title: One-Step Direct-Patterning Template Utilizing Self-Assembly of POSS-Containing Block Copolymers.
abstract: We report the self-assembly of organic-inorganic block copolymers (BCP) in thin-films by simple solvent annealing on unmodified substrates. The resulting vertically oriented lamellae and cylinders are converted to a hard silica mask by a single step highly selective oxygen plasma etching. The size of the resulting nanostructures in the case of cylinders is less than 10 nm.
authors.affiliation: Department of Organic and Polymeric Materials Tokyo Institute of Technology 2-12-1-S8-26 O-okayama, Eguro-ku Tokyo 152-8552 (Japan).
authors.forename: Tomoyasu
authors.initials: T
authors.lastname: Hirai
authors.affiliation: Department of Materials Science and Engineering University of Wisconsin Madison, Wisconsin 53706 (USA).
authors.forename: Melvina
authors.initials: M
authors.lastname: Leolukman
authors.affiliation: Department of Chemical and Biological Engineering University of Wisconsin Madison, Wisconsin 53706 (USA).
authors.forename: Chi Chun
authors.initials: CC
authors.lastname: Liu
authors.affiliation: Department of Materials Science and Engineering University of Wisconsin Madison, Wisconsin 53706 (USA).
authors.forename: Eungnak
authors.initials: E
authors.lastname: Han
authors.affiliation: Department of Materials Science and Engineering University of Wisconsin Madison, Wisconsin 53706 (USA).
authors.forename: Yun Jun
authors.initials: YJ
authors.lastname: Kim
authors.affiliation: Department of Organic and Polymeric Materials Tokyo Institute of Technology 2-12-1-S8-26 O-okayama, Eguro-ku Tokyo 152-8552 (Japan).
authors.forename: Yoshihito
authors.initials: Y
authors.lastname: Ishida
authors.affiliation: Department of Organic and Polymeric Materials Tokyo Institute of Technology 2-12-1-S8-26 O-okayama, Eguro-ku Tokyo 152-8552 (Japan). hayakawa.t.ac@m.titech.ac.jp.
authors.forename: Teruaki
authors.initials: T
authors.lastname: Hayakawa
authors.affiliation: Department of Organic and Polymeric Materials Tokyo Institute of Technology 2-12-1-S8-26 O-okayama, Eguro-ku Tokyo 152-8552 (Japan).
authors.forename: Masa-Aki
authors.initials: MA
authors.lastname: Kakimoto
authors.affiliation: Department of Chemical and Biological Engineering University of Wisconsin Madison, Wisconsin 53706 (USA). nealey@engr.wisc.edu.
authors.forename: Paul F
authors.initials: PF
authors.lastname: Nealey
authors.affiliation: Department of Materials Science and Engineering University of Wisconsin Madison, Wisconsin 53706 (USA). pgopalan@wisc.edu.
authors.forename: Padma
authors.initials: P
authors.lastname: Gopalan
keywords: POSS; block copolymer; high etching resistance; hybrid material