title: Fine plastic foil as backing for sputtered nickel targets.
abstract: Targets of58Ni and60Ni with areal density between 71 and 105 μg/cm2backed with polyimide foil of 35-40 μg/cm2were prepared by sputtering with Ar ions produced by a home made sputtering device at the Target Laboratory, University of Jyväskylä. The efficiency of the procedure was about 20 %.
authors.affiliation: Heavy Ion Laboratory, University of Warsaw, Ul. Pasteura 5a, 02-093 Warsaw, Poland.
authors.forename: Anna
authors.initials: A
authors.lastname: Stolarz
authors.affiliation: Department of Physics, University of Jyväskylä, Survontie 9, P.O. Box 35 (YFL), 40014 Jyväskylä, Finland.
authors.forename: Raimo
authors.initials: R
authors.lastname: Seppälä
keywords: Cu and C backing; Nickel; Polyimide foil; Sputtering