title: Advanced in-situ electron-beam lithography for deterministic nanophotonic device processing.
abstract: We report on an advanced in-situ electron-beam lithography technique based on high-resolution cathodoluminescence (CL) spectroscopy at low temperatures. The technique has been developed for the deterministic fabrication and quantitative evaluation of nanophotonic structures. It is of particular interest for the realization and optimization of non-classical light sources which require the pre-selection of single quantum dots (QDs) with very specific emission features. The two-step electron-beam lithography process comprises (a) the detailed optical study and selection of target QDs by means of CL-spectroscopy and (b) the precise retrieval of the locations and integration of target QDs into lithographically defined nanostructures. Our technology platform allows for a detailed pre-process determination of important optical and quantum optical properties of the QDs, such as the emission energies of excitonic complexes, the excitonic fine-structure splitting, the carrier dynamics, and the quantum nature of emission. In addition, it enables a direct and precise comparison of the optical properties of a single QD before and after integration which is very beneficial for the quantitative evaluation of cavity-enhanced quantum devices.
authors.affiliation: Institut für Festkörperphysik, Technische Universität Berlin, Hardenbergstraße 36, D-10623 Berlin, Germany.
authors.forename: Arsenty
authors.initials: A
authors.lastname: Kaganskiy
authors.affiliation: Institut für Festkörperphysik, Technische Universität Berlin, Hardenbergstraße 36, D-10623 Berlin, Germany.
authors.forename: Manuel
authors.initials: M
authors.lastname: Gschrey
authors.affiliation: Institut für Festkörperphysik, Technische Universität Berlin, Hardenbergstraße 36, D-10623 Berlin, Germany.
authors.forename: Alexander
authors.initials: A
authors.lastname: Schlehahn
authors.affiliation: Institut für Festkörperphysik, Technische Universität Berlin, Hardenbergstraße 36, D-10623 Berlin, Germany.
authors.forename: Ronny
authors.initials: R
authors.lastname: Schmidt
authors.affiliation: Institut für Festkörperphysik, Technische Universität Berlin, Hardenbergstraße 36, D-10623 Berlin, Germany.
authors.forename: Jan-Hindrik
authors.initials: JH
authors.lastname: Schulze
authors.affiliation: Institut für Festkörperphysik, Technische Universität Berlin, Hardenbergstraße 36, D-10623 Berlin, Germany.
authors.forename: Tobias
authors.initials: T
authors.lastname: Heindel
authors.affiliation: Institut für Festkörperphysik, Technische Universität Berlin, Hardenbergstraße 36, D-10623 Berlin, Germany.
authors.forename: André
authors.initials: A
authors.lastname: Strittmatter
authors.affiliation: Institut für Festkörperphysik, Technische Universität Berlin, Hardenbergstraße 36, D-10623 Berlin, Germany.
authors.forename: Sven
authors.initials: S
authors.lastname: Rodt
authors.affiliation: Institut für Festkörperphysik, Technische Universität Berlin, Hardenbergstraße 36, D-10623 Berlin, Germany.
authors.forename: Stephan
authors.initials: S
authors.lastname: Reitzenstein