Time-Resolved Gas-Phase Kinetic, Quantum Chemical, and RRKM Studies of the Reaction of Silylene with 2,5-Dihydrofuran.
Time-resolved kinetics studies of silylene, SiH2, generated by laser flash photolysis of phenylsilane, were performed to obtain rate coefficients for its bimolecular reaction with 2,5-dihydrofuran (2,5-DHF). The reaction was studied in the gas phase over the pressure range of 1-100 Torr in SF6 bath gas, at five temperatures in the range of 296-598 K. The reaction showed pressure dependences characteristic of a third body assisted association. The second-order rate coefficients obtained by Rice-Ramsperger-Kassel-Marcus (RRKM)-assisted extrapolation to the high-pressure limit at each temperature fitted the following Arrhenius equation where the error limits are single standard deviations: log(k/cm(3) molecule(-1) s(-1)) = (-9.96 ± 0.08) + (3.38 ± 0.62 kJ mol(-1))/RT ln 10. End-product analysis revealed no GC-identifiable product. Quantum chemical (ab initio) calculations indicate that reaction of SiH2 with 2,5-DHF can occur at both the double bond (to form a silirane) and the O atom (to form a donor-acceptor, zwitterionic complex) via barrierless processes. Further possible reaction steps were explored, of which the only viable one appears to be decomposition of the O-complex to give 1,3-butadiene + silanone, although isomerization of the silirane cannot be completely ruled out. The potential energy surface for SiH2 + 2,5-DHF is consistent with that of SiH2 with Me2O, and with that of SiH2 with cis-but-2-ene, the simplest reference reactions. RRKM calculations incorporating reaction at both π- and O atom sites, can be made to fit the experimental rate coefficient pressure dependence curves at 296-476 K, giving values for k(∞)(π) and k(∞)(O) that indicate the latter is larger in magnitude at all temperatures, in contrast to values from individual model reactions. This unexpected result suggests that, in 2,5-DHF with its two different reaction sites, the O atom exerts the more pronounced electrophilic attraction on the approaching silylene. Arrhenius parameters for the individual pathways were obtained. The lack of a fit at 598 K is consistent with decomposition of the O-complex to give 1,3-butadiene + silanone.
Instituto de Quimica-Fisica "Rocasolano", CSIC , C/Serrano 119, 28006 Madrid, Spain.
Rosa
R
Becerra
Dow Corning Corporation , 2200 West Salzburg Road, Midland, Michigan 48641, United States.
J Pat
JP
Cannady
Department of Chemistry, University of Reading , Whiteknights, P.O. Box 224, Reading, RG6 6AD, U.K.
Christian
C
Pfrang
Department of Chemistry, University of Reading , Whiteknights, P.O. Box 224, Reading, RG6 6AD, U.K.
Robin
R
Walsh