title: Fabrication of AIN Nano-Structures Using Polarity Control by High Temperature Metalorganic Chemical Vapor Deposition.
abstract: This study investigates the crystallographic polarity transition of AIN layers grown by high temperature metalorganic chemical vapor deposition (HT-MOCVD), with varying trimethylaluminum (TMAI) pre-flow rates. AIN layers grown without TMAI pre-flow had a mixed polarity, consisting of Al- and N-polarity, and exhibited a rough surface. With an increasing rate of TMAI pre-flow, the AIN layer was changed to an Al-polarity, with a smooth surface morphology. Finally, AIN nano-pillars and nano-rods of Al-polarity were fabricated by etching a mixed polarity AIN layer using an aqueous KOH solution.
authors.forename: Daeyong
authors.initials: D
authors.lastname: Eom
authors.forename: Jinwan
authors.initials: J
authors.lastname: Kim
authors.forename: Kyungjae
authors.initials: K
authors.lastname: Lee
authors.forename: Minhwan
authors.initials: M
authors.lastname: Jeon
authors.forename: Cheon
authors.initials: C
authors.lastname: Heo
authors.forename: Jaedo
authors.initials: J
authors.lastname: Pyeon
authors.forename: Okhyun
authors.initials: O
authors.lastname: Nam