title: From Molecules to Surfaces: Radical-Based Mechanisms of Si-S and Si-Se Bond Formation on Silicon.
abstract: The derivatization of silicon surfaces can have profound effects on the underlying electronic properties of the semiconductor. In this work, we investigate the radical surface chemistry of silicon with a range of organochalcogenide reagents (comprising S and Se) on a hydride-terminated silicon surface, to cleanly and efficiently produce surface Si-S and Si-Se bonds, at ambient temperature. Using a diazonium-based radical initiator, which induces formation of surface silicon radicals, a group of organochalcogenides were screened for reactivity at room temperature, including di-n-butyl disulfide, diphenyl disulfide, diphenyl diselenide, di-n-butyl sulfide, diphenyl selenide, diphenyl sulfide, 1-octadecanethiol, t-butyl disulfide, and t-butylthiol, which comprises the disulfide, diselenide, thiol, and thioether functionalities. The surface reactions were monitored by transmission mode Fourier transform infrared (FTIR) spectroscopy, X-ray photoelectron spectroscopy, and time-of-flight secondary ionization mass spectrometry. Calculation of Si-Hx consumption, a semiquantitative measure of yield of production of surface-bound Si-E bonds (E = S, Se), was carried out via FTIR spectroscopy. Control experiments, sans the BBD diazonium radical initiator, were all negative for any evident incorporation, as determined by FTIR spectroscopy. The functional groups that did react with surface silicon radicals included the dialkyl/diphenyl disulfides, diphenyl diselenide, and 1-octadecanethiol, but not t-butylthiol, diphenyl sulfide/selenide, and di-n-butyl sulfide. Through a comparison with the rich body of literature regarding molecular radicals, and in particular, silyl radicals, reaction mechanisms were proposed for each. Armed with an understanding of the reaction mechanisms, much of the known chemistry within the extensive body of radical-based reactivity has the potential to be harnessed on silicon and could be extended to a range of technologically relevant semiconductor surfaces, such as germanium, carbon, and others.
authors.affiliation: Department of Chemistry, University of Alberta, and the National Institute for Nanotechnology, Edmonton, AB T6G 2G2, Canada.
authors.forename: Jillian M
authors.initials: JM
authors.lastname: Buriak
authors.affiliation: Department of Chemistry, University of Alberta, and the National Institute for Nanotechnology, Edmonton, AB T6G 2G2, Canada.
authors.forename: Md Delwar H
authors.initials: MD
authors.lastname: Sikder
mesh_terms: D005609:Free Radicals / Q000737:chemistry; D015394:Molecular Structure; D012643:Selenium / Q000737:chemistry*; D012825:Silicon / Q000737:chemistry*; D013455:Sulfur / Q000737:chemistry*; D013499:Surface Properties
chemical_list: D005609:Free Radicals; D013455:Sulfur; D012643:Selenium; D012825:Silicon