Atomically Traceable Nanostructure Fabrication.
Reducing the scale of etched nanostructures below the 10 nm range eventually will require an atomic scale understanding of the entire fabrication process being used in order to maintain exquisite control over both feature size and feature density. Here, we demonstrate a method for tracking atomically resolved and controlled structures from initial template definition through final nanostructure metrology, opening up a pathway for top-down atomic control over nanofabrication. Hydrogen depassivation lithography is the first step of the nanoscale fabrication process followed by selective atomic layer deposition of up to 2.8 nm of titania to make a nanoscale etch mask. Contrast with the background is shown, indicating different mechanisms for growth on the desired patterns and on the H passivated background. The patterns are then transferred into the bulk using reactive ion etching to form 20 nm tall nanostructures with linewidths down to ~6 nm. To illustrate the limitations of this process, arrays of holes and lines are fabricated. The various nanofabrication process steps are performed at disparate locations, so process integration is discussed. Related issues are discussed including using fiducial marks for finding nanostructures on a macroscopic sample and protecting the chemically reactive patterned Si(100)-H surface against degradation due to atmospheric exposure.
Zyvex Labs; jballard@zyvexlabs.com.
Josh B
JB
Ballard
Department of Physics, University of Texas at Dallas.
Don D
DD
Dick
Department of Materials Science and Engineering, University of Texas at Dallas.
Stephen J
SJ
McDonnell
Materials Science and Engineering, University of North Texas.
Maia
M
Bischof
National Institute of Standards and Technology.
Joseph
J
Fu
Zyvex Labs.
James H G
JH
Owen
Zyvex Labs.
William R
WR
Owen
Zyvex Labs.
Justin D
JD
Alexander
Materials Science and Engineering, University of North Texas.
David L
DL
Jaeger
National Institute of Standards and Technology.
Pradeep
P
Namboodiri
Zyvex Labs.
Ehud
E
Fuchs
Department of Materials Science and Engineering, University of Texas at Dallas.
Yves J
YJ
Chabal
Department of Materials Science and Engineering, University of Texas at Dallas.
Robert M
RM
Wallace
Materials Science and Engineering, University of North Texas.
Richard
R
Reidy
National Institute of Standards and Technology.
Richard M
RM
Silver
Zyvex Labs.
John N
JN
Randall
Zyvex Labs.
James
J
Von Ehr
D016252:Microscopy, Scanning Tunneling / Q000379:methods; D049329:Nanostructures / Q000737:chemistry*; D036103:Nanotechnology / Q000379:methods*; D011327:Printing