title: Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents.
abstract: We demonstrate the impact of reducing agents for Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) of WS2 from WF6 and H2S precursors. Nanocrystalline WS2 layers with a two-dimensional structure can be obtained at low deposition temperatures (300-450 °C) without using a template or anneal.
authors.affiliation: Imec, Kapeldreef 75, B-3001 Leuven, Belgium. Annelies.Delabie@imec.be.
authors.forename: A
authors.initials: A
authors.lastname: Delabie
authors.forename: M
authors.initials: M
authors.lastname: Caymax
authors.forename: B
authors.initials: B
authors.lastname: Groven
authors.forename: M
authors.initials: M
authors.lastname: Heyne
authors.forename: K
authors.initials: K
authors.lastname: Haesevoets
authors.forename: J
authors.initials: J
authors.lastname: Meersschaut
authors.forename: T
authors.initials: T
authors.lastname: Nuytten
authors.forename: H
authors.initials: H
authors.lastname: Bender
authors.forename: T
authors.initials: T
authors.lastname: Conard
authors.forename: P
authors.initials: P
authors.lastname: Verdonck
authors.forename: S
authors.initials: S
authors.lastname: Van Elshocht
authors.forename: S
authors.initials: S
authors.lastname: De Gendt
authors.forename: M
authors.initials: M
authors.lastname: Heyns
authors.forename: K
authors.initials: K
authors.lastname: Barla
authors.forename: I
authors.initials: I
authors.lastname: Radu
authors.forename: A
authors.initials: A
authors.lastname: Thean