title: Magnetic structure and ordering of multiferroic hexagonal LuFeO_{3}.
abstract: We report on the magnetic structure and ordering of hexagonal LuFeO_{3} films of variable thickness grown by molecular-beam epitaxy on YSZ (111) and Al_{2}O_{3} (0001) substrates. These crystalline films exhibit long-range structural uniformity dominated by the polar P6_{3}cm phase, which is responsible for the paraelectric to ferroelectric transition that occurs above 1000 K. Using bulk magnetometry and neutron diffraction, we find that the system orders into a ferromagnetically canted antiferromagnetic state via a single transition below 155 K regardless of film thickness, which is substantially lower than that previously reported in hexagonal LuFeO_{3} films. The symmetry of the magnetic structure in the ferroelectric state implies that this material is a strong candidate for linear magnetoelectric coupling and control of the ferromagnetic moment directly by an electric field.
authors.affiliation: NIST Center for Neutron Research, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA.
authors.forename: Steven M
authors.initials: SM
authors.lastname: Disseler
authors.affiliation: NIST Center for Neutron Research, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA.
authors.forename: Julie A
authors.initials: JA
authors.lastname: Borchers
authors.affiliation: Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, USA.
authors.forename: Charles M
authors.initials: CM
authors.lastname: Brooks
authors.affiliation: School of Applied and Engineering Physics, Cornell University, Ithaca, New York 14853, USA.
authors.forename: Julia A
authors.initials: JA
authors.lastname: Mundy
authors.affiliation: Department of Physics and Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, USA.
authors.forename: Jarrett A
authors.initials: JA
authors.lastname: Moyer
authors.affiliation: Department of Physics, Boise State University, Boise, Idaho 83725, USA.
authors.forename: Daniel A
authors.initials: DA
authors.lastname: Hillsberry
authors.affiliation: Department of Physics, Boise State University, Boise, Idaho 83725, USA.
authors.forename: Eric L
authors.initials: EL
authors.lastname: Thies
authors.affiliation: Department of Physics, Boise State University, Boise, Idaho 83725, USA.
authors.forename: Dmitri A
authors.initials: DA
authors.lastname: Tenne
authors.affiliation: Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, USA.
authors.forename: John
authors.initials: J
authors.lastname: Heron
authors.affiliation: School of Applied and Engineering Physics, Cornell University, Ithaca, New York 14853, USA.
authors.forename: Megan E
authors.initials: ME
authors.lastname: Holtz
authors.affiliation: Department of Materials Science and Engineering, University of California, Berkeley, California 94720, USA.
authors.forename: James D
authors.initials: JD
authors.lastname: Clarkson
authors.affiliation: Department of Physics, Cornell University, Ithaca, New York 14853, USA.
authors.forename: Gregory M
authors.initials: GM
authors.lastname: Stiehl
authors.affiliation: Department of Physics and Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, USA.
authors.forename: Peter
authors.initials: P
authors.lastname: Schiffer
authors.affiliation: School of Applied and Engineering Physics, Cornell University, Ithaca, New York 14853, USA.|Kavli Institute at Cornell for Nanoscale Science, Ithaca, New York 14853, USA.
authors.forename: David A
authors.initials: DA
authors.lastname: Muller
authors.affiliation: Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, USA.|Kavli Institute at Cornell for Nanoscale Science, Ithaca, New York 14853, USA.
authors.forename: Darrell G
authors.initials: DG
authors.lastname: Schlom
authors.affiliation: NIST Center for Neutron Research, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA.
authors.forename: William D
authors.initials: WD
authors.lastname: Ratcliff