title: In situ analysis of copper electrodeposition reaction using unilateral NMR sensor.
abstract: The uses of high-resolution NMR spectroscopy and imaging (MRI) to study electrochemical reactions in situ have greatly increased in the last decade. However, most of these applications are limited to specialized NMR laboratories and not feasible for routine analysis. Recently we have shown that a bench top, time domain NMR spectrometer can be used to monitor in situ copper electrodeposition reaction and the effect of Lorentz force in the reaction rate. However these spectrometers limit the cell size to the magnet gap and cannot be used with standard electrochemical cells. In this paper we are demonstrating that unilateral NMR sensor (UNMR), which does not limit sample size/volume, can be used to monitor electrodeposition of paramagnetic ions in situ. The copper electrodeposition reaction was monitored remotely and in situ, placing the electrochemical cell on top of the UNMR sensor. The Cu(2+) concentration was measured during three hours of the electrodeposition reactions, by using the transverse relaxation rate (R2) determined with the Carr-Purcell-Meiboom-Gill pulse sequence. The reaction rate increased fourfold when the reaction was performed in the presence of a magnetic field (in situ), in comparison to the reactions in the absence of the magnetic field (ex situ). The increase of reaction rate, in the presence of the UNMR magnet, was related to the magneto hydrodynamic force (FB) and magnetic field gradient force (F∇B). F∇B was calculated to be one order of magnitude stronger than FB. The UNMR sensor has several advantages for in situ measurements when compared to standard NMR spectrometers. It is a low cost, portable, open system, which does not limit sample size/volume and can be easily be adapted to standard electrochemical cells or large industrial reactors.
authors.affiliation: Instituto de Química de São Carlos, Universidade de São Paulo, Avenida Trabalhador São-Carlense 400, São Carlos, SP 13560-070, Brazil.
authors.forename: B F
authors.initials: BF
authors.lastname: Gomes
authors.affiliation: Instituto de Química de São Carlos, Universidade de São Paulo, Avenida Trabalhador São-Carlense 400, São Carlos, SP 13560-070, Brazil.
authors.forename: L M S
authors.initials: LM
authors.lastname: Nunes
authors.affiliation: Instituto de Química de São Carlos, Universidade de São Paulo, Avenida Trabalhador São-Carlense 400, São Carlos, SP 13560-070, Brazil.
authors.forename: C M S
authors.initials: CM
authors.lastname: Lobo
authors.affiliation: Instituto de Química de São Carlos, Universidade de São Paulo, Avenida Trabalhador São-Carlense 400, São Carlos, SP 13560-070, Brazil.
authors.forename: A S
authors.initials: AS
authors.lastname: Carvalho
authors.affiliation: Universidade Tecnológica Federal do Paraná - UTFPR, Londrina, PR, Brazil.
authors.forename: L F
authors.initials: LF
authors.lastname: Cabeça
authors.affiliation: Embrapa Instrumentação, Rua XV de Novembro 1452, São Carlos, SP 13560-970, Brazil. Electronic address: luiz.colnago@embrapa.br.
authors.forename: L A
authors.initials: LA
authors.lastname: Colnago
keywords: Copper electrodeposition; Magnetoelectrolysis; Unilateral NMR sensor