title: High-Yield Exfoliation of Ultrathin Two-Dimensional Ternary Chalcogenide Nanosheets for Highly Sensitive and Selective Fluorescence DNA Sensors.
abstract: High-yield preparation of ultrathin two-dimensional (2D) nanosheets is of great importance for the further exploration of their unique properties and promising applications. Herein, for the first time, the high-yield and scalable production of ultrathin 2D ternary chalcogenide nanosheets, including Ta2NiS5 and Ta2NiSe5, in solution is achieved by exfoliating their layered microflakes. The size of resulting Ta2NiS5 and Ta2NiS5 nanosheets ranges from tens of nanometers to few micrometers. Importantly, the production yield of single-layer Ta2NiS5 nanosheets is very high, ca. 86%. As a proof-of-concept application, the single-layer Ta2NiS5 is used as a novel fluorescence sensing platform for the detection of DNA with excellent selectivity and high sensitivity (with detection limit of 50 pM). These solution-processable, high-yield, large-amount ternary chalcogenide nanosheets may also have potential applications in electrocatalysis, supercapacitors, and electronic devices.
authors.affiliation: †School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore.
authors.forename: Chaoliang
authors.initials: C
authors.lastname: Tan
authors.affiliation: †School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore.
authors.forename: Peng
authors.initials: P
authors.lastname: Yu
authors.affiliation: †School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore.|‡Key Laboratory for Organic Electronics and Information Display (KLOEID) and Institute of Advanced Materials (IAM), Jiangsu National Synergetic Innovation Center for Advanced Materials (SICAM) Nanjing University of Posts and Telecommunications, 9 Wenyuan Road, Nanjing 210046, China.
authors.forename: Yanling
authors.initials: Y
authors.lastname: Hu
authors.affiliation: †School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore.
authors.forename: Junze
authors.initials: J
authors.lastname: Chen
authors.affiliation: †School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore.
authors.forename: Ying
authors.initials: Y
authors.lastname: Huang
authors.affiliation: §Institute of High Performance Computing, A*STAR (Agency for Science, Technology and Research) 1 Fusionopolis Way, Singapore 138632, Singapore.
authors.forename: Yongqing
authors.initials: Y
authors.lastname: Cai
authors.affiliation: †School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore.
authors.forename: Zhimin
authors.initials: Z
authors.lastname: Luo
authors.affiliation: ∥Institute of Materials Research and Engineering, A*STAR (Agency for Science, Technology and Research), 3 Research Link, Singapore 117602, Singapore.
authors.forename: Bing
authors.initials: B
authors.lastname: Li
authors.affiliation: †School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore.
authors.forename: Qipeng
authors.initials: Q
authors.lastname: Lu
authors.affiliation: ‡Key Laboratory for Organic Electronics and Information Display (KLOEID) and Institute of Advanced Materials (IAM), Jiangsu National Synergetic Innovation Center for Advanced Materials (SICAM) Nanjing University of Posts and Telecommunications, 9 Wenyuan Road, Nanjing 210046, China.
authors.forename: Lianhui
authors.initials: L
authors.lastname: Wang
authors.affiliation: †School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore.
authors.forename: Zheng
authors.initials: Z
authors.lastname: Liu
authors.affiliation: †School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore.
authors.forename: Hua
authors.initials: H
authors.lastname: Zhang
mesh_terms: D004247:DNA / Q000032:analysis*; D004277:DNA, Single-Stranded / Q000032:analysis / Q000737:chemistry; D005453:Fluorescence; D057230:Limit of Detection; D018625:Microscopy, Atomic Force; D046529:Microscopy, Electron, Transmission; D049329:Nanostructures / Q000737:chemistry*; D036103:Nanotechnology / Q000379:methods*; D009532:Nickel / Q000737:chemistry; D056951:Photoelectron Spectroscopy; D018036:Selenium Compounds / Q000737:chemistry; D012680:Sensitivity and Specificity; D013050:Spectrometry, Fluorescence / Q000295:instrumentation / Q000379:methods; D013052:Spectrometry, X-Ray Emission; D013440:Sulfides / Q000737:chemistry; D013635:Tantalum / Q000737:chemistry*; D014961:X-Ray Diffraction
chemical_list: D004277:DNA, Single-Stranded; D018036:Selenium Compounds; D013440:Sulfides; D013635:Tantalum; D009532:Nickel; D004247:DNA