Macroscale Transformation Optics Enabled by Photoelectrochemical Etching.
Photoelectrochemical etching of silicon can be used to form lateral refractive index gradients for transformation optical devices. This technique allows the fabrication of macroscale devices with large refractive index gradients. Patterned porous layers can also be lifted from the substrate and transferred to other materials, creating more possibilities for novel devices.
NSF Nano-scale Science and Engineering Center (NSEC), University of California Berkeley, Berkeley, CA, 94720, USA.
David S
DS
Barth
NSF Nano-scale Science and Engineering Center (NSEC), University of California Berkeley, Berkeley, CA, 94720, USA.
Christopher
C
Gladden
NSF Nano-scale Science and Engineering Center (NSEC), University of California Berkeley, Berkeley, CA, 94720, USA.
Alessandro
A
Salandrino
NSF Nano-scale Science and Engineering Center (NSEC), University of California Berkeley, Berkeley, CA, 94720, USA.
Kevin
K
O'Brien
NSF Nano-scale Science and Engineering Center (NSEC), University of California Berkeley, Berkeley, CA, 94720, USA.
Ziliang
Z
Ye
NSF Nano-scale Science and Engineering Center (NSEC), University of California Berkeley, Berkeley, CA, 94720, USA.
Michael
M
Mrejen
NSF Nano-scale Science and Engineering Center (NSEC), University of California Berkeley, Berkeley, CA, 94720, USA.
Yuan
Y
Wang
NSF Nano-scale Science and Engineering Center (NSEC), University of California Berkeley, Berkeley, CA, 94720, USA.|Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA.|Kavli Energy NanoSciences Institute at the University of California Berkeley and the Lawrence Berkeley National Laboratory, Berkeley, California, 94720, USA.|Department of Physics, King Abdulaziz University, Jeddah, 21589, Saudi Arabia.
Xiang
X
Zhang
gradient index optics; porous silicon; transformation optics, photochemical etching