title: Toward Ferroelectric Control of Monolayer MoS2.
abstract: The chemical vapor deposition (CVD) of molybdenum disulfide (MoS2) single-layer films onto periodically poled lithium niobate is possible while maintaining the substrate polarization pattern. The MoS2 growth exhibits a preference for the ferroelectric domains polarized "up" with respect to the surface so that the MoS2 film may be templated by the substrate ferroelectric polarization pattern without the need for further lithography. MoS2 monolayers preserve the surface polarization of the "up" domains, while slightly quenching the surface polarization on the "down" domains as revealed by piezoresponse force microscopy. Electrical transport measurements suggest changes in the dominant carrier for CVD MoS2 under application of an external voltage, depending on the domain orientation of the ferroelectric substrate. Such sensitivity to ferroelectric substrate polarization opens the possibility for ferroelectric nonvolatile gating of transition metal dichalcogenides in scalable devices fabricated free of exfoliation and transfer.
authors.affiliation: †Chemistry and Materials Science and Engineering Program, University of California, Riverside, California 92521, United States.
authors.forename: Ariana
authors.initials: A
authors.lastname: Nguyen
authors.affiliation: ‡Department of Physics and Astronomy, Theodore Jorgensen Hall, 855 North 16th Street, University of Nebraska-Lincoln, Lincoln, Nebraska 68588-0299, United States.
authors.forename: Pankaj
authors.initials: P
authors.lastname: Sharma
authors.affiliation: ‡Department of Physics and Astronomy, Theodore Jorgensen Hall, 855 North 16th Street, University of Nebraska-Lincoln, Lincoln, Nebraska 68588-0299, United States.
authors.forename: Thomas
authors.initials: T
authors.lastname: Scott
authors.affiliation: †Chemistry and Materials Science and Engineering Program, University of California, Riverside, California 92521, United States.
authors.forename: Edwin
authors.initials: E
authors.lastname: Preciado
authors.affiliation: †Chemistry and Materials Science and Engineering Program, University of California, Riverside, California 92521, United States.
authors.forename: Velveth
authors.initials: V
authors.lastname: Klee
authors.affiliation: §Columbia University, 3000 Broadway, New York, New York 10027-6941, United States.
authors.forename: Dezheng
authors.initials: D
authors.lastname: Sun
authors.affiliation: †Chemistry and Materials Science and Engineering Program, University of California, Riverside, California 92521, United States.
authors.forename: I-Hsi Daniel
authors.initials: IH
authors.lastname: Lu
authors.affiliation: †Chemistry and Materials Science and Engineering Program, University of California, Riverside, California 92521, United States.
authors.forename: David
authors.initials: D
authors.lastname: Barroso
authors.affiliation: §Columbia University, 3000 Broadway, New York, New York 10027-6941, United States.
authors.forename: SukHyun
authors.initials: S
authors.lastname: Kim
authors.affiliation: ∥Institute of Natural Sciences, Ural Federal University, Ekaterinburg, 620000, Russia.
authors.forename: Vladimir Ya
authors.initials: VY
authors.lastname: Shur
authors.affiliation: ∥Institute of Natural Sciences, Ural Federal University, Ekaterinburg, 620000, Russia.
authors.forename: Andrey R
authors.initials: AR
authors.lastname: Akhmatkhanov
authors.affiliation: ‡Department of Physics and Astronomy, Theodore Jorgensen Hall, 855 North 16th Street, University of Nebraska-Lincoln, Lincoln, Nebraska 68588-0299, United States.
authors.forename: Alexei
authors.initials: A
authors.lastname: Gruverman
authors.affiliation: †Chemistry and Materials Science and Engineering Program, University of California, Riverside, California 92521, United States.
authors.forename: Ludwig
authors.initials: L
authors.lastname: Bartels
authors.affiliation: ‡Department of Physics and Astronomy, Theodore Jorgensen Hall, 855 North 16th Street, University of Nebraska-Lincoln, Lincoln, Nebraska 68588-0299, United States.
authors.forename: Peter A
authors.initials: PA
authors.lastname: Dowben
keywords: CVD growth on oxides; ferroelectric surface polarization; selective area growth; transition metal dichalcogenides on ferroelectrics