title: Microstructure and properties of silicon-incorporated DLC film fabricated using HMDS gas and RF-PECVD process.
abstract: The microstructure and characteristics of silicon-incorporated diamond-like carbon film, fabricated using a radio-frequency plasma-enhanced chemical vapor deposition process with hexamethyldisilane [(CH3)3,Si x Si(CH3)3:HMDS] gas as a silicon source, were investigated. Diamond-like carbon films with silicon compositions from 0 to 5 atomic percent were deposited onto ultra-fine grained AZ31 magnesium alloy substrate as buffer layers or multilayers. Si doping led not only to an increase in the bonding ratio (sp3/sp2), but improvements in hardness, critical adhesion, and corrosion resistance. Out of the investigated samples, the multi-deposited silicon diamond-like carbon thin film on magnesium substrate showed the best combination of adhesive, wear resistance, and corrosion resistance properties.
authors.forename: Byung Ju
authors.initials: BJ
authors.lastname: Song
authors.forename: Woo Jin
authors.initials: WJ
authors.lastname: Song
authors.forename: Jun Hyun
authors.initials: JH
authors.lastname: Han
authors.forename: Ka Ram
authors.initials: KR
authors.lastname: Kim
authors.forename: Su Jong
authors.initials: SJ
authors.lastname: Yoon
authors.forename: Tae Gyu
authors.initials: TG
authors.lastname: Kim
authors.forename: Jin Kon
authors.initials: JK
authors.lastname: Kim
authors.forename: Hyun
authors.initials: H
authors.lastname: Cho
authors.forename: Gyeung-Ho
authors.initials: GH
authors.lastname: Kim
authors.forename: Dae Youn
authors.initials: DY
authors.lastname: Hwang
authors.forename: Hye Sung
authors.initials: HS
authors.lastname: Kim