title: Combinatorial Characterization of TiO2 Chemical Vapor Deposition Utilizing Titanium Isopropoxide.
abstract: The combinatorial characterization of the growth kinetics in chemical vapor deposition processes is challenging because precise information about the local precursor flow is usually difficult to access. In consequence, combinatorial chemical vapor deposition techniques are utilized more to study functional properties of thin films as a function of chemical composition, growth rate or crystallinity than to study the growth process itself. We present an experimental procedure which allows the combinatorial study of precursor surface kinetics during the film growth using high vacuum chemical vapor deposition. As consequence of the high vacuum environment, the precursor transport takes place in the molecular flow regime, which allows predicting and modifying precursor impinging rates on the substrate with comparatively little experimental effort. In this contribution, we study the surface kinetics of titanium dioxide formation using titanium tetraisopropoxide as precursor molecule over a large parameter range. We discuss precursor flux and temperature dependent morphology, crystallinity, growth rates, and precursor deposition efficiency. We conclude that the surface reaction of the adsorbed precursor molecules comprises a higher order reaction component with respect to precursor surface coverage.
authors.affiliation: †Laboratory for Advanced Materials Processing, Empa, Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland.|‡Laboratory for Photonic Materials and Characterization, Ecole Polytechnique Fédérale de Lausanne, Station 17, CH-1015 Lausanne, Switzerland.
authors.forename: Michael
authors.initials: M
authors.lastname: Reinke
authors.affiliation: ‡Laboratory for Photonic Materials and Characterization, Ecole Polytechnique Fédérale de Lausanne, Station 17, CH-1015 Lausanne, Switzerland.
authors.forename: Evgeniy
authors.initials: E
authors.lastname: Ponomarev
authors.affiliation: †Laboratory for Advanced Materials Processing, Empa, Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland.|‡Laboratory for Photonic Materials and Characterization, Ecole Polytechnique Fédérale de Lausanne, Station 17, CH-1015 Lausanne, Switzerland.
authors.forename: Yury
authors.initials: Y
authors.lastname: Kuzminykh
authors.affiliation: †Laboratory for Advanced Materials Processing, Empa, Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland.|‡Laboratory for Photonic Materials and Characterization, Ecole Polytechnique Fédérale de Lausanne, Station 17, CH-1015 Lausanne, Switzerland.
authors.forename: Patrik
authors.initials: P
authors.lastname: Hoffmann
mesh_terms: D007700:Kinetics; D009942:Organometallic Compounds / Q000737:chemistry*; D013499:Surface Properties; D013696:Temperature; D014025:Titanium / Q000737:chemistry*
chemical_list: D009942:Organometallic Compounds; C009495:titanium dioxide; C102815:titanium isopropoxide; D014025:Titanium
keywords: combinatorial chemical vapor deposition; high vacuum chemical vapor deposition; surface kinetics; surface reactions; titanium dioxide; titanium tetraisopropoxide