title: Multi-level single mode 2D polymer waveguide optical interconnects using nano-imprint lithography.
abstract: Single and multi-layer passive optical interconnects using single mode polymer waveguides are demonstrated using UV nano-imprint lithography. The fabrication tolerances associated with imprint lithography are investigated and we show a way to experimentally quantify a small variation in index contrast between core and cladding of fabricated devices. 1x2 splitting devices based on directional couplers and multimode interference interferometers are demonstrated to have less than 0.45 dB insertion loss with 0.02 ± 0.01 dB power imbalance between the outputs. We demonstrate an 'optical via' with an insertion loss less than 0.45 dB to transfer light from one optical signal plane to another. A 1x4 two-dimensional optical port is experimentally demonstrated to spatially split the input power with an insertion loss of 1.2 dB.
authors.forename: Muhammad Umar
authors.initials: MU
authors.lastname: Khan
authors.forename: John
authors.initials: J
authors.lastname: Justice
authors.forename: Jarno
authors.initials: J
authors.lastname: Petäjä
authors.forename: Tia
authors.initials: T
authors.lastname: Korhonen
authors.forename: Arjen
authors.initials: A
authors.lastname: Boersma
authors.forename: Sjoukje
authors.initials: S
authors.lastname: Wiegersma
authors.forename: Mikko
authors.initials: M
authors.lastname: Karppinen
authors.forename: Brian
authors.initials: B
authors.lastname: Corbett