title: Valorization of GaN based metal-organic chemical vapor deposition dust a semiconductor power device industry waste through mechanochemical oxidation and leaching: A sustainable green process.
abstract: Dust generated during metal organic vapor deposition (MOCVD) process of GaN based semiconductor power device industry contains significant amounts of gallium and indium. These semiconductor power device industry wastes contain gallium as GaN and Ga0.97N0.9O0.09 is a concern for the environment which can add value through recycling. In the present study, this waste is recycled through mechanochemical oxidation and leaching. For quantitative recovery of gallium, two different mechanochemical oxidation leaching process flow sheets are proposed. In one process, first the Ga0.97N0.9O0.09 of the MOCVD dust is leached at the optimum condition. Subsequently, the leach residue is mechanochemically treated, followed by oxidative annealing and finally re-leached. In the second process, the MOCVD waste dust is mechanochemically treated, followed by oxidative annealing and finally leached. Both of these treatment processes are competitive with each other, appropriate for gallium leaching and treatment of the waste MOCVD dust. Without mechanochemical oxidation, 40.11 and 1.86 w/w% of gallium and Indium are leached using 4M HCl, 100°C and pulp density of 100 kg/m(3,) respectively. After mechanochemical oxidation, both these processes achieved 90 w/w% of gallium and 1.86 w/w% of indium leaching at their optimum condition.
authors.affiliation: Institute for Advanced Engineering (IAE), Advanced Materials & Processing Center, Yongin-Si 449-863, Republic of Korea. Electronic address: Swain@iae.re.kr.
authors.forename: Basudev
authors.initials: B
authors.lastname: Swain
authors.affiliation: Institute for Advanced Engineering (IAE), Advanced Materials & Processing Center, Yongin-Si 449-863, Republic of Korea.
authors.forename: Chinmayee
authors.initials: C
authors.lastname: Mishra
authors.affiliation: Institute for Advanced Engineering (IAE), Advanced Materials & Processing Center, Yongin-Si 449-863, Republic of Korea.
authors.forename: Chan Gi
authors.initials: CG
authors.lastname: Lee
authors.affiliation: Institute for Advanced Engineering (IAE), Advanced Materials & Processing Center, Yongin-Si 449-863, Republic of Korea.
authors.forename: Kyung-Soo
authors.initials: KS
authors.lastname: Park
authors.affiliation: Department of Energy Engineering, Dankook University, Cheonan 330-714, Republic of Korea.
authors.forename: Kun-Jae
authors.initials: KJ
authors.lastname: Lee
mesh_terms: D005708:Gallium / Q000737:chemistry*; D007220:Industrial Waste; D008855:Microscopy, Electron, Scanning; D009584:Nitrogen / Q000737:chemistry*; D009930:Organic Chemicals / Q000737:chemistry*; D010084:Oxidation-Reduction; D012666:Semiconductors; D013052:Spectrometry, X-Ray Emission
chemical_list: D007220:Industrial Waste; D009930:Organic Chemicals; D005708:Gallium; D009584:Nitrogen
keywords: Gallium leaching; Mechanochemical oxidation; Metal-organic chemical vapor deposition dust; Recycling; Waste Valorization