title: Fabrication of bright and thin Zn₂SiO₄ luminescent film for electron beam excitation-assisted optical microscope.
abstract: We fabricated a bright and thin Zn₂SiO₄ luminescent film to serve as a nanometric light source for high-spatial-resolution optical microscopy based on electron beam excitation. The Zn₂SiO₄ luminescent thin film was fabricated by annealing a ZnO film on a Si₃N₄ substrate at 1000 °C in N₂. The annealed film emitted bright cathodoluminescence compared with the as-deposited film. The film is promising for nano-imaging with electron beam excitation-assisted optical microscopy. We evaluated the spatial resolution of a microscope developed using this Zn₂SiO₄ luminescent thin film. This is the first report of the investigation and application of ZnO/Si₃N₄ annealed at a high temperature (1000 °C). The fabricated Zn₂SiO₄ film is expected to enable high-frame-rate dynamic observation with ultra-high resolution using our electron beam excitation-assisted optical microscopy.
authors.forename: Taichi
authors.initials: T
authors.lastname: Furukawa
authors.forename: Satoshi
authors.initials: S
authors.lastname: Kanamori
authors.forename: Masahiro
authors.initials: M
authors.lastname: Fukuta
authors.forename: Yasunori
authors.initials: Y
authors.lastname: Nawa
authors.forename: Hiroko
authors.initials: H
authors.lastname: Kominami
authors.forename: Yoichiro
authors.initials: Y
authors.lastname: Nakanishi
authors.forename: Atsushi
authors.initials: A
authors.lastname: Sugita
authors.forename: Wataru
authors.initials: W
authors.lastname: Inami
authors.forename: Yoshimasa
authors.initials: Y
authors.lastname: Kawata