title: Large-scale freestanding nanometer-thick graphite pellicles for mass production of nanodevices beyond 10 nm.
abstract: Extreme ultraviolet lithography (EUVL) has received much attention in the semiconductor industry as a promising candidate to extend dimensional scaling beyond 10 nm. We present a new pellicle material, nanometer-thick graphite film (NGF), which shows an extreme ultraviolet (EUV) transmission of 92% at a thickness of 18 nm. The maximum temperature induced by laser irradiation (λ = 800 nm) of 9.9 W cm(-2) was 267 °C, due to the high thermal conductivity of the NGF. The freestanding NGF was found to be chemically stable during annealing at 500 °C in a hydrogen environment. A 50 × 50 mm large area freestanding NGF was fabricated using the wet and dry transfer (WaDT) method. The NGF can be used as an EUVL pellicle for the mass production of nanodevices beyond 10 nm.
authors.affiliation: SKKU Advanced Institute of Nanotechnology (SAINT) and Center for Human Interface Nano Technology (HINT), Sungkyunkwan University, Suwon, 440-746, Republic of Korea. jbyoo@skku.edu.
authors.forename: Seul-Gi
authors.initials: SG
authors.lastname: Kim
authors.forename: Dong-Wook
authors.initials: DW
authors.lastname: Shin
authors.forename: Taesung
authors.initials: T
authors.lastname: Kim
authors.forename: Sooyoung
authors.initials: S
authors.lastname: Kim
authors.forename: Jung Hun
authors.initials: JH
authors.lastname: Lee
authors.forename: Chang Gu
authors.initials: CG
authors.lastname: Lee
authors.forename: Cheol-Woong
authors.initials: CW
authors.lastname: Yang
authors.forename: Sungjoo
authors.initials: S
authors.lastname: Lee
authors.forename: Sang Jin
authors.initials: SJ
authors.lastname: Cho
authors.forename: Hwan Chul
authors.initials: HC
authors.lastname: Jeon
authors.forename: Mun Ja
authors.initials: MJ
authors.lastname: Kim
authors.forename: Byung-Gook
authors.initials: BG
authors.lastname: Kim
authors.forename: Ji-Beom
authors.initials: JB
authors.lastname: Yoo