title: Nano-LED array fabrication suitable for future single photon lithography.
abstract: We report on an alternative illumination concept for a future lithography based on single-photon emitters and important technological steps towards its implementation. Nano light-emitting diodes (LEDs) are chosen as the photon emitters. First, the development of their fabrication and their integration technology is presented, then their optical characteristics assessed. Last, size-controlled nano-LEDs, well positioned in an array, are electrically driven and utilized for illumination. Nanostructures are lithographically formed, demonstrating the feasibility of the approach. The potential of single-photon lithography to reach the ultimate scale limits in mass production is discussed.
authors: Peter Grünberg Institut (PGI-9), Forschungszentrum Jülich, 52425 Jülich, Germany. Jülich-Aachen Research Alliance, Fundamentals of Future Information Technology (JARA-FIT), 52425 Jülich, Germany.
authors: M
authors: M
authors: Mikulics
authors: H
authors: H
authors: Hardtdegen