title: Thermally Induced Dynamics of Dislocations in Graphene at Atomic Resolution.
abstract: Thermally induced dislocation movements are important in understanding the effects of high temperature annealing on modifying the crystal structure. We use an in situ heating holder in an aberration corrected transmission electron microscopy to study the movement of dislocations in suspended monolayer graphene up to 800 °C. Control of temperature enables the differentiation of electron beam induced effects and thermally driven processes. At room temperature, the dynamics of dislocation behavior is driven by the electron beam irradiation at 80 kV; however at higher temperatures, increased movement of the dislocation is observed and provides evidence for the influence of thermal energy to the system. An analysis of the dislocation movement shows both climb and glide processes, including new complex pathways for migration and large nanoscale rapid jumps between fixed positions in the lattice. The improved understanding of the high temperature dislocation movement provides insights into annealing processes in graphene and the behavior of defects with increased heat.
authors.affiliation: Department of Materials, University of Oxford , Parks Road, Oxford OX1 3PH, United Kingdom.
authors.forename: Chuncheng
authors.initials: C
authors.lastname: Gong
authors.affiliation: Department of Materials, University of Oxford , Parks Road, Oxford OX1 3PH, United Kingdom.
authors.forename: Alex W
authors.initials: AW
authors.lastname: Robertson
authors.affiliation: Department of Materials, University of Oxford , Parks Road, Oxford OX1 3PH, United Kingdom.
authors.forename: Kuang
authors.initials: K
authors.lastname: He
authors.affiliation: Department of Materials Science and Engineering, Seoul National University , Seoul 151-742, Korea.
authors.forename: Gun-Do
authors.initials: GD
authors.lastname: Lee
authors.affiliation: Department of Materials Science and Engineering, Seoul National University , Seoul 151-742, Korea.
authors.forename: Euijoon
authors.initials: E
authors.lastname: Yoon
authors.affiliation: Department of Materials, University of Oxford , Parks Road, Oxford OX1 3PH, United Kingdom.
authors.forename: Christopher S
authors.initials: CS
authors.lastname: Allen
authors.affiliation: Department of Materials, University of Oxford , Parks Road, Oxford OX1 3PH, United Kingdom.
authors.forename: Angus I
authors.initials: AI
authors.lastname: Kirkland
authors.affiliation: Department of Materials, University of Oxford , Parks Road, Oxford OX1 3PH, United Kingdom.
authors.forename: Jamie H
authors.initials: JH
authors.lastname: Warner
keywords: 2D; TEM; aberration-corrected; defects; dislocations; graphene