title: Photolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications.
abstract: In many areas of science and technology, patterned films and surfaces play a key role in engineering and development of advanced materials. Here, we present a versatile toolbox that provides an easy patterning method for cellulose thin films by means of photolithography and enzymatic digestion. A patterned UV-illumination of trimethylsilyl cellulose thin films containing small amounts of a photo acid generator leads to a desilylation reaction and thus to the formation of cellulose in the irradiated areas. Depending on the conditions of development, either negative and positive type cellulose structures can be obtained, offering lateral resolutions down to the single-digit micro meter range by means of contact photolithography. In order to highlight the potential of this material for advanced patterning techniques, cellulose structures with sub-µm resolution are fabricated by means of two-photon absorption lithography. Moreover, these photochemically structured cellulose thin films are successfully implemented as dielectric layers in prototype organic thin film transistors. Such photopatternable dielectric layers are crucial for the realization of electrical interconnects for demanding organic device architectures.
authors.affiliation: Chair of Chemistry of Polymeric Materials, University of Leoben, Otto Glöckel-Straße 2, 8700 Leoben, Austria.
authors.forename: Archim
authors.initials: A
authors.lastname: Wolfberger
authors.affiliation: Materials-Institute for Surface Technologies and Photonics, Joanneum Research Forschungsgesellschaft mbH, Franz-Pichler-Straße 30, 8160 Weiz, Austria.
authors.forename: Andreas
authors.initials: A
authors.lastname: Petritz
authors.affiliation: Materials-Institute for Surface Technologies and Photonics, Joanneum Research Forschungsgesellschaft mbH, Franz-Pichler-Straße 30, 8160 Weiz, Austria.
authors.forename: Alexander
authors.initials: A
authors.lastname: Fian
authors.affiliation: Chair of Chemistry of Polymeric Materials, University of Leoben, Otto Glöckel-Straße 2, 8700 Leoben, Austria.
authors.forename: Jakob
authors.initials: J
authors.lastname: Herka
authors.affiliation: Materials-Institute for Surface Technologies and Photonics, Joanneum Research Forschungsgesellschaft mbH, Franz-Pichler-Straße 30, 8160 Weiz, Austria.
authors.forename: Volker
authors.initials: V
authors.lastname: Schmidt
authors.affiliation: Materials-Institute for Surface Technologies and Photonics, Joanneum Research Forschungsgesellschaft mbH, Franz-Pichler-Straße 30, 8160 Weiz, Austria.
authors.forename: Barbara
authors.initials: B
authors.lastname: Stadlober
authors.affiliation: Faculty of Mechanical Engineering, University of Maribor, Smetanova 17, 2000 Maribor, Slovenia.
authors.forename: Rupert
authors.initials: R
authors.lastname: Kargl
authors.affiliation: Institute for Chemistry and Technology of Materials, Graz University of Technology, Stremayrgasse 9, 8010 Graz, Austria.
authors.forename: Stefan
authors.initials: S
authors.lastname: Spirk
authors.affiliation: Chair of Chemistry of Polymeric Materials, University of Leoben, Otto Glöckel-Straße 2, 8700 Leoben, Austria.
authors.forename: Thomas
authors.initials: T
authors.lastname: Griesser
keywords: Cellulose; Lithography; Organic electronics; Organic thin film transistor; Photochemistry; Photoresist