title: Direct analysis of ultra-trace semiconductor gas by inductively coupled plasma mass spectrometry coupled with gas to particle conversion-gas exchange technique.
abstract: An inductively coupled plasma mass spectrometry (ICPMS) coupled with gas to particle conversion-gas exchange technique was applied to the direct analysis of ultra-trace semiconductor gas in ambient air. The ultra-trace semiconductor gases such as arsine (AsH3) and phosphine (PH3) were converted to particles by reaction with ozone (O3) and ammonia (NH3) gases within a gas to particle conversion device (GPD). The converted particles were directly introduced and measured by ICPMS through a gas exchange device (GED), which could penetrate the particles as well as exchange to Ar from either non-reacted gases such as an air or remaining gases of O3 and NH3. The particle size distribution of converted particles was measured by scanning mobility particle sizer (SMPS) and the results supported the elucidation of particle agglomeration between the particle converted from semiconductor gas and the particle of ammonium nitrate (NH4NO3) which was produced as major particle in GPD. Stable time-resolved signals from AsH3 and PH3 in air were obtained by GPD-GED-ICPMS with continuous gas introduction; however, the slightly larger fluctuation, which could be due to the ionization fluctuation of particles in ICP, was observed compared to that of metal carbonyl gas in Ar introduced directly into ICPMS. The linear regression lines were obtained and the limits of detection (LODs) of 1.5 pL L(-1) and 2.4 nL L(-1) for AsH3 and PH3, respectively, were estimated. Since these LODs revealed sufficiently lower values than the measurement concentrations required from semiconductor industry such as 0.5 nL L(-1) and 30 nL L(-1) for AsH3 and PH3, respectively, the GPD-GED-ICPMS could be useful for direct and high sensitive analysis of ultra-trace semiconductor gas in air.
authors.affiliation: Inorganic Standards Group, Research Institute for Material and Chemical Measurement, National Metrology Institute of Japan (NMIJ), National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1, Umezono, Tsukuba 305-8563, Japan. Electronic address: m-oohata@aist.go.jp.
authors.forename: Masaki
authors.initials: M
authors.lastname: Ohata
authors.affiliation: Inorganic Standards Group, Research Institute for Material and Chemical Measurement, National Metrology Institute of Japan (NMIJ), National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1, Umezono, Tsukuba 305-8563, Japan.
authors.forename: Hiromu
authors.initials: H
authors.lastname: Sakurai
authors.affiliation: J-Science Lab Co. Ltd., 3-1 Hiuchigata, Kamitoba, Minami-ku, Kyoto 601-8144, Japan.
authors.forename: Kohei
authors.initials: K
authors.lastname: Nishiguchi
authors.affiliation: J-Science Lab Co. Ltd., 3-1 Hiuchigata, Kamitoba, Minami-ku, Kyoto 601-8144, Japan.
authors.forename: Keisuke
authors.initials: K
authors.lastname: Utani
authors.affiliation: ETH Zurich, Department of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, Wolfgang-Pauli-Str. 10, 8093 Zurich, Switzerland.
authors.forename: Detlef
authors.initials: D
authors.lastname: Günther
mesh_terms: D000395:Air Pollutants, Occupational / Q000032:analysis*; D000641:Ammonia / Q000737:chemistry; D001152:Arsenicals / Q000032:analysis*; D005740:Gases / Q000032:analysis*; D057230:Limit of Detection; D013058:Mass Spectrometry / Q000379:methods*; D010126:Ozone / Q000737:chemistry; D010316:Particle Size; D010720:Phosphines / Q000032:analysis*; D012666:Semiconductors
chemical_list: D000395:Air Pollutants, Occupational; D001152:Arsenicals; D005740:Gases; D010720:Phosphines; D010126:Ozone; D000641:Ammonia; C044646:phosphine; C006633:arsine
keywords: Direct analysis; Gas exchange; Gas to particle conversion; Inductively coupled plasma mass spectrometry; Particle size distribution; Semiconductor gas