title: X-ray-induced Cu deposition and patterning on insulators at room temperature.
abstract: X-ray irradiation is shown to trigger the deposition of Cu from solution, at room temperature, on a wide variety of insulating substrates: glass, passivated Si, TiN/Ti/SiO2/Si and photoresists like PMMA and SU-8. The process is suitable for patterning and the products can be used as seeds for electroplating of thicker overlayers.
authors.affiliation: Institute of Physics, Academia Sinica, Nankang, Taipei 115, Taiwan.
authors.forename: Pei-Cheng
authors.initials: PC
authors.lastname: Hsu
authors.affiliation: Institute of Physics, Academia Sinica, Nankang, Taipei 115, Taiwan.
authors.forename: Yu-Sheng
authors.initials: YS
authors.lastname: Chen
authors.affiliation: Institute of Physics, Academia Sinica, Nankang, Taipei 115, Taiwan.
authors.forename: Yeukuang
authors.initials: Y
authors.lastname: Hwu
authors.affiliation: X-ray Imaging Center, Pohang University of Science and Technology, Pohang, Taiwan.
authors.forename: J H
authors.initials: JH
authors.lastname: Je
authors.affiliation: Faculté des Sciences de Base, Ecole Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.
authors.forename: G
authors.initials: G
authors.lastname: Margaritondo
authors.affiliation: Physics Department, National University of Singapore, Singapore.
authors.forename: Eng Soon
authors.initials: ES
authors.lastname: Tok
keywords: X-ray synthesis; copper seed layer; electroless plating; micro-patterning