title: Hierarchical Pore Development by Plasma Etching of Zr-Based Metal-Organic Frameworks.
abstract: The typically stable Zr-based metal-organic frameworks (MOFs) UiO-66 and UiO-66-NH2 were treated with tetrafluoromethane (CF4 ) and hexafluoroethane (C2 F6 ) plasmas. Through interactions between fluoride radicals from the perfluoroalkane plasma and the zirconium-oxygen bonds of the MOF, the resulting materials showed the development of mesoporosity, creating a hierarchical pore structure. It is anticipated that this strategy can be used as a post-synthetic technique for developing hierarchical networks in a variety of MOFs.
authors.affiliation: Leidos, Inc., PO Box 68, Gunpowder, MD 21010 (USA).
authors.forename: Jared B
authors.initials: JB
authors.lastname: DeCoste
authors.affiliation: Guild Associates, Inc., 5750 Shier Rings Rd, Dublin, OH 43228 (USA).
authors.forename: Joseph A
authors.initials: JA
authors.lastname: Rossin
authors.affiliation: U.S. Army Edgewood Chemical Biological Center, 5183 Blackhawk Rd, APG, MD 20101 (USA). gregory.w.peterson.civ@mail.mil.
authors.forename: Gregory W
authors.initials: GW
authors.lastname: Peterson
keywords: UiO-66; hierarchical porosity; mesoporous materials; metal-organic frameworks; plasma etching