing to optical diffraction. The inverted Si nanocone arrays might find a variety of applications in solar cells and photodetectors.
authors: Department of Physics, Shanghai Normal University, No.100 Guilin Road, Shanghai, 200234 PR China.
authors: Dong
authors: D
authors: Zhang
authors: Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology and School of Physics Science and Engineering, Tongji University, 1239 Siping Road, Shanghai, 200092 PR China.
authors: Weina
authors: W
authors: Ren
authors: Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology and School of Physics Science and Engineering, Tongji University, 1239 Siping Road, Shanghai, 200092 PR China.
authors: Zhichao
authors: Z
authors: Zhu
authors: Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology and School of Physics Science and Engineering, Tongji University, 1239 Siping Road, Shanghai, 200092 PR China.
authors: Haifeng
authors: H
authors: Zhang
authors: Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology and School of Physics Science and Engineering, Tongji University, 1239 Siping Road, Shanghai, 200092 PR China.
authors: Bo
authors: B
authors: Liu
authors: Department of Physics, Shanghai Normal University, No.100 Guilin Road, Shanghai, 200234 PR China.
authors: Wangzhou
authors: W
authors: Shi
authors: Department of Physics, Shanghai Normal University, No.100 Guilin Road, Shanghai, 200234 PR China.
authors: Xiaomei
authors: X
authors: Qin
authors: Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology and School of Physics Science and Engineering, Tongji University, 1239 Siping Road, Shanghai, 200092 PR China.
authors: Chuanwei
authors: C
authors: Cheng
keywords: Antireflection; Inverted nanocone arrays; Nanosphere lithography; Si
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