title: Demonstration of nonlinear-energy-spread compensation in relativistic electron bunches with corrugated structures.
abstract: High quality electron beams with flat distributions in both energy and current are critical for many accelerator-based scientific facilities such as free-electron lasers and MeV ultrafast electron diffraction and microscopes. In this Letter, we report on using corrugated structures to compensate for the beam nonlinear energy chirp imprinted by the curvature of the radio-frequency field, leading to a significant reduction in beam energy spread. By using a pair of corrugated structures with orthogonal orientations, we show that the quadrupole wakefields, which, otherwise, increase beam emittance, can be effectively canceled. This work also extends the applications of corrugated structures to the low beam charge (a few pC) and low beam energy (a few MeV) regime and may have a strong impact in many accelerator-based facilities.
authors.affiliation: Key Laboratory for Laser Plasmas (Ministry of Education), Department of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai 200240, China.|IFSA Collaborative Innovation Center, Shanghai Jiao Tong University, Shanghai 200240, China.
authors.forename: Feichao
authors.initials: F
authors.lastname: Fu
authors.affiliation: Key Laboratory for Laser Plasmas (Ministry of Education), Department of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai 200240, China.|IFSA Collaborative Innovation Center, Shanghai Jiao Tong University, Shanghai 200240, China.
authors.forename: Rui
authors.initials: R
authors.lastname: Wang
authors.affiliation: Key Laboratory for Laser Plasmas (Ministry of Education), Department of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai 200240, China.|IFSA Collaborative Innovation Center, Shanghai Jiao Tong University, Shanghai 200240, China.
authors.forename: Pengfei
authors.initials: P
authors.lastname: Zhu
authors.affiliation: Key Laboratory for Laser Plasmas (Ministry of Education), Department of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai 200240, China.|IFSA Collaborative Innovation Center, Shanghai Jiao Tong University, Shanghai 200240, China.
authors.forename: Lingrong
authors.initials: L
authors.lastname: Zhao
authors.affiliation: Key Laboratory for Laser Plasmas (Ministry of Education), Department of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai 200240, China.|IFSA Collaborative Innovation Center, Shanghai Jiao Tong University, Shanghai 200240, China.
authors.forename: Tao
authors.initials: T
authors.lastname: Jiang
authors.affiliation: Key Laboratory for Laser Plasmas (Ministry of Education), Department of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai 200240, China.|IFSA Collaborative Innovation Center, Shanghai Jiao Tong University, Shanghai 200240, China.
authors.forename: Chao
authors.initials: C
authors.lastname: Lu
authors.affiliation: Key Laboratory for Laser Plasmas (Ministry of Education), Department of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai 200240, China.|IFSA Collaborative Innovation Center, Shanghai Jiao Tong University, Shanghai 200240, China.
authors.forename: Shengguang
authors.initials: S
authors.lastname: Liu
authors.affiliation: Key Laboratory for Laser Plasmas (Ministry of Education), Department of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai 200240, China.|IFSA Collaborative Innovation Center, Shanghai Jiao Tong University, Shanghai 200240, China.
authors.forename: Libin
authors.initials: L
authors.lastname: Shi
authors.affiliation: Department of Engineering Physics, Tsinghua University, Beijing 100084, China.
authors.forename: Lixin
authors.initials: L
authors.lastname: Yan
authors.affiliation: Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China.
authors.forename: Haixiao
authors.initials: H
authors.lastname: Deng
authors.affiliation: Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China.
authors.forename: Chao
authors.initials: C
authors.lastname: Feng
authors.affiliation: Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China.
authors.forename: Qiang
authors.initials: Q
authors.lastname: Gu
authors.affiliation: Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China.
authors.forename: Dazhang
authors.initials: D
authors.lastname: Huang
authors.affiliation: Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China.
authors.forename: Bo
authors.initials: B
authors.lastname: Liu
authors.affiliation: Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China.
authors.forename: Dong
authors.initials: D
authors.lastname: Wang
authors.affiliation: Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China.
authors.forename: Xingtao
authors.initials: X
authors.lastname: Wang
authors.affiliation: Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China.
authors.forename: Meng
authors.initials: M
authors.lastname: Zhang
authors.affiliation: Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China.
authors.forename: Zhentang
authors.initials: Z
authors.lastname: Zhao
authors.affiliation: SLAC National Accelerator Laboratory, Menlo Park, California 94025, USA.
authors.forename: Gennady
authors.initials: G
authors.lastname: Stupakov
authors.affiliation: Key Laboratory for Laser Plasmas (Ministry of Education), Department of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai 200240, China.|IFSA Collaborative Innovation Center, Shanghai Jiao Tong University, Shanghai 200240, China.
authors.forename: Dao
authors.initials: D
authors.lastname: Xiang
authors.affiliation: Key Laboratory for Laser Plasmas (Ministry of Education), Department of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai 200240, China.|IFSA Collaborative Innovation Center, Shanghai Jiao Tong University, Shanghai 200240, China.
authors.forename: Jie
authors.initials: J
authors.lastname: Zhang