Quantum chemical and solution phase evaluation of metallocenes as reducing agents for the prospective atomic layer deposition of copper.
We propose and evaluate the use of metallocene compounds as reducing agents for the chemical vapour deposition (and specifically atomic layer deposition, ALD) of the transition metal Cu from metalorganic precursors. Ten different transition metal cyclopentadienyl compounds are screened for their utility in the reduction of Cu from five different Cu precursors by evaluating model reaction energies with density functional theory (DFT) and solution phase chemistry.
Tyndall National Institute, University College Cork, Lee Malting's, Dyke Parade, Cork, Ireland. simon.elliott@tyndall.ie.
Gangotri
G
Dey
Jacqueline S
JS
Wrench
Dirk J
DJ
Hagen
Lynette
L
Keeney
Simon D
SD
Elliott