title: Wettability Contrast Gravure Printing.
abstract: Silicon gravure patterns are engineered to have cells that are wettable and lands that are not wettable by aqueous inks. This strategy allows excess ink on the lands to be removed without using a doctor blade. Using an aqueous silica ink, continuous lines as narrow as 1.2 μm with 1.5 μm space are gravure printed.
authors.affiliation: Department of Chemical Engineering and Materials Science, University of Minnesota, 421 Washington Avenue S.E. Minneapolis, MN, 55455, USA.
authors.forename: Heng
authors.initials: H
authors.lastname: Zhang
authors.affiliation: Department of Chemical Engineering and Materials Science, University of Minnesota, 421 Washington Avenue S.E. Minneapolis, MN, 55455, USA.
authors.forename: Alexander
authors.initials: A
authors.lastname: Ramm
authors.affiliation: Department of Chemical Engineering and Materials Science, University of Minnesota, 421 Washington Avenue S.E. Minneapolis, MN, 55455, USA.
authors.forename: Sooman
authors.initials: S
authors.lastname: Lim
authors.affiliation: Department of Chemical Engineering and Materials Science, University of Minnesota, 421 Washington Avenue S.E. Minneapolis, MN, 55455, USA.
authors.forename: Wei
authors.initials: W
authors.lastname: Xie
authors.affiliation: School of Engineering and Applied Sciences, Wyss Institute for Biologically Inspired Engineering, Harvard University, Cambridge, MA, 02318, USA.
authors.forename: Bok Yeop
authors.initials: BY
authors.lastname: Ahn
authors.affiliation: Department of Chemical Engineering and Materials Science, University of Minnesota, 421 Washington Avenue S.E. Minneapolis, MN, 55455, USA.
authors.forename: WeiChao
authors.initials: W
authors.lastname: Xu
authors.affiliation: Department of Chemical Engineering and Materials Science, University of Minnesota, 421 Washington Avenue S.E. Minneapolis, MN, 55455, USA.
authors.forename: Ankit
authors.initials: A
authors.lastname: Mahajan
authors.affiliation: Department of Chemical Engineering and Materials Science, University of Minnesota, 421 Washington Avenue S.E. Minneapolis, MN, 55455, USA.
authors.forename: Wieslaw J
authors.initials: WJ
authors.lastname: Suszynski
authors.affiliation: Department of Chemical Engineering and Materials Science, University of Minnesota, 421 Washington Avenue S.E. Minneapolis, MN, 55455, USA.
authors.forename: Chris
authors.initials: C
authors.lastname: Kim
authors.affiliation: School of Engineering and Applied Sciences, Wyss Institute for Biologically Inspired Engineering, Harvard University, Cambridge, MA, 02318, USA.
authors.forename: Jennifer A
authors.initials: JA
authors.lastname: Lewis
authors.affiliation: Department of Chemical Engineering and Materials Science, University of Minnesota, 421 Washington Avenue S.E. Minneapolis, MN, 55455, USA.
authors.forename: C Daniel
authors.initials: CD
authors.lastname: Frisbie
authors.affiliation: Department of Chemical Engineering and Materials Science, University of Minnesota, 421 Washington Avenue S.E. Minneapolis, MN, 55455, USA.
authors.forename: Lorraine F
authors.initials: LF
authors.lastname: Francis
mesh_terms: D006046:Gold / Q000737:chemistry; D007281:Ink; D008855:Microscopy, Electron, Scanning; D053758:Nanoparticles / Q000737:chemistry; D009532:Nickel / Q000737:chemistry; D012117:Resins, Synthetic / Q000737:chemistry; D012822:Silicon Dioxide / Q000737:chemistry; D017155:Wettability
chemical_list: D012117:Resins, Synthetic; C029945:polyimide resin; D006046:Gold; D012822:Silicon Dioxide; D009532:Nickel
keywords: flexible electronics; gravure printing; nanoparticle inks; printing; wettability contrast