Simultaneous multiplexed materials characterization using a high-precision hard X-ray micro-slit array.
The needs both for increased experimental throughput and for in operando characterization of functional materials under increasingly realistic experimental conditions have emerged as major challenges across the whole of crystallography. A novel measurement scheme that allows multiplexed simultaneous measurements from multiple nearby sample volumes is presented. This new approach enables better measurement statistics or direct probing of heterogeneous structure, dynamics or elemental composition. To illustrate, the submicrometer precision that optical lithography provides has been exploited to create a multiplexed form of ultra-small-angle scattering based X-ray photon correlation spectroscopy (USAXS-XPCS) using micro-slit arrays fabricated by photolithography. Multiplexed USAXS-XPCS is applied to follow the equilibrium dynamics of a simple colloidal suspension. While the dependence of the relaxation time on momentum transfer, and its relationship with the diffusion constant and the static structure factor, follow previous findings, this measurements-in-parallel approach reduces the statistical uncertainties of this photon-starved technique to below those associated with the instrument resolution. More importantly, we note the potential of the multiplexed scheme to elucidate the response of different components of a heterogeneous sample under identical experimental conditions in simultaneous measurements. In the context of the X-ray synchrotron community, this scheme is, in principle, applicable to all in-line synchrotron techniques. Indeed, it has the potential to open a new paradigm for in operando characterization of heterogeneous functional materials, a situation that will be even further enhanced by the ongoing development of multi-bend achromat storage ring designs as the next evolution of large-scale X-ray synchrotron facilities around the world.
Materials Measurement Laboratory, National Institute of Standards and Technology, 100 Bureau Drive, Stop 6520, Gaithersburg, MD 20899, USA.
Fan
F
Zhang
Materials Measurement Laboratory, National Institute of Standards and Technology, 100 Bureau Drive, Stop 6520, Gaithersburg, MD 20899, USA.
Andrew J
AJ
Allen
Materials Measurement Laboratory, National Institute of Standards and Technology, 100 Bureau Drive, Stop 6520, Gaithersburg, MD 20899, USA.
Lyle E
LE
Levine
Department of Physics, Illinois Institute of Technology, 3101 South Dearborn Street, Chicago, IL 60616, USA.
Derrick C
DC
Mancini
Advanced Photon Source, Argonne National Laboratory, 9700 South Cass Avenue, Argonne, IL 60439, USA.
Jan
J
Ilavsky
heterogeneous structure; measurement-in-parallel; multiplexed materials characterization; simultaneous in operando characterization; uncertainty reduction