title: The stability and surface termination of hexagonal LuFeO3.
abstract: The surface termination and the nominal valence states for hexagonal LuFeO3 thin films grown on Al2O3(0 0 0 1) substrates were characterized by angle resolved x-ray photoemission spectroscopy. The Lu 4f, Fe 2p and O 1s core level spectra indicate that both the surface termination and the nominal valence depend on surface preparation, but the stable surface terminates in a Fe-O layer. This is consistent with the results of density functional calculations which predict that the Fe-O termination of LuFeO3(0 0 0 1) surface is energetically favorable and stable over a broad range of temperatures and oxygen partial pressures when it is reconstructed to eliminate surface polarity.
authors: Department of Physics and Astronomy, Nebraska Center for Materials and Nanoscience, University of Nebraska, Lincoln, NE 68588, USA.
authors: Shi
authors: S
authors: Cao
authors: Tula R
authors: TR
authors: Paudel
authors: Kishan
authors: K
authors: Sinha
authors: Xuanyuan
authors: X
authors: Jiang
authors: Wenbin
authors: W
authors: Wang
authors: Evgeny Y
authors: EY
authors: Tsymbal
authors: Xiaoshan
authors: X
authors: Xu
authors: Peter A
authors: PA
authors: Dowben