Localized dealloying corrosion mediated by self-assembled monolayers used as an inhibitor system.
The structure and chemistry of thiol or selenol self-assembled organic monolayers have been frequently addressed due to the unique opportunities in functionalization of materials. Such organic films can also act as effective inhibition layers to mitigate oxidation or corrosion. Cu-Au alloy substrates covered by self-assembled monolayers show a different dealloying mechanism compared to bare surfaces. The organic surface layer inhibits dealloying of noble metal alloys by a suppression of surface diffusion at lower potentials but at higher applied potentials dealloying proceeds in localized regions due to passivity breakdown. We present an in situ atomic force microscopy study of a patterned thiol layer applied on Cu-Au alloy surfaces and further explore approaches to change the local composition of the surface layers by exchange of molecules. The pattern for the in situ experiment has been applied by micro-contact printing. This allows the study of corrosion protection with its dependence on different molecule densities at different sites. Low-density thiol areas surrounding the high-density patterns are completely protected and initiation of dealloying proceeds only along the areas with the lowest inhibitor concentration. Dealloying patterns are highly influenced and controlled by molecular thiol to selenol exchange and are also affected by introducing structural defects such as scratches or polishing defects.
Max-Planck-Institut für Eisenforschung GmbH, Max-Planck-Straße 1, D-40237 Düsseldorf, Germany. frank.renner@uhasselt.be.
B R
BR
Shrestha
A
A
Bashir
G N
GN
Ankah
M
M
Valtiner
F U
FU
Renner
D000497:Alloys / Q000737:chemistry*; D003300:Copper / Q000737:chemistry; D003343:Corrosion; D006046:Gold / Q000737:chemistry; D018625:Microscopy, Atomic Force
D000497:Alloys; D006046:Gold; D003300:Copper