title: Continuum models of focused electron beam induced processing.
abstract: Focused electron beam induced processing (FEBIP) is a suite of direct-write, high resolution techniques that enable fabrication and editing of nanostructured materials inside scanning electron microscopes and other focused electron beam (FEB) systems. Here we detail continuum techniques that are used to model FEBIP, and release software that can be used to simulate a wide range of processes reported in the FEBIP literature. These include: (i) etching and deposition performed using precursors that interact with a surface through physisorption and activated chemisorption, (ii) gas mixtures used to perform simultaneous focused electron beam induced etching and deposition (FEBIE and FEBID), and (iii) etch processes that proceed through multiple reaction pathways and generate a number of reaction products at the substrate surface. We also review and release software for Monte Carlo modeling of the precursor gas flux which is needed as an input parameter for continuum FEBIP models.
authors.affiliation: School of Physics and Advanced Materials, University of Technology, Sydney, 15 Broadway, Ultimo, New South Wales 2007, Australia.
authors.forename: Milos
authors.initials: M
authors.lastname: Toth
authors.affiliation: School of Physics and Advanced Materials, University of Technology, Sydney, 15 Broadway, Ultimo, New South Wales 2007, Australia.
authors.forename: Charlene
authors.initials: C
authors.lastname: Lobo
authors.affiliation: Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, 3602 Thun, Switzerland.
authors.forename: Vinzenz
authors.initials: V
authors.lastname: Friedli
authors.affiliation: Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, 3602 Thun, Switzerland ; AGH University of Science and Technology, Academic Centre for Materials and Nanotechnology, al. A. Mickiewicza 30, 30-059 Krakow, Poland.
authors.forename: Aleksandra
authors.initials: A
authors.lastname: Szkudlarek
authors.affiliation: Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, 3602 Thun, Switzerland.
authors.forename: Ivo
authors.initials: I
authors.lastname: Utke
keywords: continuum model; deposition; electron beam processing; etching; gas injection system