title: High throughput optical lithography by scanning a massive array of bowtie aperture antennas at near-field.
abstract: Optical lithography, the enabling process for defining features, has been widely used in semiconductor industry and many other nanotechnology applications. Advances of nanotechnology require developments of high-throughput optical lithography capabilities to overcome the optical diffraction limit and meet the ever-decreasing device dimensions. We report our recent experimental advancements to scale up diffraction unlimited optical lithography in a massive scale using the near field nanolithography capabilities of bowtie apertures. A record number of near-field optical elements, an array of 1,024 bowtie antenna apertures, are simultaneously employed to generate a large number of patterns by carefully controlling their working distances over the entire array using an optical gap metrology system. Our experimental results reiterated the ability of using massively-parallel near-field devices to achieve high-throughput optical nanolithography, which can be promising for many important nanotechnology applications such as computation, data storage, communication, and energy.
authors.affiliation: School of Mechanical Engineering and Birck Nanotechnology Center, Purdue University, West Lafayette, Indiana 47906.|Center for Micro- and Nanoscale Research and Fabrication, Hefei National Laboratory for Physical Sciences at the Microscale, University of Science and Technology of China, Hefei, Anhui, 230026, China.|Department of Optics and Optical Engineering, the University of Science and Technology of China, Hefei, Anhui 230026, China.
authors.forename: X
authors.initials: X
authors.lastname: Wen
authors.affiliation: School of Mechanical Engineering and Birck Nanotechnology Center, Purdue University, West Lafayette, Indiana 47906.
authors.forename: A
authors.initials: A
authors.lastname: Datta
authors.affiliation: School of Mechanical Engineering and Birck Nanotechnology Center, Purdue University, West Lafayette, Indiana 47906.
authors.forename: L M
authors.initials: LM
authors.lastname: Traverso
authors.affiliation: School of Mechanical Engineering and Birck Nanotechnology Center, Purdue University, West Lafayette, Indiana 47906.
authors.forename: L
authors.initials: L
authors.lastname: Pan
authors.affiliation: School of Mechanical Engineering and Birck Nanotechnology Center, Purdue University, West Lafayette, Indiana 47906.
authors.forename: X
authors.initials: X
authors.lastname: Xu
authors.affiliation: Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139.
authors.forename: E E
authors.initials: EE
authors.lastname: Moon