title: Growth and Etching of Monolayer Hexagonal Boron Nitride.
abstract: The full spectrum from attachment-kinetic-dominated to diffusion-controlled modes is revealed for the cases of monolayer h-BN chemical vapor deposition (CVD) growth and Ar/H2 etching. The sets of grown and etched structures exhibit well-defined shape evolution from Euclidian to fractal geometry. The detailed abnormal processes for merging h-BN flakes into continuous structures or film are first observed and explained.
authors.affiliation: School of Materials Science and Engineering, Harbin Institute of Technology, Harbin, 150080, P. R. China.|Key Lab of Microsystem and Microstructure, Ministry of Education, Harbin Institute of Technology, Harbin, 150080, P. R. China.|Beijing National Laboratory for Molecular Sciences, Key Laboratory of Organic Solids, Institute of Chemistry, Chinese Academy of Science, Beijing, 100190, P. R. China.
authors.forename: Lifeng
authors.initials: L
authors.lastname: Wang
authors.affiliation: Beijing National Laboratory for Molecular Sciences, Key Laboratory of Organic Solids, Institute of Chemistry, Chinese Academy of Science, Beijing, 100190, P. R. China.
authors.forename: Bin
authors.initials: B
authors.lastname: Wu
authors.affiliation: Beijing National Laboratory for Molecular Sciences, Key Laboratory of Organic Solids, Institute of Chemistry, Chinese Academy of Science, Beijing, 100190, P. R. China.
authors.forename: Lili
authors.initials: L
authors.lastname: Jiang
authors.affiliation: Beijing National Laboratory for Molecular Sciences, Key Laboratory of Organic Solids, Institute of Chemistry, Chinese Academy of Science, Beijing, 100190, P. R. China.
authors.forename: Jisi
authors.initials: J
authors.lastname: Chen
authors.affiliation: Beijing National Laboratory for Molecular Sciences, Key Laboratory of Organic Solids, Institute of Chemistry, Chinese Academy of Science, Beijing, 100190, P. R. China.
authors.forename: Yongtao
authors.initials: Y
authors.lastname: Li
authors.affiliation: Beijing National Laboratory for Molecular Sciences, Key Laboratory of Organic Solids, Institute of Chemistry, Chinese Academy of Science, Beijing, 100190, P. R. China.
authors.forename: Wei
authors.initials: W
authors.lastname: Guo
authors.affiliation: School of Materials Science and Engineering, Harbin Institute of Technology, Harbin, 150080, P. R. China.|Key Lab of Microsystem and Microstructure, Ministry of Education, Harbin Institute of Technology, Harbin, 150080, P. R. China.
authors.forename: Pingan
authors.initials: P
authors.lastname: Hu
authors.affiliation: Beijing National Laboratory for Molecular Sciences, Key Laboratory of Organic Solids, Institute of Chemistry, Chinese Academy of Science, Beijing, 100190, P. R. China.
authors.forename: Yunqi
authors.initials: Y
authors.lastname: Liu
keywords: chemical vapor deposition; diffusion; growth and etching; hexagonal boron nitride