title: Mie resonance-mediated antireflection effects of Si nanocone arrays fabricated on 8-in. wafers using a nanoimprint technique.
abstract: We fabricated 8-in. Si nanocone (NC) arrays using a nanoimprint technique and investigated their optical characteristics. The NC arrays exhibited remarkable antireflection effects; the optical reflectance was less than 10% in the visible wavelength range. The photoluminescence intensity of the NC arrays was an order of magnitude larger than that of a planar wafer. Optical simulations and analyses suggested that the Mie resonance reduced effective refractive index, and multiple scattering in the NCs enabled the drastic decrease in reflection.
  88.40.H-; 88.40.jp; 81.07.Gf.
authors.affiliation: Department of Physics, Ewha Womans University, Seoul, 120-750 South Korea.
authors.forename: Eunah
authors.initials: E
authors.lastname: Kim
authors.affiliation: Department of Physics, Ewha Womans University, Seoul, 120-750 South Korea.
authors.forename: Yunae
authors.initials: Y
authors.lastname: Cho
authors.affiliation: Department of Nano-Manufacturing Technology, Korea Institute of Machinery and Materials (KIMM), Daejeon, 305-343 South Korea.
authors.forename: Kwang-Tae
authors.initials: KT
authors.lastname: Park
authors.affiliation: Department of Nano-Manufacturing Technology, Korea Institute of Machinery and Materials (KIMM), Daejeon, 305-343 South Korea.
authors.forename: Jun-Hyuk
authors.initials: JH
authors.lastname: Choi
authors.affiliation: Department of Physics, KI for the NanoCentury, KAIST, Daejeon, 305-701 South Korea.
authors.forename: Seung-Hyuk
authors.initials: SH
authors.lastname: Lim
authors.affiliation: Department of Physics, KI for the NanoCentury, KAIST, Daejeon, 305-701 South Korea.
authors.forename: Yong-Hoon
authors.initials: YH
authors.lastname: Cho
authors.affiliation: Department of Chemical Engineering, Hanyang University, Ansan, 426-791 South Korea.
authors.forename: Yoon-Ho
authors.initials: YH
authors.lastname: Nam
authors.affiliation: Department of Chemical Engineering, Hanyang University, Ansan, 426-791 South Korea.
authors.forename: Jung-Ho
authors.initials: JH
authors.lastname: Lee
authors.affiliation: Department of Physics, Ewha Womans University, Seoul, 120-750 South Korea.
authors.forename: Dong-Wook
authors.initials: DW
authors.lastname: Kim
keywords: Antireflection; Mie resonance; Nanocone array; Nanoimprint; Si