title: [Standard addition determination of impurities in Na2CrO4 by ICP-AES].
abstract: Coupled plasma atomic emission spectrometry (ICP-AES) was used to determine the trace impurities of Ca, Mg, Al, Fe and Si in industrial sodium chromate. Wavelengths of 167.079, 393.366, 259.940, 279.533 and 251.611 nm were selected as analytical lines for the determination of Al, Ca, Fe, Mg and Si, respectively. The analytical errors can be eliminated by adjusting the determined solution with high pure hydrochloric acid. Standard addition method was used to eliminate matrix effects. The linear correlation, detection limit, precision and recovery for the concerned trace impurities have been examined. The effect of standard addition method on the accuracy for the determination under the selected analytical lines has been studied in detail. The results show that the linear correlations of standard curves were very good (R2 = 0.9988 to 0.9996) under the determined conditions. Detection limits of these trace impurities were in the range of 0.0134 to 0.0280 mg x L(-1). Sample recoveries were within 97.30% to 107.50%, and relative standard deviations were lower than 5.86% for eleven repeated determinations. The detection limits and accuracies established by the experiment can meet the analytical requirements and the analytic procedure was used to determine trace impurities in sodium chromate by ion membrane electrolysis technique successfully. Due to sodium chromate can be changed into sodium dichromate and chromic acid by adding acids, the established method can be further used to monitor trace impurities in these compounds or other hexavalent chromium compounds.
authors.forename: Li-ping
authors.initials: LP
authors.lastname: Wang
authors.forename: Hai-tao
authors.initials: HT
authors.lastname: Feng
authors.forename: Ya-ping
authors.initials: YP
authors.lastname: Dong
authors.forename: Jiao-yu
authors.initials: JY
authors.lastname: Peng
authors.forename: Wu
authors.initials: W
authors.lastname: Li
authors.forename: Hai-qin
authors.initials: HQ
authors.lastname: Shi
authors.forename: Yong
authors.initials: Y
authors.lastname: Wang