A double barrier memristive device.
We present a quantum mechanical memristive Nb/Al/Al2O3/NbxOy/Au device which consists of an ultra-thin memristive layer (NbxOy) sandwiched between an Al2O3 tunnel barrier and a Schottky-like contact. A highly uniform current distribution for the LRS (low resistance state) and HRS (high resistance state) for areas ranging between 70 μm2 and 2300 μm2 were obtained, which indicates a non-filamentary based resistive switching mechanism. In a detailed experimental and theoretical analysis we show evidence that resistive switching originates from oxygen diffusion and modifications of the local electronic interface states within the NbxOy layer, which influences the interface properties of the Au (Schottky) contact and of the Al2O3 tunneling barrier, respectively. The presented device might offer several benefits like an intrinsic current compliance, improved retention and no need for an electric forming procedure, which is especially attractive for possible applications in highly dense random access memories or neuromorphic mixed signal circuits.
Nanoelektronik, Technische Fakultät Kiel, Christian-Albrechts-Universität Kiel, Kiel 24143, Germany.
M
M
Hansen
Nanoelektronik, Technische Fakultät Kiel, Christian-Albrechts-Universität Kiel, Kiel 24143, Germany.
M
M
Ziegler
Nanoelektronik, Technische Fakultät Kiel, Christian-Albrechts-Universität Kiel, Kiel 24143, Germany.
L
L
Kolberg
Nanoelektronik, Technische Fakultät Kiel, Christian-Albrechts-Universität Kiel, Kiel 24143, Germany.
R
R
Soni
Ruhr University Bochum, Faculty of Electrical Engineering and Information Technology, Institute of Theoretical Electrical Engineering, Bochum D-44780, Germany.
S
S
Dirkmann
Ruhr University Bochum, Faculty of Electrical Engineering and Information Technology, Institute of Theoretical Electrical Engineering, Bochum D-44780, Germany.
T
T
Mussenbrock
Nanoelektronik, Technische Fakultät Kiel, Christian-Albrechts-Universität Kiel, Kiel 24143, Germany.
H
H
Kohlstedt