title: Ion-precursor and ion-dose dependent anti-galvanic reduction.
abstract: Controlling alloy nanoparticles with atomic monodispersity is challenging, and the recently revealed anti-galvanic reduction (AGR) provides a unique solution to this challenge. Herein we demonstrate that AGR is ion-precursor and ion-dose dependent, which offers novel strategies to tune the composition, structure and properties of nanoparticles by varying the ion-precursor and ion-dose in the AGR reaction.
authors.affiliation: Key Laboratory of Materials Physics, Anhui Key Laboratory of Nanomaterials and Nanostructures, Institute of Solid State Physics, Chinese Academy of Sciences, Hefei 230031, China. zkwu@issp.ac.cn.
authors.forename: Shubo
authors.initials: S
authors.lastname: Tian
authors.forename: Chuanhao
authors.initials: C
authors.lastname: Yao
authors.forename: Lingwen
authors.initials: L
authors.lastname: Liao
authors.forename: Nan
authors.initials: N
authors.lastname: Xia
authors.forename: Zhikun
authors.initials: Z
authors.lastname: Wu