title: Demonstration of the high collection efficiency of a broadband Mo/Si multilayer mirror with a graded multilayer coating on an ellipsoidal substrate.
abstract: A graded and broadband Mo/Si multilayer mirror for EUV spectroscopy is demonstrated. This mirror has an average reflectivity profile of 16% in the wavelength region from 15 nm to 17 nm and an effective area of 1100-1500 mm(2). This reflectivity is about 4 times larger than that of a standard Mo/Si multilayer mirror on a 1 in. diameter substrate, showing that the mirror can be used for measuring EUV fluorescence at wavelengths in the region around 15 nm to 17 nm.
authors.affiliation: NTT Advanced Technology Corporation, 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0124, Japan.
authors.forename: S
authors.initials: S
authors.lastname: Ichimaru
authors.affiliation: NTT Advanced Technology Corporation, 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0124, Japan.
authors.forename: H
authors.initials: H
authors.lastname: Takenaka
authors.affiliation: Tokyo Gakugei University, Koganei, Tokyo 184-8501, Japan.
authors.forename: K
authors.initials: K
authors.lastname: Namikawa
authors.affiliation: Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, USA.
authors.forename: E M
authors.initials: EM
authors.lastname: Gullikson
authors.affiliation: Quantum Beam Science Center, Japan Atomic Energy Agency, 8-1-7, Umemidai, Kizugawa, Kyoto 619-0215, Japan.
authors.forename: M
authors.initials: M
authors.lastname: Maruyama
authors.affiliation: NTT Advanced Technology Corporation, 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0124, Japan.
authors.forename: S
authors.initials: S
authors.lastname: Oku