title: Moiré Nanosphere Lithography.
abstract: We have developed moiré nanosphere lithography (M-NSL), which incorporates in-plane rotation between neighboring monolayers, to extend the patterning capability of conventional nanosphere lithography (NSL). NSL, which uses self-assembled layers of monodisperse micro/nanospheres as masks, is a low-cost, scalable nanofabrication technique and has been widely employed to fabricate various nanoparticle arrays. Combination with dry etching and/or angled deposition has greatly enriched the family of nanoparticles NSL can yield. In this work, we introduce a variant of this technique, which uses sequential stacking of polystyrene nanosphere monolayers to form a bilayer crystal instead of conventional spontaneous self-assembly. Sequential stacking leads to the formation of moiré patterns other than the usually observed thermodynamically stable configurations. Subsequent O2 plasma etching results in a variety of complex nanostructures. Using the etched moiré patterns as masks, we have fabricated complementary gold nanostructures and studied their optical properties. We believe this facile technique provides a strategy to fabricate complex nanostructures or metasurfaces.
authors.affiliation: †National Institute for Materials Science, International Center for Material Nanoarchitectonics (MANA), Tsukuba, 305-0044, Japan.|‡CREST, Japan Science and Technology Agency, 4-1-8 Honcho, Kawaguchi, Saitama, 332-0012, Japan.
authors.forename: Kai
authors.initials: K
authors.lastname: Chen
authors.affiliation: §Department of Mechanical Engineering, Materials Science and Engineering Program, and Texas Materials Institute, The University of Texas at Austin, Austin, Texas 78712, United States.
authors.forename: Bharath Bangalore
authors.initials: BB
authors.lastname: Rajeeva
authors.affiliation: §Department of Mechanical Engineering, Materials Science and Engineering Program, and Texas Materials Institute, The University of Texas at Austin, Austin, Texas 78712, United States.
authors.forename: Zilong
authors.initials: Z
authors.lastname: Wu
authors.affiliation: §Department of Mechanical Engineering, Materials Science and Engineering Program, and Texas Materials Institute, The University of Texas at Austin, Austin, Texas 78712, United States.
authors.forename: Michael
authors.initials: M
authors.lastname: Rukavina
authors.affiliation: †National Institute for Materials Science, International Center for Material Nanoarchitectonics (MANA), Tsukuba, 305-0044, Japan.|‡CREST, Japan Science and Technology Agency, 4-1-8 Honcho, Kawaguchi, Saitama, 332-0012, Japan.
authors.forename: Thang Duy
authors.initials: TD
authors.lastname: Dao
authors.affiliation: †National Institute for Materials Science, International Center for Material Nanoarchitectonics (MANA), Tsukuba, 305-0044, Japan.|‡CREST, Japan Science and Technology Agency, 4-1-8 Honcho, Kawaguchi, Saitama, 332-0012, Japan.
authors.forename: Satoshi
authors.initials: S
authors.lastname: Ishii
authors.affiliation: †National Institute for Materials Science, International Center for Material Nanoarchitectonics (MANA), Tsukuba, 305-0044, Japan.|‡CREST, Japan Science and Technology Agency, 4-1-8 Honcho, Kawaguchi, Saitama, 332-0012, Japan.
authors.forename: Masakazu
authors.initials: M
authors.lastname: Aono
authors.affiliation: †National Institute for Materials Science, International Center for Material Nanoarchitectonics (MANA), Tsukuba, 305-0044, Japan.|‡CREST, Japan Science and Technology Agency, 4-1-8 Honcho, Kawaguchi, Saitama, 332-0012, Japan.
authors.forename: Tadaaki
authors.initials: T
authors.lastname: Nagao
authors.affiliation: §Department of Mechanical Engineering, Materials Science and Engineering Program, and Texas Materials Institute, The University of Texas at Austin, Austin, Texas 78712, United States.
authors.forename: Yuebing
authors.initials: Y
authors.lastname: Zheng
keywords: metasurface; moiré nanosphere lithography; moiré pattern; nanosphere lithography; plasmon; sequential stacking