title: [Removal of triclosan with the method of UV/ClO2 and its degradation products].
abstract: The UV/ClO2 process for triclosan ( TCS) removal was studied. The influences of several factors such as the initial pH, dose of ClO2, initial concentration of TCS and humic acid( HA) on TCS degradation in the UV/ClO2 combined process were discussed. The results showed that the UV/ClO2 process could effectively remove TCS and had a synergistic effect. When the light intensity was 6.5 μW x Cm(-2), the dose of ClO2 was 0. 5 mg x L(-1) and the concentration of TCS was 300 μg x L(-1), when UV and ClO2 were applied alone, the TCS removal rates within 1 min were only 5.23% and 84.93% respectively. The removal rate reached up to 99.13% after 1 min degradation using the UV/ClO2 combined process. In test conditions ( pH 6-9), the removal rate increased from 99.4% to 99. 63% with the increase of pH. Increasing dose of CIO2 could promote TCS removal. When the dose of ClO2 was 0.5-1.5 mg x L(-1), the removal rate was increased from 98.1% to 99.89%. The initial concentration of TCS was negatively correlated with the removal rate. When the initial concentration increased from 100 - 500 μg x L(-1), the removal rate of TCS was decreased from 99.98% to 94.39%. Low concentration of humic acid was beneficial to the removal of TCS, and high concentration of it had the opposite effect. Degradation products of TCS were investigated by GC/MS. Degradation of TCS by the processes of UV, ClO2 and UV/ClO2 also indicated that the main degradation products of the TCS were 2, 4-dichlorophenol (2,4-DCP), 2,7-dichlorodibenzo-p-dioxin (2,7-DCDD), etc.
authors.forename: Yu-Ying
authors.initials: YY
authors.lastname: Li
authors.forename: Wen-Long
authors.initials: WL
authors.lastname: He
authors.forename: Qing-Song
authors.initials: QS
authors.lastname: Li
authors.forename: Wei-Wei
authors.initials: WW
authors.lastname: Jin
authors.forename: Guo-Yuan
authors.initials: GY
authors.lastname: Chen
authors.forename: Guo-Xin
authors.initials: GX
authors.lastname: Li
mesh_terms: D052918:Environmental Restoration and Remediation / Q000379:methods*; D010636:Phenols / Q000737:chemistry; D014260:Triclosan / Q000302:isolation & purification*; D014466:Ultraviolet Rays; D014874:Water Pollutants, Chemical / Q000302:isolation & purification*
chemical_list: D010636:Phenols; D014874:Water Pollutants, Chemical; D014260:Triclosan