title: Photodegradation of sulfonamide antimicrobial compounds (sulfadiazine, sulfamethizole, sulfamethoxazole and sulfathiazole) in various UV/oxidant systems.
abstract: This study used Na₂S₂O₈, NaBrO8 and H₂O₂to degrade sulfadiazine (SDZ), sulfamethizole (SFZ), sulfamethoxazole (SMX) and sulfathiazole (STZ) under ultraviolet (UV) irradiation. The initial concentration of sulfonamide and oxidant in all experiments was 20 mg/L and 5 mM, respectively. The degradation rate for sulfonamides satisfies pseudo-first-order kinetics in all UV/oxidant systems. The highest degradation rate for SDZ, SFZ, SMX and STZ was in the UV/Na₂S₂O₈, UV/NaBrO₃, UV/Na₂S₂O₈ and UV/H₂O₂ system, respectively. In the UV/Na₂S₂O₈ system, the photodegradation rate of SDZ, SFZ, SMX and STZ was 0.0245 min⁻¹, 0.0096 min⁻¹, 0.0283 min⁻¹ and 0.0141 min⁻¹, respectively; moreover, for the total organic carbon removal rate for SDZ, SFZ, SMX and STZ it was 0.0057 min⁻¹, 0.0081 min⁻¹, 0.0130 min⁻¹ and 0.0106 min⁻¹, respectively. Experimental results indicate that the ability of oxidants to degrade sulfonamide varied with pollutant type. Moreover, UV/Na₂S₂O₈ had the highest mineralization rate for all tested sulfonamides.
authors.affiliation: Department of Chemical and Materials Engineering, National Kaohsiung University of Applied Sciences, 415 Chien Kung Road, Kaohsiung 807, Taiwan E-mail: wuch@kuas.edu.tw.
authors.forename: J T
authors.initials: JT
authors.lastname: Wu
authors.affiliation: Department of Chemical and Materials Engineering, National Kaohsiung University of Applied Sciences, 415 Chien Kung Road, Kaohsiung 807, Taiwan E-mail: wuch@kuas.edu.tw.
authors.forename: C H
authors.initials: CH
authors.lastname: Wu
authors.affiliation: Department of Chemical and Materials Engineering, National Kaohsiung University of Applied Sciences, 415 Chien Kung Road, Kaohsiung 807, Taiwan E-mail: wuch@kuas.edu.tw.
authors.forename: C Y
authors.initials: CY
authors.lastname: Liu
authors.affiliation: Department of Chemical and Materials Engineering, National Kaohsiung University of Applied Sciences, 415 Chien Kung Road, Kaohsiung 807, Taiwan E-mail: wuch@kuas.edu.tw.
authors.forename: W J
authors.initials: WJ
authors.lastname: Huang
mesh_terms: D000900:Anti-Bacterial Agents / Q000737:chemistry*; D006861:Hydrogen Peroxide / Q000737:chemistry*; D007700:Kinetics; D015394:Molecular Structure; D016877:Oxidants; D010782:Photolysis; D013411:Sulfadiazine / Q000737:chemistry; D013419:Sulfamethizole / Q000737:chemistry; D013420:Sulfamethoxazole / Q000737:chemistry; D000077589:Sulfathiazole; D013432:Sulfathiazoles / Q000737:chemistry; D014466:Ultraviolet Rays; D014874:Water Pollutants, Chemical / Q000737:chemistry*
chemical_list: D000900:Anti-Bacterial Agents; D016877:Oxidants; D013432:Sulfathiazoles; D014874:Water Pollutants, Chemical; D013411:Sulfadiazine; D013419:Sulfamethizole; D006861:Hydrogen Peroxide; D013420:Sulfamethoxazole; D000077589:Sulfathiazole