title: Nonylphenols degradation in the UV, UV/H₂O₂, O₃and UV/O₃processes - comparison of the methods and kinetic study.
abstract: This paper describes the results of experiments on the decomposition of selected nonylphenols (NPs) in aqueous solutions using the UV, UV/H₂O₂, O₃and UV/O₃processes. The goal of the research was to determine the kinetic parameters of the above-mentioned processes, and to estimate their effectiveness. These substances were selected because of their ubiquitous occurrence in the aquatic environment, resistance to biodegradation and environmental significance. As a result of the experiments, the quantum yields of the 4-n-nonylphenol (4NP) and NP (technical mixture) photodegradation in aqueous solution were calculated to be 0.15 and 0.17, respectively. The values of the second-order rate constants of the investigated compounds with hydroxyl radical and NP with ozone were also determined. The estimated second-order rate constants of 4NP and NP with hydroxyl radicals were equal to 7.6 × 10⁸-1.3 × 10⁹ mol⁻¹ L s⁻¹. For NP, the determined rate constant with ozone was equal to 2.01 × 10⁶ mol⁻¹ L s⁻¹. The performed experiments showed that NP was slightly more susceptible to degradation by the UV radiation and hydroxyl radicals than 4NP. The study demonstrated also that the polychromatic UV-light alone and also in combination with selected oxidizers (i.e. hydrogen peroxide, ozone) may be successfully used for the removal of selected NPs from the aqueous medium.
authors.affiliation: Environmental Biotechnology Department, Silesian University of Technology, ul. Akademicka 2, 44100 Gliwice, Poland and Centre for Biotechnology, Silesian University of Technology, ul. B. Krzywoustego 8, 44100 Gliwice, Poland E-mail: ewa.felis@polsl.pl.
authors.forename: E
authors.initials: E
authors.lastname: Felis
authors.affiliation: Environmental Biotechnology Department, Silesian University of Technology, ul. Akademicka 2, 44100 Gliwice, Poland and Centre for Biotechnology, Silesian University of Technology, ul. B. Krzywoustego 8, 44100 Gliwice, Poland E-mail: ewa.felis@polsl.pl.
authors.forename: K
authors.initials: K
authors.lastname: Miksch
mesh_terms: D006861:Hydrogen Peroxide / Q000737:chemistry*; D017665:Hydroxyl Radical; D007700:Kinetics; D010084:Oxidation-Reduction; D010126:Ozone; D010636:Phenols / Q000737:chemistry*; D010782:Photolysis; D014466:Ultraviolet Rays
chemical_list: D010636:Phenols; D017665:Hydroxyl Radical; D010126:Ozone; D006861:Hydrogen Peroxide; C041594:4-nonylphenol