title: Ultraclean patterned transfer of single-layer graphene by recyclable pressure sensitive adhesive films.
abstract: We report an ultraclean, cost-effective, and easily scalable method of transferring and patterning large-area graphene using pressure sensitive adhesive films (PSAFs) at room temperature. This simple transfer is enabled by the difference in wettability and adhesion energy of graphene with respect to PSAF and a target substrate. The PSAF-transferred graphene is found to be free from residues and shows excellent charge carrier mobility as high as ∼17,700 cm(2)/V·s with less doping compared to the graphene transferred by thermal release tape (TRT) or poly(methyl methacrylate) (PMMA) as well as good uniformity over large areas. In addition, the sheet resistance of graphene transferred by recycled PSAF does not change considerably up to 4 times, which would be advantageous for more cost-effective and environmentally friendly production of large-area graphene films for practical applications.
authors.forename: Sang Jin
authors.initials: SJ
authors.lastname: Kim
authors.forename: Teajun
authors.initials: T
authors.lastname: Choi
authors.forename: Bora
authors.initials: B
authors.lastname: Lee
authors.affiliation: ‡Department of Mechanical Engineering, Columbia University, New York, New York 10027, United States.
authors.forename: Sunwoo
authors.initials: S
authors.lastname: Lee
authors.forename: Kyoungjun
authors.initials: K
authors.lastname: Choi
authors.forename: Jong Bo
authors.initials: JB
authors.lastname: Park
authors.forename: Je Min
authors.initials: JM
authors.lastname: Yoo
authors.forename: Yong Seok
authors.initials: YS
authors.lastname: Choi
authors.affiliation: §SKKU Advanced Institute of Nanotechnology, Sungkyunkwan University, Suwon 440-746, Republic of Korea.
authors.forename: Jaechul
authors.initials: J
authors.lastname: Ryu
authors.affiliation: ∥Department of Physics, Harvard University, Cambridge, Massachusetts 02138, United States.
authors.forename: Philip
authors.initials: P
authors.lastname: Kim
authors.affiliation: ‡Department of Mechanical Engineering, Columbia University, New York, New York 10027, United States.
authors.forename: James
authors.initials: J
authors.lastname: Hone
authors.affiliation: ∥Department of Physics, Harvard University, Cambridge, Massachusetts 02138, United States.
authors.forename: Byung Hee
authors.initials: BH
authors.lastname: Hong
keywords: Clean transfer; adhesion energy; graphene patterning; supporting polymer recycle; surface wetting