title: Achieving hard X-ray nanofocusing using a wedged multilayer Laue lens.
abstract: We report on the fabrication and the characterization of a wedged multilayer Laue lens for x-ray nanofocusing. The lens was fabricated using a sputtering deposition technique, in which a specially designed mask was employed to introduce a thickness gradient in the lateral direction of the multilayer. X-ray characterization shows an efficiency of 27% and a focus size of 26 nm at 14.6 keV, in a good agreement with theoretical calculations. These results indicate that the desired wedging is achieved in the fabricated structure. We anticipate that continuous development on wedged MLLs will advance x-ray nanofocusing optics to new frontiers and enrich capabilities and opportunities for hard X-ray microscopy.
authors.forename: Xiaojing
authors.initials: X
authors.lastname: Huang
authors.forename: Raymond
authors.initials: R
authors.lastname: Conley
authors.forename: Nathalie
authors.initials: N
authors.lastname: Bouet
authors.forename: Juan
authors.initials: J
authors.lastname: Zhou
authors.forename: Albert
authors.initials: A
authors.lastname: Macrander
authors.forename: Jorg
authors.initials: J
authors.lastname: Maser
authors.forename: Hanfei
authors.initials: H
authors.lastname: Yan
authors.forename: Evgeny
authors.initials: E
authors.lastname: Nazaretski
authors.forename: Kenneth
authors.initials: K
authors.lastname: Lauer
authors.forename: Ross
authors.initials: R
authors.lastname: Harder
authors.forename: Ian K
authors.initials: IK
authors.lastname: Robinson
authors.forename: Sebastian
authors.initials: S
authors.lastname: Kalbfleisch
authors.forename: Yong S
authors.initials: YS
authors.lastname: Chu