Radical Initiated Hydrosilylation on Silicon Nanocrystal Surfaces: An Evaluation of Functional Group Tolerance and Mechanistic Study.
Hydrosilylation is among the most common methods used for modifying silicon surface chemistry. It provides a wide range of surface functionalities and effective passivation of surface sites. Herein, we report a systematic study of radical initiated hydrosilylation of silicon nanocrystal (SiNC) surfaces using two common radical initiators (i.e., 2,2'-azobis(2-methylpropionitrile) and benzoyl peroxide). Compared to other widely applied hydrosilylation methods (e.g., thermal, photochemical, and catalytic), the radical initiator based approach is particle size independent, requires comparatively low reaction temperatures, and yields monolayer surface passivation after short reaction times. The effects of differing functional groups (i.e., alkene, alkyne, carboxylic acid, and ester) on the radical initiated hydrosilylation are also explored. The results indicate functionalization occurs and results in the formation of monolayer passivated surfaces.
Department of Chemistry and ‡Department of Physics, University of Alberta , Edmonton, Alberta T6G 2G2, Canada.
Zhenyu
Z
Yang
Department of Chemistry and ‡Department of Physics, University of Alberta , Edmonton, Alberta T6G 2G2, Canada.
Christina M
CM
Gonzalez
Department of Chemistry and ‡Department of Physics, University of Alberta , Edmonton, Alberta T6G 2G2, Canada.
Tapas K
TK
Purkait
Department of Chemistry and ‡Department of Physics, University of Alberta , Edmonton, Alberta T6G 2G2, Canada.
Muhammad
M
Iqbal
Department of Chemistry and ‡Department of Physics, University of Alberta , Edmonton, Alberta T6G 2G2, Canada.
Al
A
Meldrum
Department of Chemistry and ‡Department of Physics, University of Alberta , Edmonton, Alberta T6G 2G2, Canada.
Jonathan G C
JG
Veinot