title: Microstructure Evolution with Direct Current Density on Electrodeposited Copper Films.
authors.affiliation: 1CEMUC,Department of Metallurgical and Materials Engineering,University of Porto,R. Dr. Roberto Frias,4200-465 Porto,Portugal.
authors.forename: R F
authors.initials: RF
authors.lastname: Santos
authors.affiliation: 1CEMUC,Department of Metallurgical and Materials Engineering,University of Porto,R. Dr. Roberto Frias,4200-465 Porto,Portugal.
authors.forename: F
authors.initials: F
authors.lastname: Viana
authors.affiliation: 2Materials Science and Engineering Program,University of Texas at Austin,Austin,TX 78712,USA.
authors.forename: P J
authors.initials: PJ
authors.lastname: Ferreira