title: Atomic Layer Deposition from Dissolved Precursors.
abstract: We establish a novel thin film deposition technique by transferring the principles of atomic layer deposition (ALD) known with gaseous precursors toward precursors dissolved in a liquid. An established ALD reaction behaves similarly when performed from solutions. "Solution ALD" (sALD) can coat deep pores in a conformal manner. sALD offers novel opportunities by overcoming the need for volatile and thermally robust precursors. We establish a MgO sALD procedure based on the hydrolysis of a Grignard reagent.
authors.affiliation: Department of Chemistry and Pharmacy, Friedrich-Alexander University of Erlangen-Nürnberg , Egerlandstrasse 1, D-91058 Erlangen, Germany.
authors.forename: Yanlin
authors.initials: Y
authors.lastname: Wu
authors.affiliation: Department of Chemistry and Pharmacy, Friedrich-Alexander University of Erlangen-Nürnberg , Egerlandstrasse 1, D-91058 Erlangen, Germany.
authors.forename: Dirk
authors.initials: D
authors.lastname: Döhler
authors.affiliation: CNRS, CINaM UMR 7325, Aix Marseille Université , F-13288 Marseille, France.
authors.forename: Maïssa
authors.initials: M
authors.lastname: Barr
authors.affiliation: Departments of Chemistry and Physics, University of Hamburg , Sedanstrasse 19, D-20146 Hamburg, Germany.
authors.forename: Elina
authors.initials: E
authors.lastname: Oks
authors.affiliation: Departments of Chemistry and Physics, University of Hamburg , Sedanstrasse 19, D-20146 Hamburg, Germany.
authors.forename: Marc
authors.initials: M
authors.lastname: Wolf
authors.affiliation: CNRS, CINaM UMR 7325, Aix Marseille Université , F-13288 Marseille, France.
authors.forename: Lionel
authors.initials: L
authors.lastname: Santinacci
authors.affiliation: Department of Chemistry and Pharmacy, Friedrich-Alexander University of Erlangen-Nürnberg , Egerlandstrasse 1, D-91058 Erlangen, Germany.|Departments of Chemistry and Physics, University of Hamburg , Sedanstrasse 19, D-20146 Hamburg, Germany.
authors.forename: Julien
authors.initials: J
authors.lastname: Bachmann
keywords: Atomic layer deposition; LBL; SILAR; magnesium oxide; microfluidic; thin films