Conditions for high yield of selective-area epitaxy InAs nanowires on SiO x /Si(111) substrates.
Experimental data and a model are presented which define the boundary values of V/III flux ratio and growth temperature for droplet-assisted nucleation of InAs semiconductor nanowires in selective-area epitaxy on SiO(x)/Si (111) substrates by molecular beam epitaxy. Within these boundaries, the substrate receives a balanced flux of group III and V materials allowing the growth of vertically oriented nanowires as compared to the formation of droplets or crystallites.
Department of Engineering Physics, McMaster University, Hamilton, Ontario, L8S4L7, Canada.
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Robson
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Dubrovskii
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LaPierre