title: Orientation contrast of secondary electron images from electropolished metals.
abstract: Orientation contrast obtained by an in-lens secondary electron detector in a scanning electron microscope from electropolished/etched metals is reported. The imaging conditions for obtaining such orientation contrast are defined. The mechanism responsible for the formation of the orientation contrast is explained, and an application example of this new imaging method is given.
authors.affiliation: Research Center for Physical Properties and Microstructure of Metals, Department of Materials and Optoelectronic Science, National Sun Yat-Sen University, Kaohsiung 80424, Taiwan, ROC.
authors.forename: D
authors.initials: D
authors.lastname: Chen
authors.affiliation: Research Center for Physical Properties and Microstructure of Metals, Department of Materials and Optoelectronic Science, National Sun Yat-Sen University, Kaohsiung 80424, Taiwan, ROC. Electronic address: cpchang@mail.nsysu.edu.tw.
authors.forename: C P
authors.initials: CP
authors.lastname: Chang
authors.affiliation: IRC in Materials, School of Metallurgy and Materials, The University of Birmingham, Edgbaston B15 2TT, UK.
authors.forename: M H
authors.initials: MH
authors.lastname: Loretto
keywords: Electropolishing; Metals; Orientation contrast; SEM