title: Nanoscale Structuring of Surfaces by Using Atomic Layer Deposition.
abstract: Controlled structuring of surfaces is interesting for a wide variety of areas, including microelectronic device fabrication, optical devices, bio(sensing), (electro-, photo)catalysis, batteries, solar cells, fuel cells, and sorption. A unique feature of atomic layer deposition (ALD) is the possibility to form conformal uniform coatings on arbitrarily shaped materials with controlled atomic-scale thickness. In this Minireview, we discuss the potential of ALD for the nanoscale structuring of surfaces, highlighting its versatile application to structuring both planar substrates and powder materials. Recent progress in the application of ALD to porous substrates has even made the nanoscale structuring of high-surface-area materials now feasible, thereby enabling novel applications, such as those in the fields of catalysis and alternative energy.
authors.affiliation: Eduard-Zintl-Institut für Anorganische und Physikalische Chemie, Technische Universität Darmstadt, Alarich-Weiss-Strasse 8, 64287 Darmstadt (Germany).
authors.forename: Nicolas
authors.initials: N
authors.lastname: Sobel
authors.affiliation: Eduard-Zintl-Institut für Anorganische und Physikalische Chemie, Technische Universität Darmstadt, Alarich-Weiss-Strasse 8, 64287 Darmstadt (Germany). hess@pc.chemie.tu-darmstadt.de.
authors.forename: Christian
authors.initials: C
authors.lastname: Hess
keywords: atomic layer deposition; nanoscale; porous materials; structuring; surface chemistry