title: Nucleation control for large, single crystalline domains of monolayer hexagonal boron nitride via Si-doped Fe catalysts.
abstract: The scalable chemical vapor deposition of monolayer hexagonal boron nitride (h-BN) single crystals, with lateral dimensions of ∼0.3 mm, and of continuous h-BN monolayer films with large domain sizes (>25 μm) is demonstrated via an admixture of Si to Fe catalyst films. A simple thin-film Fe/SiO2/Si catalyst system is used to show that controlled Si diffusion into the Fe catalyst allows exclusive nucleation of monolayer h-BN with very low nucleation densities upon exposure to undiluted borazine. Our systematic in situ and ex situ characterization of this catalyst system establishes a basis for further rational catalyst design for compound 2D materials.
authors: Department of Engineering, University of Cambridge , JJ Thomson Avenue, CB3 0FA, Cambridge, United Kingdom.
authors: Sabina
authors: S
authors: Caneva
authors: Robert S
authors: RS
authors: Weatherup
authors: Bernhard C
authors: BC
authors: Bayer
authors: Barry
authors: B
authors: Brennan
authors: Steve J
authors: SJ
authors: Spencer
authors: Ken
authors: K
authors: Mingard
authors: Andrea
authors: A
authors: Cabrero-Vilatela
authors: Carsten
authors: C
authors: Baehtz
authors: Andrew J
authors: AJ
authors: Pollard
authors: Stephan
authors: S
authors: Hofmann
keywords: Fe catalyst; Hexagonal boron nitride (h-BN); borazine (HBNH)3; chemical vapor deposition (CVD); in situ X-ray diffraction (XRD); secondary ion mass spectrometry (SIMS)