title: Bottom-up Fabrication of Graphene on Silicon/Silica Substrate via a Facile Soft-hard Template Approach.
abstract: In this work, a novel soft-hard template method towards the direct fabrication of graphene films on silicon/silica substrate is developed via a tri-constituent self-assembly route. Using cetyl trimethyl ammonium bromide (CTAB) as a soft template, silica (SiO2) from tetramethoxysilane as a hard template, and pyrene as a carbon source, the self-assembly process allows the formation of a sandwich-like SiO2/CTAB/pyrene composite, which can be further converted to high quantity graphene films with a thickness of ~1 nm and a size of over 5 μm by thermal treatment. The morphology and thickness of the graphene films can be effectively controlled through the adjustment of the ratio of pyrene to CTAB. Furthermore, a high nonlinear refractive index n2 of ~10(-12) m(2) W(-1) is measured from graphene/silica hybrid film, which is six orders of magnitude larger than that of silicon and comparable to the graphene from chemical vapor deposition process.
authors: State Key Laboratory of Advanced Optical Communication Systems and Networks, Department of Electronic Engineering, Shanghai Jiao Tong University, Shanghai 200240, China.
authors: Yuxing
authors: Y
authors: Yang
authors: State Key Laboratory of Advanced Optical Communication Systems and Networks, Department of Electronic Engineering, Shanghai Jiao Tong University, Shanghai 200240, China.
authors: Ruili
authors: R
authors: Liu
authors: State Key Laboratory of Advanced Optical Communication Systems and Networks, Department of Electronic Engineering, Shanghai Jiao Tong University, Shanghai 200240, China.
authors: Jiayang
authors: J
authors: Wu
authors: State Key Laboratory of Advanced Optical Communication Systems and Networks, Department of Electronic Engineering, Shanghai Jiao Tong University, Shanghai 200240, China.
authors: Xinhong
authors: X
authors: Jiang
authors: State Key Laboratory of Advanced Optical Communication Systems and Networks, Department of Electronic Engineering, Shanghai Jiao Tong University, Shanghai 200240, China.
authors: Pan
authors: P
authors: Cao
authors: State Key Laboratory of Advanced Optical Communication Systems and Networks, Department of Electronic Engineering, Shanghai Jiao Tong University, Shanghai 200240, China.
authors: Xiaofeng
authors: X
authors: Hu
authors: State Key Laboratory of Advanced Optical Communication Systems and Networks, Department of Electronic Engineering, Shanghai Jiao Tong University, Shanghai 200240, China.
authors: Ting
authors: T
authors: Pan
authors: State Key Laboratory of Advanced Optical Communication Systems and Networks, Department of Electronic Engineering, Shanghai Jiao Tong University, Shanghai 200240, China.
authors: Ciyuan
authors: C
authors: Qiu
authors: School of Physical Science and Technology, Soochow University, Soochow 215006, China.
authors: Junyi
authors: J
authors: Yang
authors: School of Physical Science and Technology, Soochow University, Soochow 215006, China.
authors: Yinglin
authors: Y
authors: Song
authors: School of Chemistry and Chemical Engineering, Shanghai Jiao Tong University, Shanghai, 200240, China.
authors: Dongqing
authors: D
authors: Wu
authors: State Key Laboratory of Advanced Optical Communication Systems and Networks, Department of Electronic Engineering, Shanghai Jiao Tong University, Shanghai 200240, China.
authors: Yikai
authors: Y
authors: Su