title: Industry-relevant magnetron sputtering and cathodic arc ultra-high vacuum deposition system for in situ x-ray diffraction studies of thin film growth using high energy synchrotron radiation.
abstract: We present an industry-relevant, large-scale, ultra-high vacuum (UHV) magnetron sputtering and cathodic arc deposition system purposefully designed for time-resolved in situ thin film deposition/annealing studies using high-energy (>50 keV), high photon flux (>10(12) ph/s) synchrotron radiation. The high photon flux, combined with a fast-acquisition-time (<1 s) two-dimensional (2D) detector, permits time-resolved in situ structural analysis of thin film formation processes. The high-energy synchrotron-radiation based x-rays result in small scattering angles (<11°), allowing large areas of reciprocal space to be imaged with a 2D detector. The system has been designed for use on the 1-tonne, ultra-high load, high-resolution hexapod at the P07 High Energy Materials Science beamline at PETRA III at the Deutsches Elektronen-Synchrotron in Hamburg, Germany. The deposition system includes standard features of a typical UHV deposition system plus a range of special features suited for synchrotron radiation studies and industry-relevant processes. We openly encourage the materials research community to contact us for collaborative opportunities using this unique and versatile scientific instrument.
authors.affiliation: Department of Physics, Chemistry, and Biology (IFM), Linköping University, SE-581 83 Linköping, Sweden.
authors.forename: J L
authors.initials: JL
authors.lastname: Schroeder
authors.affiliation: PVD Products Inc., 35 Upton Dr., Suite 200, Wilmington, Massachusetts 01887, USA.
authors.forename: W
authors.initials: W
authors.lastname: Thomson
authors.affiliation: PVD Products Inc., 35 Upton Dr., Suite 200, Wilmington, Massachusetts 01887, USA.
authors.forename: B
authors.initials: B
authors.lastname: Howard
authors.affiliation: Helmholtz-Zentrum Geesthacht, Centre for Materials and Coastal Research, Institute for Materials Research, Max-Planck-Straße 1, 21502 Geesthacht, Germany.
authors.forename: N
authors.initials: N
authors.lastname: Schell
authors.affiliation: Department of Physics, Chemistry, and Biology (IFM), Linköping University, SE-581 83 Linköping, Sweden.
authors.forename: L-Å
authors.initials: LÅ
authors.lastname: Näslund
authors.affiliation: Department of Physics, Chemistry, and Biology (IFM), Linköping University, SE-581 83 Linköping, Sweden.
authors.forename: L
authors.initials: L
authors.lastname: Rogström
authors.affiliation: Seco Tools AB, Björnbacksvägen 2, SE-737 82 Fagersta, Sweden.
authors.forename: M P
authors.initials: MP
authors.lastname: Johansson-Jõesaar
authors.affiliation: Department of Physics, Chemistry, and Biology (IFM), Linköping University, SE-581 83 Linköping, Sweden.
authors.forename: N
authors.initials: N
authors.lastname: Ghafoor
authors.affiliation: Department of Physics, Chemistry, and Biology (IFM), Linköping University, SE-581 83 Linköping, Sweden.
authors.forename: M
authors.initials: M
authors.lastname: Odén
authors.affiliation: PVD Products Inc., 35 Upton Dr., Suite 200, Wilmington, Massachusetts 01887, USA.
authors.forename: E
authors.initials: E
authors.lastname: Nothnagel
authors.affiliation: PVD Products Inc., 35 Upton Dr., Suite 200, Wilmington, Massachusetts 01887, USA.
authors.forename: A
authors.initials: A
authors.lastname: Shepard
authors.affiliation: PVD Products Inc., 35 Upton Dr., Suite 200, Wilmington, Massachusetts 01887, USA.
authors.forename: J
authors.initials: J
authors.lastname: Greer
authors.affiliation: Department of Physics, Chemistry, and Biology (IFM), Linköping University, SE-581 83 Linköping, Sweden.
authors.forename: J
authors.initials: J
authors.lastname: Birch