title: Patterning microfluidic device wettability with spatially-controlled plasma oxidation.
abstract: Microfluidic devices can form double emulsions with uniform properties, but require cumbersome fabrication steps to pattern their wettability. We demonstrate spatially-controlled plasma oxidation to create wettability patterns for forming double emulsions. Our method performs comparably to chemical techniques but is simpler, more reliable, and scalable to patterning large arrays of drop makers.
authors.affiliation: Department of Bioengineering and Therapeutic Sciences, University of California San Francisco, San Francisco, California, USA. adam.abate@ucsf.edu.
authors.forename: Samuel C
authors.initials: SC
authors.lastname: Kim
authors.forename: David J
authors.initials: DJ
authors.lastname: Sukovich
authors.forename: Adam R
authors.initials: AR
authors.lastname: Abate
mesh_terms: D004867:Equipment Design; D046210:Microfluidic Analytical Techniques / Q000295:instrumentation*; D010084:Oxidation-Reduction; D010100:Oxygen / Q000737:chemistry; D058626:Plasma Gases / Q000737:chemistry*; D017155:Wettability
chemical_list: D058626:Plasma Gases; D010100:Oxygen