title: Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template.
abstract: Low molecular weight P2VP-b-PS-b-P2VP triblock copolymer (poly(2-vinlypyridine)-block-polystyrene-block-poly(2-vinylpyridine)] is doped with copper chloride and microphase separated into lamellar line patterns with ultrahigh area density. Salt-doped P2VP-b-PS-b-P2VP triblock copolymer is self-assembled on the top of the nanoimprinted photoresist template, and metallic nanowires with long-range ordering are prepared with platinum-salt infiltration and plasma etching.
authors.affiliation: Department of Polymer Science and Engineering, University of Massachusetts Amherst, 120 Governors Drive, Amherst, MA, 01003, USA.
authors.forename: Zhiwei
authors.initials: Z
authors.lastname: Sun
authors.affiliation: College of Materials Science and Engineering, Lanzhou University of Technology, Lanzhou, 730050, Gansu, China.
authors.forename: Zhenbin
authors.initials: Z
authors.lastname: Chen
authors.affiliation: Department of Polymer Science and Engineering, University of Massachusetts Amherst, 120 Governors Drive, Amherst, MA, 01003, USA.
authors.forename: Wenxu
authors.initials: W
authors.lastname: Zhang
authors.affiliation: Department of Polymer Science and Engineering, University of Massachusetts Amherst, 120 Governors Drive, Amherst, MA, 01003, USA.
authors.forename: Jaewon
authors.initials: J
authors.lastname: Choi
authors.affiliation: Department of Polymer Science and Engineering, University of Massachusetts Amherst, 120 Governors Drive, Amherst, MA, 01003, USA.
authors.forename: Caili
authors.initials: C
authors.lastname: Huang
authors.affiliation: Department of Polymer Science and Engineering, University of Massachusetts Amherst, 120 Governors Drive, Amherst, MA, 01003, USA.
authors.forename: Gajin
authors.initials: G
authors.lastname: Jeong
authors.affiliation: Department of Polymer Science and Engineering, University of Massachusetts Amherst, 120 Governors Drive, Amherst, MA, 01003, USA.
authors.forename: E Bryan
authors.initials: EB
authors.lastname: Coughlin
authors.affiliation: Seagate Technology, LLD, 47010 Kato Road, Fremont, CA, 94538, USA.
authors.forename: Yautzong
authors.initials: Y
authors.lastname: Hsu
authors.affiliation: Seagate Technology, LLD, 47010 Kato Road, Fremont, CA, 94538, USA.
authors.forename: XiaoMin
authors.initials: X
authors.lastname: Yang
authors.affiliation: Seagate Technology, LLD, 47010 Kato Road, Fremont, CA, 94538, USA.
authors.forename: Kim Y
authors.initials: KY
authors.lastname: Lee
authors.affiliation: Seagate Technology, LLD, 47010 Kato Road, Fremont, CA, 94538, USA.
authors.forename: David S
authors.initials: DS
authors.lastname: Kuo
authors.affiliation: Seagate Technology, LLD, 47010 Kato Road, Fremont, CA, 94538, USA.
authors.forename: Shuaigang
authors.initials: S
authors.lastname: Xiao
authors.affiliation: Department of Polymer Science and Engineering, University of Massachusetts Amherst, 120 Governors Drive, Amherst, MA, 01003, USA.
authors.forename: Thomas P
authors.initials: TP
authors.lastname: Russell
keywords: directed self-assembly; lamellar block copolymers; nanoimprint photoresist templates; salt complexes; solvent vapor annealing