title: Maskless milling of diamond by a focused oxygen ion beam.
abstract: Recent advances in focused ion beam technology have enabled high-resolution, maskless nanofabrication using light ions. Studies with light ions to date have, however, focused on milling of materials where sub-surface ion beam damage does not inhibit device performance. Here we report on maskless milling of single crystal diamond using a focused beam of oxygen ions. Material quality is assessed by Raman and luminescence analysis, and reveals that the damage layer generated by oxygen ions can be removed by non-intrusive post-processing methods such as localised electron beam induced chemical etching.
authors.affiliation: School of Physics and Advanced Materials, University of Technology, Sydney, 15 Broadway, Ultimo, New South Wales 2007, Australia.
authors.forename: Aiden A
authors.initials: AA
authors.lastname: Martin
authors.affiliation: FEI Company, 5350 Northeast Dawson Creek Drive, Hillsboro, Oregon 97214-5793, USA.
authors.forename: Steven
authors.initials: S
authors.lastname: Randolph
authors.affiliation: FEI Company, 5350 Northeast Dawson Creek Drive, Hillsboro, Oregon 97214-5793, USA.
authors.forename: Aurelien
authors.initials: A
authors.lastname: Botman
authors.affiliation: School of Physics and Advanced Materials, University of Technology, Sydney, 15 Broadway, Ultimo, New South Wales 2007, Australia.
authors.forename: Milos
authors.initials: M
authors.lastname: Toth
authors.affiliation: School of Physics and Advanced Materials, University of Technology, Sydney, 15 Broadway, Ultimo, New South Wales 2007, Australia.
authors.forename: Igor
authors.initials: I
authors.lastname: Aharonovich