title: Photoluminescence-based detection of particle contamination on extreme ultraviolet reticles.
abstract: Here, we propose a comparison-free inspection technique to detect particle contamination on the reticle of extreme ultraviolet (EUV) lithography systems, based on the photoluminescence spectral characteristics of the contaminant particles and their elemental composition. We have analyzed the spectra from different particles found on reticles in EUV lithographic systems and have determined the minimum detectable particle size: 25 nm for organic particles and 100 nm for Al particles. Stainless steel coatings (50 nm thick and 50 × 50 μm(2) in area) exhibit detectable photoluminescence, and the estimated minimum detectable particle is 2 μm.
authors.affiliation: XUV Optics Group, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands.
authors.forename: A
authors.initials: A
authors.lastname: Gao
authors.affiliation: ASML, De Run 6501, 5504DR Veldhoven, The Netherlands.
authors.forename: P J
authors.initials: PJ
authors.lastname: Rizo
authors.affiliation: ASML, De Run 6501, 5504DR Veldhoven, The Netherlands.
authors.forename: L
authors.initials: L
authors.lastname: Scaccabarozzi
authors.affiliation: XUV Optics Group, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands.
authors.forename: C J
authors.initials: CJ
authors.lastname: Lee
authors.affiliation: ASML, De Run 6501, 5504DR Veldhoven, The Netherlands.
authors.forename: V
authors.initials: V
authors.lastname: Banine
authors.affiliation: XUV Optics Group, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands.
authors.forename: F
authors.initials: F
authors.lastname: Bijkerk