title: Transfer printing of CVD graphene FETs on patterned substrates.
abstract: We describe a simple and scalable method for the transfer of CVD graphene for the fabrication of field effect transistors. This is a dry process that uses a modified RCA-cleaning step to improve the surface quality. In contrast to conventional fabrication routes where lithographic steps are performed after the transfer, here graphene is transferred to a pre-patterned substrate. The resulting FET devices display nearly zero Dirac voltage, and the contact resistance between the graphene and metal contacts is on the order of 910 ± 340 Ω μm. This approach enables formation of conducting graphene channel lengths up to one millimeter. The resist-free transfer process provides a clean graphene surface that is promising for use in high sensitivity graphene FET biosensors.
authors.affiliation: Department of Physics, Cornell University, Ithaca, New York 14853, USA. jmp9@cornell.edu.
authors.forename: T S
authors.initials: TS
authors.lastname: Abhilash
authors.forename: R
authors.initials: R
authors.lastname: De Alba
authors.forename: N
authors.initials: N
authors.lastname: Zhelev
authors.forename: H G
authors.initials: HG
authors.lastname: Craighead
authors.forename: J M
authors.initials: JM
authors.lastname: Parpia