title: UV-Induced Micropatterning of Complex Functional Surfaces by Photopolymerization Controlled by Alkoxyamines.
abstract: We report on the use of an alkoxyamine (AA) for fabrication of functional micropatterns with complex structures by UV mask lithography. The living character of the polymer surface and the vertical spatial control of the repolymerization reaction from few tens of nanometers to few micrometers were demonstrated. The impact of the main parameters governing the controlled polymerization and the reinitiation process activated by light or heat was investigated. Micropatterning is shown to be a powerful method to investigate the physicochemical molecular phenomena. It is possible to control the polymer microstructure thickness from few tens of nanometers to few micrometers. In the last section, some applications are provided showing the potential of the AA for generating covalently bonded hydrophilic/hydrophobic micropatterns or luminescent surfaces. This demonstrates the high versatility and interest of this route.
authors: Institut de Science des Matériaux de Mulhouse, CNRS UMR 7361, Université de Haute-Alsace 15 rue Jean Starcky, BP 2488, 68057 Mulhouse, Cedex, France.
authors: Siham
authors: S
authors: Telitel
authors: Institut de Science des Matériaux de Mulhouse, CNRS UMR 7361, Université de Haute-Alsace 15 rue Jean Starcky, BP 2488, 68057 Mulhouse, Cedex, France.
authors: Sofia
authors: S
authors: Telitel
authors: Aix-Marseille Université , CNRS, Institut de Chimie Radicalaire UMR 7273, 13397, Marseille, France.
authors: Julien
authors: J
authors: Bosson
authors: Institut de Science des Matériaux de Mulhouse, CNRS UMR 7361, Université de Haute-Alsace 15 rue Jean Starcky, BP 2488, 68057 Mulhouse, Cedex, France.
authors: Jacques
authors: J
authors: Lalevée
authors: Aix-Marseille Université , CNRS, Institut de Chimie Radicalaire UMR 7273, 13397, Marseille, France.
authors: Jean-Louis
authors: JL
authors: Clément
authors: Institut des Sciences Chimiques de Rennes, CNRS UMR 6226, Campus de Beaulieu, 263 av. du Général Leclerc, 35042 Rennes, France.
authors: Maxime
authors: M
authors: Godfroy
authors: Institut des Sciences Chimiques de Rennes, CNRS UMR 6226, Campus de Beaulieu, 263 av. du Général Leclerc, 35042 Rennes, France.
authors: Jean-Luc
authors: JL
authors: Fillaut
authors: Institut des Sciences Chimiques de Rennes, CNRS UMR 6226, Campus de Beaulieu, 263 av. du Général Leclerc, 35042 Rennes, France.
authors: Huriye
authors: H
authors: Akdas-Kilig
authors: Aix-Marseille Université , CNRS, Institut de Chimie Radicalaire UMR 7273, 13397, Marseille, France.
authors: Yohann
authors: Y
authors: Guillaneuf
authors: Aix-Marseille Université , CNRS, Institut de Chimie Radicalaire UMR 7273, 13397, Marseille, France.
authors: Didier
authors: D
authors: Gigmes
authors: Institut de Science des Matériaux de Mulhouse, CNRS UMR 7361, Université de Haute-Alsace 15 rue Jean Starcky, BP 2488, 68057 Mulhouse, Cedex, France.
authors: Olivier
authors: O
authors: Soppera
mesh_terms: D000588:Amines / Q000737:chemistry*; D004578:Electron Spin Resonance Spectroscopy; D010777:Photochemistry; D058105:Polymerization; D013056:Spectrophotometry, Ultraviolet; D014466:Ultraviolet Rays
chemical_list: D000588:Amines