title: Low-Temperature Growth of Carbon Nanotube Forests Consisting of Tubes with Narrow Inner Spacing Using Co/Al/Mo Catalyst on Conductive Supports.
abstract: We grow dense carbon nanotube forests at 450 °C on Cu support using Co/Al/Mo multilayer catalyst. As a partial barrier layer for the diffusion of Co into Mo, we apply very thin Al layer with the nominal thickness of 0.50 nm between Co and Mo. This Al layer plays an important role in the growth of dense CNT forests, partially preventing the Co-Mo interaction. The forests have an average height of ∼300 nm and a mass density of 1.2 g cm(-3) with tubes exhibiting extremely narrow inner spacing. An ohmic behavior is confirmed between the forest and Cu support with the lowest resistance of ∼8 kΩ. The forest shows a high thermal effusivity of 1840 J s(-0.5) m(-2) K(-1), and a thermal conductivity of 4.0 J s(-1) m(-1) K(-1), suggesting that these forests are useful for heat dissipation devices.
authors.affiliation: †Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom.
authors.forename: Hisashi
authors.initials: H
authors.lastname: Sugime
authors.affiliation: †Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom.
authors.forename: Santiago
authors.initials: S
authors.lastname: Esconjauregui
authors.affiliation: †Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom.
authors.forename: Lorenzo
authors.initials: L
authors.lastname: D'Arsié
authors.affiliation: †Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom.
authors.forename: Junwei
authors.initials: J
authors.lastname: Yang
authors.affiliation: ‡Department of Materials, University of Oxford, Parks Road, Oxford, OX1 3PH, United Kingdom.
authors.forename: Alex W
authors.initials: AW
authors.lastname: Robertson
authors.affiliation: §Department of Materials Science and Metallurgy, University of Cambridge, Cambridge CB3 0FS, United Kingdom.
authors.forename: Rachel A
authors.initials: RA
authors.lastname: Oliver
authors.affiliation: ∥Istituto Officina dei Materiali-CNR, Laboratorio TASC, Trieste I-34149, Italy.
authors.forename: Sunil
authors.initials: S
authors.lastname: Bhardwaj
authors.affiliation: ∥Istituto Officina dei Materiali-CNR, Laboratorio TASC, Trieste I-34149, Italy.
authors.forename: Cinzia
authors.initials: C
authors.lastname: Cepek
authors.affiliation: †Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom.
authors.forename: John
authors.initials: J
authors.lastname: Robertson
keywords: catalyst nanoparticles; chemical vapor deposition; cocatalyst; low-temperature growth; sputtering; thermal conductivity; thermal effusivity