title: Ultra-compact and broadband Si photonics polarization rotator by self-alignment process.
abstract: An ultra-simple polarization rotator is demonstrated on SOI platform with self-aligned process to enhance performance repeatability and manufactural yield. The polarization rotation is essentially achieved by the symmetry breaking of a channel waveguide with a single-sided slab. The two-step lithography enabling this structure is fully compatible with the mainstream process flow of Si photonic integration. A polarization conversion efficiency of 93% is obtained at 1560nm in less than 10μm light propagation length. The merit of flat-band operation (> 100nm) by using asymmetric waveguide for polarization rotation is inherited.
authors.forename: Haifeng
authors.initials: H
authors.lastname: Zhou
authors.forename: Chao
authors.initials: C
authors.lastname: Li
authors.forename: Andy Lim
authors.initials: AL
authors.lastname: Eujin
authors.forename: Lianxi
authors.initials: L
authors.lastname: Jia
authors.forename: Mingbin
authors.initials: M
authors.lastname: Yu
authors.forename: Guoqiang
authors.initials: G
authors.lastname: Lo