title: Accurate characterization of SiO2 thin films using surface acoustic waves.
abstract: We have investigated the acoustic properties of silicon dioxide thin films. Therefore, we determined the phase velocity dispersion of LiNbO3 substrate covered with SiO2 deposited by a plasma enhanced chemical vapor deposition and a physical vapor deposition (PVD) process using differential delay lines and laser ultrasonic method. The density p and the elastic constants (c11 and c44) can be extracted by fitting corresponding finite element simulations to the phase velocities within an accuracy of at least +4%. Additionally, we propose two methods to improve the accuracy of the phase velocity determination by dealing with film thickness variation of the PVD process.
authors.forename: Matthias
authors.initials: M
authors.lastname: Knapp
authors.forename: Alexey M
authors.initials: AM
authors.lastname: Lomonosov
authors.forename: Paul
authors.initials: P
authors.lastname: Warkentin
authors.forename: Philipp M
authors.initials: PM
authors.lastname: Jäger
authors.forename: Werner
authors.initials: W
authors.lastname: Ruile
authors.forename: Hans-Peter
authors.initials: HP
authors.lastname: Kirschner
authors.forename: Matthias
authors.initials: M
authors.lastname: Honal
authors.forename: Ingo
authors.initials: I
authors.lastname: Bleyl
authors.forename: Andreas P
authors.initials: AP
authors.lastname: Mayer
authors.forename: Leonhard M
authors.initials: LM
authors.lastname: Reindl