title: Organo-arsenic molecular layers on silicon for high-density doping.
abstract: This article describes for the first time the controlled monolayer doping (MLD) of bulk and nanostructured crystalline silicon with As at concentrations approaching 2 × 10(20) atoms cm(-3). Characterization of doped structures after the MLD process confirmed that they remained defect- and damage-free, with no indication of increased roughness or a change in morphology. Electrical characterization of the doped substrates and nanowire test structures allowed determination of resistivity, sheet resistance, and active doping levels. Extremely high As-doped Si substrates and nanowire devices could be obtained and controlled using specific capping and annealing steps. Significantly, the As-doped nanowires exhibited resistances several orders of magnitude lower than the predoped materials.
authors.affiliation: †Department of Chemistry, University College Cork, Cork, Ireland.|‡Tyndall National Institute, University College Cork, Cork, Ireland.|§AMBER@CRANN, Trinity College Dublin, Dublin 2, Ireland.
authors.forename: John
authors.initials: J
authors.lastname: O'Connell
authors.affiliation: †Department of Chemistry, University College Cork, Cork, Ireland.|‡Tyndall National Institute, University College Cork, Cork, Ireland.|§AMBER@CRANN, Trinity College Dublin, Dublin 2, Ireland.
authors.forename: Giuseppe Alessio
authors.initials: GA
authors.lastname: Verni
authors.affiliation: †Department of Chemistry, University College Cork, Cork, Ireland.|‡Tyndall National Institute, University College Cork, Cork, Ireland.|§AMBER@CRANN, Trinity College Dublin, Dublin 2, Ireland.
authors.forename: Anushka
authors.initials: A
authors.lastname: Gangnaik
authors.affiliation: ‡Tyndall National Institute, University College Cork, Cork, Ireland.
authors.forename: Maryam
authors.initials: M
authors.lastname: Shayesteh
authors.affiliation: †Department of Chemistry, University College Cork, Cork, Ireland.|‡Tyndall National Institute, University College Cork, Cork, Ireland.|§AMBER@CRANN, Trinity College Dublin, Dublin 2, Ireland.
authors.forename: Brenda
authors.initials: B
authors.lastname: Long
authors.affiliation: †Department of Chemistry, University College Cork, Cork, Ireland.|‡Tyndall National Institute, University College Cork, Cork, Ireland.|§AMBER@CRANN, Trinity College Dublin, Dublin 2, Ireland.
authors.forename: Yordan M
authors.initials: YM
authors.lastname: Georgiev
authors.affiliation: †Department of Chemistry, University College Cork, Cork, Ireland.|‡Tyndall National Institute, University College Cork, Cork, Ireland.|§AMBER@CRANN, Trinity College Dublin, Dublin 2, Ireland.
authors.forename: Nikolay
authors.initials: N
authors.lastname: Petkov
authors.affiliation: †Department of Chemistry, University College Cork, Cork, Ireland.|∥Analytical and Biological Research Chemistry Facility, University College Cork, Cork, Ireland.
authors.forename: Gerard P
authors.initials: GP
authors.lastname: McGlacken
authors.affiliation: †Department of Chemistry, University College Cork, Cork, Ireland.|‡Tyndall National Institute, University College Cork, Cork, Ireland.|§AMBER@CRANN, Trinity College Dublin, Dublin 2, Ireland.
authors.forename: Michael A
authors.initials: MA
authors.lastname: Morris
authors.affiliation: ‡Tyndall National Institute, University College Cork, Cork, Ireland.
authors.forename: Ray
authors.initials: R
authors.lastname: Duffy
authors.affiliation: †Department of Chemistry, University College Cork, Cork, Ireland.|‡Tyndall National Institute, University College Cork, Cork, Ireland.|§AMBER@CRANN, Trinity College Dublin, Dublin 2, Ireland.
authors.forename: Justin D
authors.initials: JD
authors.lastname: Holmes
keywords: MLD; abrupt; arsenic; doping; high carrier concentration; monolayer; shallow