title: Dual beam organic depth profiling using large argon cluster ion beams.
abstract: Argon cluster sputtering of an organic multilayer reference material consisting of two organic components, 4,4'-bis[N-(1-naphthyl-1-)-N-phenyl- amino]-biphenyl (NPB) and aluminium tris-(8-hydroxyquinolate) (Alq3), materials commonly used in organic light-emitting diodes industry, was carried out using time-of-flight SIMS in dual beam mode. The sample used in this study consists of a ∽400-nm-thick NPB matrix with 3-nm marker layers of Alq3at depth of ∽50, 100, 200 and 300 nm. Argon cluster sputtering provides a constant sputter yield throughout the depth profiles, and the sputter yield volumes and depth resolution are presented for Ar-cluster sizes of 630, 820, 1000, 1250 and 1660 atoms at a kinetic energy of 2.5 keV. The effect of cluster size in this material and over this range is shown to be negligible. © 2014 The Authors.Surface and Interface Analysispublished by John Wiley & Sons Ltd.
authors.affiliation: BAM - Federal Institute for Material Science and Testing, Division of Surface Analysis and Interfacial Chemistry Unter den Eichen 44-46, 12205, Berlin, Germany.
authors.forename: M
authors.initials: M
authors.lastname: Holzweber
authors.affiliation: National Physical Laboratory Hampton Road, Teddington, TW11 0LW, UK.
authors.forename: A G
authors.initials: AG
authors.lastname: Shard
authors.affiliation: BfR - Federal Institute for Risk Assessment, Department of Experimental Research Max Dohrn Strasse 8-10, 10589, Berlin, Germany.
authors.forename: H
authors.initials: H
authors.lastname: Jungnickel
authors.affiliation: BfR - Federal Institute for Risk Assessment, Department of Experimental Research Max Dohrn Strasse 8-10, 10589, Berlin, Germany.
authors.forename: A
authors.initials: A
authors.lastname: Luch
authors.affiliation: BAM - Federal Institute for Material Science and Testing, Division of Surface Analysis and Interfacial Chemistry Unter den Eichen 44-46, 12205, Berlin, Germany.
authors.forename: Wes
authors.initials: W
authors.lastname: Unger
keywords: Ar-GCIB; SIMS; ToF-SIMS; argon cluster; organic depth profiling