title: Au nanostructure arrays for plasmonic applications: annealed island films versus nanoimprint lithography.
abstract: This paper attempts to compare the main features of random and highly ordered gold nanostructure arrays (NSA) prepared by thermally annealed island film and nanoimprint lithography (NIL) techniques, respectively. Each substrate possesses different morphology in terms of plasmonic enhancement. Both methods allow such important features as spectral tuning of plasmon resonance position depending on size and shape of nanostructures; however, the time and cost is quite different. The respective comparison was performed experimentally and theoretically for a number of samples with different geometrical parameters. Spectral characteristics of fabricated NSA exhibited an expressed plasmon peak in the range from 576 to 809 nm for thermally annealed samples and from 606 to 783 nm for samples prepared by NIL. Modelling of the optical response for nanostructures with typical shapes associated with these techniques (parallelepiped for NIL and semi-ellipsoid for annealed island films) was performed using finite-difference time-domain calculations. Mathematical simulations have indicated the dependence of electric field enhancement on the shape and size of the nanoparticles. As an important point, the distribution of electric field at so-called 'hot spots' was considered. Parallelepiped-shaped nanoparticles were shown to yield maximal enhancement values by an order of magnitude greater than their semi-ellipsoid-shaped counterparts; however, both nanoparticle shapes have demonstrated comparable effective electrical field enhancement values. Optimized Au nanostructures with equivalent diameters ranging from 85 to 143 nm and height equal to 35 nm were obtained for both techniques, resulting in the largest electrical field enhancement. The application of island film thermal annealing method for nanochips fabrication can be considered as a possible cost-effective platform for various surface-enhanced spectroscopies; while the NIL-fabricated NSA looks like more effective for sensing of small-size objects.
authors: Department of Functional Optoelectronics, V. E. Lashkaryov Institute of Semiconductor Physics NASU, 41 Nauki avenue, 03028 Kyiv, Ukraine.
authors: Andrii M
authors: AM
authors: Lopatynskyi
authors: Department of Functional Optoelectronics, V. E. Lashkaryov Institute of Semiconductor Physics NASU, 41 Nauki avenue, 03028 Kyiv, Ukraine.
authors: Vitalii K
authors: VK
authors: Lytvyn
authors: Department of Molecular Immunology, Laboratory of Nanobiotechnology, O. V. Palladin Institute of Biochemistry NASU, 9 Leontovycha street, 01601 Kyiv, Ukraine.
authors: Volodymyr I
authors: VI
authors: Nazarenko
authors: Department of Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Avenue, MI 48109-2122 Ann Arbor, USA.
authors: L Jay
authors: LJ
authors: Guo
authors: Department of Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Avenue, MI 48109-2122 Ann Arbor, USA.
authors: Brandon D
authors: BD
authors: Lucas
authors: Department of Functional Optoelectronics, V. E. Lashkaryov Institute of Semiconductor Physics NASU, 41 Nauki avenue, 03028 Kyiv, Ukraine.
authors: Volodymyr I
authors: VI
authors: Chegel
keywords: Annealed island films; Localized surface plasmon resonance; Nanoimprint lithography; Nanostructures; Plasmonic enhancement