title: Sensitivity analysis and optimization method for the fabrication of one-dimensional beam-splitting phase gratings.
abstract: A method to design one-dimensional beam-spitting phase gratings with low sensitivity to fabrication errors is described. The method optimizes the phase function of a grating by minimizing the integrated variance of the energy of each output beam over a range of fabrication errors. Numerical results for three 1x9 beam splitting phase gratings are given. Two optimized gratings with low sensitivity to fabrication errors were compared with a grating designed for optimal efficiency. These three gratings were fabricated using gray-scale photolithography. The standard deviation of the 9 outgoing beam energies in the optimized gratings were 2.3 and 3.4 times lower than the optimal efficiency grating.
authors.forename: Shaun
authors.initials: S
authors.lastname: Pacheco
authors.forename: Jonathan F
authors.initials: JF
authors.lastname: Brand
authors.forename: Melissa
authors.initials: M
authors.lastname: Zaverton
authors.forename: Tom
authors.initials: T
authors.lastname: Milster
authors.forename: Rongguang
authors.initials: R
authors.lastname: Liang
mesh_terms: D004867:Equipment Design; D006696:Holography / Q000295:instrumentation*; D006801:Humans; D007368:Interferometry / Q000295:instrumentation*; D036103:Nanotechnology / Q000379:methods*; D009907:Optometry; D012031:Refractometry / Q000295:instrumentation*