title: Critical Shear Stress of Rhodium Nanocontacts Studied by In Situ High-Resolution Transmission Electron Microscopy.
abstract: The structural dynamics during tensile deformation of rhodium (Rh) nanocontacts (NCs) at room temperature was observed by in situ high-resolution transmission electron microscopy. The critical shear stress for a {111}-(110) slip system was estimated from simultaneous measurement of the force acting on the NCs. It was found that the critical shear stress increased to ~5 GPa, which was comparable with that for a homogeneous slip, as the minimum cross-sectional width of the NCs decreased to less than 1.6 nm. This result implies that the slip mechanism in Rh transformed from dislocation-mediated slip to homogeneous slip when the width decreased to less than the critical size.
authors.forename: Takayuki
authors.initials: T
authors.lastname: Ohko
authors.forename: Tokushi
authors.initials: T
authors.lastname: Kizuka