title: Structural and Dielectric Properties of Subnanometric Laminates of Binary Oxides.
abstract: Capacitors with a dielectric material consisting of amorphous laminates of Al2O3 and TiO2 with subnanometer individual layer thicknesses can show strongly enhanced capacitance densities compared to the bulk or laminates with nanometer layer thickness. In this study, the structural and dielectric properties of such subnanometer laminates grown on silicon by state-of-the-art atomic layer deposition are investigated with varying electrode materials. The laminates show a dielectric constant reaching 95 combined with a dielectric loss (tan δ) of about 0.2. The differences of the observed dielectric properties in capacitors with varying electrodes indicate that chemical effects at the interface with the TiN electrode play a major role, while the influence of the local roughness of the individual layers is rather limited.
authors.affiliation: CRISMAT, UMR 6508, CNRS-ENSICAEN, Normandie Université , 6 Blvd Maréchal Juin, 14000 Caen Cedex, France.
authors.forename: Abdelkader
authors.initials: A
authors.lastname: Kahouli
authors.affiliation: CRISMAT, UMR 6508, CNRS-ENSICAEN, Normandie Université , 6 Blvd Maréchal Juin, 14000 Caen Cedex, France.
authors.forename: Oleg
authors.initials: O
authors.lastname: Lebedev
authors.affiliation: CRISMAT, UMR 6508, CNRS-ENSICAEN, Normandie Université , 6 Blvd Maréchal Juin, 14000 Caen Cedex, France.
authors.forename: Marwa
authors.initials: M
authors.lastname: Ben Elbahri
authors.affiliation: CRISMAT, UMR 6508, CNRS-ENSICAEN, Normandie Université , 6 Blvd Maréchal Juin, 14000 Caen Cedex, France.
authors.forename: Bernard
authors.initials: B
authors.lastname: Mercey
authors.affiliation: CRISMAT, UMR 6508, CNRS-ENSICAEN, Normandie Université , 6 Blvd Maréchal Juin, 14000 Caen Cedex, France.
authors.forename: Wilfrid
authors.initials: W
authors.lastname: Prellier
authors.affiliation: Center Nanoelectronic Technologies, Fraunhofer Institute for Photonic Microsystems , Königsbrücker Strasse 178, 01099 Dresden, Germany.
authors.forename: Stefan
authors.initials: S
authors.lastname: Riedel
authors.affiliation: Center Nanoelectronic Technologies, Fraunhofer Institute for Photonic Microsystems , Königsbrücker Strasse 178, 01099 Dresden, Germany.
authors.forename: Malte
authors.initials: M
authors.lastname: Czernohorsky
authors.affiliation: IPDiA , 2 rue de la Girafe, 14000 Caen Cedex, France.
authors.forename: Florent
authors.initials: F
authors.lastname: Lallemand
authors.affiliation: IPDiA , 2 rue de la Girafe, 14000 Caen Cedex, France.
authors.forename: Catherine
authors.initials: C
authors.lastname: Bunel
authors.affiliation: CRISMAT, UMR 6508, CNRS-ENSICAEN, Normandie Université , 6 Blvd Maréchal Juin, 14000 Caen Cedex, France.
authors.forename: Ulrike
authors.initials: U
authors.lastname: Lüders
keywords: alumina; binary oxide; dielectrics; laminate; thin film; titanium dioxide