title: Universal pattern transfer methods for metal nanostructures by block copolymer lithography.
abstract: A universal block copolymer pattern transfer method was demonstrated to produce Co nanostructures consisting of arrays of lines or dots from a polystyrene-block-polydimethylsiloxane (PS-b-PDMS) diblock copolymer. Three processes were used: liftoff, a damascene process, and ion beam etching using a hard mask of tungsten, including a sacrificial poly(methyl methacrylate) layer under the PS-b-PDMS for the etch and liftoff processes. The ion beam etch process produced the most uniform magnetic arrays. A structural and magnetic comparison in terms of uniformity, edge roughness and switching field distribution has been reported.
authors: Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA 02139, USA.
authors: Kun-Hua
authors: KH
authors: Tu
authors: Wubin
authors: W
authors: Bai
authors: George
authors: G
authors: Liontos
authors: Konstantinos
authors: K
authors: Ntetsikas
authors: Apostolos
authors: A
authors: Avgeropoulos
authors: Caroline A
authors: CA
authors: Ross