title: Photopatterning of Indomethacin Thin Films: a Solvent-Free Vapor-Deposited Photoresist.
abstract: We report indomethacin as a photoresist that can be dry-deposited (as well as spin-coated), and developed in weak aqueous base. This is the first reported patterning of indomethacin as a resist material. Nanometer-scale patterns were achieved through DUV photolithography and the underlying patterning mechanism was investigated.
authors.forename: Katherine L
authors.initials: KL
authors.lastname: Camera
authors.affiliation: Department of Chemistry, University of Wisconsin-Madison , Madison, Wisconsin 53706, United States.
authors.forename: Jaritza
authors.initials: J
authors.lastname: Gómez-Zayas
authors.affiliation: Department of Organic Device Engineering, Yamagata University , 4-3-16 Jonan, Yonezawa, Yamagata 992-8510, Japan.
authors.forename: Daisuke
authors.initials: D
authors.lastname: Yokoyama
authors.affiliation: Department of Chemistry, University of Wisconsin-Madison , Madison, Wisconsin 53706, United States.
authors.forename: M D
authors.initials: MD
authors.lastname: Ediger
authors.forename: Christopher K
authors.initials: CK
authors.lastname: Ober
keywords: dry deposition; indomethacin; organic glass; photolithography; spin coating; vapor deposition