title: Nanoscale and Single-Dot Patterning of Colloidal Quantum Dots.
abstract: Using an optimized lift-off process we develop a technique for both nanoscale and single-dot patterning of colloidal quantum dot films, demonstrating feature sizes down to ~30 nm for uniform films and a yield of 40% for single-dot positioning, which is in good agreement with a newly developed theoretical model. While first of all presenting a unique tool for studying physics of single quantum dots, the process also provides a pathway toward practical quantum dot-based optoelectronic devices.
authors.forename: Weiqiang
authors.initials: W
authors.lastname: Xie
authors.affiliation: Physics and Chemistry of Nanostructures, Ghent University , Krijgslaan 281-S3, 9000 Ghent, Belgium.
authors.forename: Raquel
authors.initials: R
authors.lastname: Gomes
authors.affiliation: Physics and Chemistry of Nanostructures, Ghent University , Krijgslaan 281-S3, 9000 Ghent, Belgium.
authors.forename: Tangi
authors.initials: T
authors.lastname: Aubert
authors.affiliation: Physics and Chemistry of Nanostructures, Ghent University , Krijgslaan 281-S3, 9000 Ghent, Belgium.
authors.forename: Suzanne
authors.initials: S
authors.lastname: Bisschop
authors.forename: Yunpeng
authors.initials: Y
authors.lastname: Zhu
authors.affiliation: Physics and Chemistry of Nanostructures, Ghent University , Krijgslaan 281-S3, 9000 Ghent, Belgium.
authors.forename: Zeger
authors.initials: Z
authors.lastname: Hens
authors.affiliation: Physics and Chemistry of Nanostructures, Ghent University , Krijgslaan 281-S3, 9000 Ghent, Belgium.
authors.forename: Edouard
authors.initials: E
authors.lastname: Brainis
authors.forename: Dries
authors.initials: D
authors.lastname: Van Thourhout
keywords: Colloidal quantum dots; Langmuir−Blodgett; lift-off; nanoscale patterning; single-dot positioning