title: Highly robust transparent and conductive gas diffusion barriers based on tin oxide.
abstract: Transparent and electrically conductive gas diffusion barriers are reported. Tin oxide (SnOx ) thin films grown by atomic layer deposition afford extremely low water vapor transmission rates (WVTR) on the order of 10(-6) g (m(2) day)(-1) , six orders of magnitude better than that established with ITO layers. The electrical conductivity of SnOx remains high under damp heat conditions (85 °C/85% relative humidity (RH)), while that of ZnO quickly degrades by more than five orders of magnitude.
authors: Institute of Electronic Devices, University of Wuppertal, Rainer-Gruenter-Str. 21, 42119, Wuppertal, Germany.
authors: Andreas
authors: A
authors: Behrendt
authors: Electronic Materials and Nanoelectronics, Ruhr-Universität Bochum, Universitätsstr. 150, 44801, Bochum, Germany.
authors: Christian
authors: C
authors: Friedenberger
authors: Institute of Electronic Devices, University of Wuppertal, Rainer-Gruenter-Str. 21, 42119, Wuppertal, Germany.
authors: Tobias
authors: T
authors: Gahlmann
authors: Institute of Electronic Devices, University of Wuppertal, Rainer-Gruenter-Str. 21, 42119, Wuppertal, Germany.
authors: Sara
authors: S
authors: Trost
authors: Institute of Electronic Devices, University of Wuppertal, Rainer-Gruenter-Str. 21, 42119, Wuppertal, Germany.
authors: Tim
authors: T
authors: Becker
authors: Institute of Electronic Devices, University of Wuppertal, Rainer-Gruenter-Str. 21, 42119, Wuppertal, Germany.
authors: Kirill
authors: K
authors: Zilberberg
authors: Chair of Large Area Optoelectronics, University of Wuppertal, Rainer-Gruenter-Str. 21, Wuppertal, 42119, Germany.
authors: Andreas
authors: A
authors: Polywka
authors: Chair of Large Area Optoelectronics, University of Wuppertal, Rainer-Gruenter-Str. 21, Wuppertal, 42119, Germany.
authors: Patrick
authors: P
authors: Görrn
authors: Institute of Electronic Devices, University of Wuppertal, Rainer-Gruenter-Str. 21, 42119, Wuppertal, Germany.
authors: Thomas
authors: T
authors: Riedl
keywords: atomic layer deposition; organic electronics; tin oxide; transparent and conductive gas diffusion barriers; transparent electrodes