title: Atomic mapping of Ruddlesden-Popper faults in transparent conducting BaSnO3-based thin films.
abstract: Doped BaSnO3 has arisen many interests recently as one of the promising transparent conducting oxides for future applications. Understanding the microstructural characteristics are crucial for the exploration of relevant devices. In this paper, we investigated the microstructural features of 0.001% La doped BaSnO3 thin film using both conventional and aberration corrected transmission electron microscopes. Contrast analysis shows high densities of Ruddlesden-Popper faults in the film, which are on {100} planes with translational displacements of 1/2a < 111 > . Atomic EELS element mappings reveal that the Ruddlesden-Popper faults are Ba-O layer terminated, and two kinds of kink structures at the Ruddlesden-Popper faults with different element distributions are also demonstrated. Quantitative analysis on lattice distortions of the Ruddlesden-Popper faults illustrates that the local lattice spacing poses a huge increment of 36%, indicating that large strains exist around the Ruddlesden-Popper faults in the film.
authors.affiliation: Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Wenhua Road 72, Shenyang 110016, China.
authors.forename: W Y
authors.initials: WY
authors.lastname: Wang
authors.affiliation: Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Wenhua Road 72, Shenyang 110016, China.
authors.forename: Y L
authors.initials: YL
authors.lastname: Tang
authors.affiliation: Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Wenhua Road 72, Shenyang 110016, China.
authors.forename: Y L
authors.initials: YL
authors.lastname: Zhu
authors.affiliation: Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Wenhua Road 72, Shenyang 110016, China.
authors.forename: J
authors.initials: J
authors.lastname: Suriyaprakash
authors.affiliation: Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Wenhua Road 72, Shenyang 110016, China.
authors.forename: Y B
authors.initials: YB
authors.lastname: Xu
authors.affiliation: Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Wenhua Road 72, Shenyang 110016, China.
authors.forename: Y
authors.initials: Y
authors.lastname: Liu
authors.affiliation: Rutgers Center for Emergent Materials and Department of Physics &Astronomy, Rutgers University, Piscataway, New Jersey 08854, USA.
authors.forename: B
authors.initials: B
authors.lastname: Gao
authors.affiliation: Rutgers Center for Emergent Materials and Department of Physics &Astronomy, Rutgers University, Piscataway, New Jersey 08854, USA.
authors.forename: S-W
authors.initials: SW
authors.lastname: Cheong
authors.affiliation: Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Wenhua Road 72, Shenyang 110016, China.
authors.forename: X L
authors.initials: XL
authors.lastname: Ma