title: Realization of large-area wrinkle-free monolayer graphene films transferred to functional substrates.
abstract: Structural inhomogeneities, such as the wrinkles and ripples within a graphene film after transferring the free-standing graphene layer to a functional substrate, degrade the physical and electrical properties of the corresponding electronic devices. Here, we introduced titanium as a superior adhesion layer for fabricating wrinkle-free graphene films that is highly applicable to flexible and transparent electronic devices. The Ti layer does not influence the electronic performance of the functional substrates. Experimental and theoretical investigations confirm that the strong chemical interactions between Ti and any oxygen atoms unintentionally introduced on/within the graphene are responsible for forming the clean, defect-free graphene layer. Our results accelerate the practical application of graphene-related electronic devices with enhanced functionality. The large-area monolayer graphenes were prepared by a simple attachment of the Ti layer with the multi-layer wrinkle-free graphene films. For the first time, the graphene films were addressed for applications of superior bottom electrode for flexible capacitors instead of the novel metals.
authors.affiliation: Department of Materials Engineering, Chungnam National University, Daeduk Science Town, 305-764, Daejeon, Korea.
authors.forename: Byeong-Ju
authors.initials: BJ
authors.lastname: Park
authors.affiliation: 1] Department of Materials Engineering, Chungnam National University, Daeduk Science Town, 305-764, Daejeon, Korea [2] Research Analysis Center, Korea Advanced Institute of Science and Technology, 291 Daehak-ro, Yuseong-gu, 305-701, Daejeon, Korea.
authors.forename: Jin-Seok
authors.initials: JS
authors.lastname: Choi
authors.affiliation: Department of Materials Engineering, Chungnam National University, Daeduk Science Town, 305-764, Daejeon, Korea.
authors.forename: Hyun-Suk
authors.initials: HS
authors.lastname: Kim
authors.affiliation: Department of Nanomaterials Engineering, Chungnam National University, Daeduk Science Town, 305-764, Daejeon, Korea.
authors.forename: Hyun-You
authors.initials: HY
authors.lastname: Kim
authors.affiliation: Department of Materials Engineering, Chungnam National University, Daeduk Science Town, 305-764, Daejeon, Korea.
authors.forename: Jong-Ryul
authors.initials: JR
authors.lastname: Jeong
authors.affiliation: Department of Materials Engineering, Chungnam National University, Daeduk Science Town, 305-764, Daejeon, Korea.
authors.forename: Hyung-Jin
authors.initials: HJ
authors.lastname: Choi
authors.affiliation: Department of Materials Engineering, Chungnam National University, Daeduk Science Town, 305-764, Daejeon, Korea.
authors.forename: Hyun-June
authors.initials: HJ
authors.lastname: Jung
authors.affiliation: Thin Film Materials Research Group, Korea Research Institute of Chemical Technology, 19 Sinseongno, Yuseong-gu, Daejeon 305-600, Korea.
authors.forename: Min-Wook
authors.initials: MW
authors.lastname: Jung
authors.affiliation: Thin Film Materials Research Group, Korea Research Institute of Chemical Technology, 19 Sinseongno, Yuseong-gu, Daejeon 305-600, Korea.
authors.forename: Ki-Seok
authors.initials: KS
authors.lastname: An
authors.affiliation: Department of Materials Engineering, Chungnam National University, Daeduk Science Town, 305-764, Daejeon, Korea.
authors.forename: Soon-Gil
authors.initials: SG
authors.lastname: Yoon