title: Virtual-source diffusion approximation for enhanced near-field modeling of photon-migration in low-albedo medium.
abstract: Most analytical methods for describing light propagation in turbid medium exhibit low effectiveness in the near-field of a collimated source. Motivated by the Charge Simulation Method in electromagnetic theory as well as the established discrete source based modeling, we herein report on an improved explicit model for a semi-infinite geometry, referred to as "Virtual Source" (VS) diffuse approximation (DA), to fit for low-albedo medium and short source-detector separation. In this model, the collimated light in the standard DA is analogously approximated as multiple isotropic point sources (VS) distributed along the incident direction. For performance enhancement, a fitting procedure between the calculated and realistic reflectances is adopted in the near-field to optimize the VS parameters (intensities and locations). To be practically applicable, an explicit 2VS-DA model is established based on close-form derivations of the VS parameters for the typical ranges of the optical parameters. This parameterized scheme is proved to inherit the mathematical simplicity of the DA approximation while considerably extending its validity in modeling the near-field photon migration in low-albedo medium. The superiority of the proposed VS-DA method to the established ones is demonstrated in comparison with Monte-Carlo simulations over wide ranges of the source-detector separation and the medium optical properties.
authors.forename: Mengyu
authors.initials: M
authors.lastname: Jia
authors.forename: Xueying
authors.initials: X
authors.lastname: Chen
authors.forename: Huijuan
authors.initials: H
authors.lastname: Zhao
authors.forename: Shanshan
authors.initials: S
authors.lastname: Cui
authors.forename: Ming
authors.initials: M
authors.lastname: Liu
authors.forename: Lingling
authors.initials: L
authors.lastname: Liu
authors.forename: Feng
authors.initials: F
authors.lastname: Gao