Facile one-step photolithographic method for engineering hierarchically nano/microstructured transparent superamphiphobic surfaces.
It is of great value to develop a simple, controllable, and scalable method of making superamphiphobic surfaces. Here we present a facile one-step photolithographic method to engineer superamphiphobic surfaces consisting of photoresist micropillars decorated with nanoparticles of the same photoresist. The surface or coating is optically transparent and versatile, and can be fabricated on a broad range of substrates including stretchable elastomers. During the development of the micropillar array, photoresist nanoparticles are spontaneously grown on the micropillars by a well-controlled emulsification process of the un-cross-linked residual photoresist. This creates a hierarchical structure with a re-entrant and convex morphology which is the key for superoleophobicity. The chemical bonding between the nanoparticles and the micropillars is strong producing a robust and durable coating. This facile method is scalable and industry-applicable for a variety of applications such as self-cleaning, antifouling, and deicing/antifrosting.
†Department of Mechanical and Materials Engineering, The University of Western Ontario, London, Ontario N6A 5B9, Canada.
Tingjie
T
Li
†Department of Mechanical and Materials Engineering, The University of Western Ontario, London, Ontario N6A 5B9, Canada.|‡Surface Science Western, The University of Western Ontario, London, Ontario N6G 0J3, Canada.
Maxim
M
Paliy
†Department of Mechanical and Materials Engineering, The University of Western Ontario, London, Ontario N6A 5B9, Canada.
Xiaolong
X
Wang
‡Surface Science Western, The University of Western Ontario, London, Ontario N6G 0J3, Canada.
Brad
B
Kobe
‡Surface Science Western, The University of Western Ontario, London, Ontario N6G 0J3, Canada.
Woon-Ming
WM
Lau
†Department of Mechanical and Materials Engineering, The University of Western Ontario, London, Ontario N6A 5B9, Canada.
Jun
J
Yang
hierarchical structure; photolithography; photoresist; spontaneous emulsification; superamphiphobicity; superoleophobicity