title: Sub-micron silicon nitride waveguide fabrication using conventional optical lithography.
abstract: We demonstrate a novel technique to fabricate sub-micron silicon nitride waveguides using conventional contact lithography with MEMS-grade photomasks. Potassium hydroxide anisotropic etching of silicon facilitates line reduction and roughness smoothing and is key to the technique. The fabricated waveguides is measured to have a propagation loss of 0.8dB/cm and nonlinear coefficient of γ = 0.3/W/m. A low anomalous dispersion of <100ps/nm/km is also predicted. This type of waveguide is highly suitable for nonlinear optics. The channels naturally formed on top of the waveguide also make it promising for plasmonics and quantum efficiency enhancement in sensing applications.
authors.forename: Yuewang
authors.initials: Y
authors.lastname: Huang
authors.forename: Qiancheng
authors.initials: Q
authors.lastname: Zhao
authors.forename: Lobna
authors.initials: L
authors.lastname: Kamyab
authors.forename: Ali
authors.initials: A
authors.lastname: Rostami
authors.forename: Filippo
authors.initials: F
authors.lastname: Capolino
authors.forename: Ozdal
authors.initials: O
authors.lastname: Boyraz