title: Acid-stable peroxoniobophosphate clusters to make patterned films.
abstract: Two new peroxoniobophosphate clusters were isolated as tetramethylammonium (TMA) salts having the stoichiometries: TMA5[HNb4P2O14(O2)4]⋅9 H2O and TMA3[H7Nb6P4O24(O2)6]⋅7 H2O. The former is stable over the pH range: 3<pH<12 and the latter is stable only below pH 3. These two molecules interconvert as a function of solution pH. The [H7Nb6P4O24(O2)6](3-) cluster can be used to fabricate patterned niobium phosphate films by electron-beam lithography after solution deposition.
authors.affiliation: Department of Chemistry, University of California, Davis, One Shields Ave, Davis, CA 95616 (USA), Fax: (+1) 530-752-8995. junghoson@gmail.com.
authors.forename: Jung-Ho
authors.initials: JH
authors.lastname: Son
authors.forename: Deok-Hie
authors.initials: DH
authors.lastname: Park
authors.forename: Douglas A
authors.initials: DA
authors.lastname: Keszler
authors.forename: William H
authors.initials: WH
authors.lastname: Casey
keywords: niobium; peroxides; phosphorus; polyoxometalates; synthesis