title: Extreme ultraviolet proximity lithography for fast, flexible and parallel fabrication of infrared antennas.
abstract: We present a method for fabrication of large arrays of nano-antennas using extreme-ultraviolet (EUV) illumination. A discharge-produced plasma source generating EUV radiation around 10.88 nm wavelength is used for the illumination of a photoresist via a mask in a proximity printing setup. The method of metallic nanoantennas fabrication utilizes a bilayer photoresist and employs a lift-off process. The impact of Fresnel-diffraction of EUV light in the mask on a shape of the nanostructures has been investigated. It is shown how by the use of the same rectangular apertures in the transmission mask, antennas of various shapes can be fabricated. Using Fourier transform infrared spectroscopy, spectra of antennas reflectivity were measured and compared to FDTD simulations demonstrating good agreement.
authors.forename: Georg
authors.initials: G
authors.lastname: Kunkemöller
authors.forename: Tobias W W
authors.initials: TW
authors.lastname: Mass
authors.forename: Ann-Katrin U
authors.initials: AK
authors.lastname: Michel
authors.forename: Hyun-Su
authors.initials: HS
authors.lastname: Kim
authors.forename: Sascha
authors.initials: S
authors.lastname: Brose
authors.forename: Serhiy
authors.initials: S
authors.lastname: Danylyuk
authors.forename: Thomas
authors.initials: T
authors.lastname: Taubner
authors.forename: Larissa
authors.initials: L
authors.lastname: Juschkin