title: Low-field Switching Four-state Nonvolatile Memory Based on Multiferroic Tunnel Junctions.
abstract: Multiferroic tunneling junction based four-state non-volatile memories are very promising for future memory industry since this kind of memories hold the advantages of not only the higher density by scaling down memory cell but also the function of magnetically written and electrically reading. In this work, we demonstrate a success of this four-state memory in a material system of NiFe/BaTiO3/La0.7Sr0.3MnO3 with improved memory characteristics such as lower switching field and larger tunneling magnetoresistance (TMR). Ferroelectric switching induced resistive change memory with OFF/ON ratio of 16 and 0.3% TMR effect have been achieved in this multiferroic tunneling structure.
authors.affiliation: Department of Applied Physics, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong, P. R. China.
authors.forename: H M
authors.initials: HM
authors.lastname: Yau
authors.affiliation: Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210093, China.
authors.forename: Z B
authors.initials: ZB
authors.lastname: Yan
authors.affiliation: Department of Applied Physics, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong, P. R. China.
authors.forename: N Y
authors.initials: NY
authors.lastname: Chan
authors.affiliation: Department of Applied Physics, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong, P. R. China.
authors.forename: K
authors.initials: K
authors.lastname: Au
authors.affiliation: Department of Applied Physics, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong, P. R. China.
authors.forename: C M
authors.initials: CM
authors.lastname: Wong
authors.affiliation: Department of Applied Physics, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong, P. R. China.
authors.forename: C W
authors.initials: CW
authors.lastname: Leung
authors.affiliation: Institute for Advanced Materials and Laboratory of Quantum Engineering and Quantum Materials, South China Normal University, Guangzhou 510006, China.
authors.forename: F Y
authors.initials: FY
authors.lastname: Zhang
authors.affiliation: Institute for Advanced Materials and Laboratory of Quantum Engineering and Quantum Materials, South China Normal University, Guangzhou 510006, China.
authors.forename: X S
authors.initials: XS
authors.lastname: Gao
authors.affiliation: Department of Applied Physics, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong, P. R. China.
authors.forename: J Y
authors.initials: JY
authors.lastname: Dai