title: Defect-Induced Nucleation and Epitaxy: A New Strategy toward the Rational Synthesis of WZ-GaN/3C-SiC Core-Shell Heterostructures.
abstract: In this work, we demonstrate a new strategy to create WZ-GaN/3C-SiC heterostructure nanowires, which feature controllable morphologies. The latter is realized by exploiting the stacking faults in 3C-SiC as preferential nucleation sites for the growth of WZ-GaN. Initially, cubic SiC nanowires with an average diameter of ∼100 nm, which display periodic stacking fault sections, are synthesized in a chemical vapor deposition (CVD) process to serve as the core of the heterostructure. Subsequently, hexagonal wurtzite-type GaN shells with different shapes are grown on the surface of 3C-SiC wire core. In this context, it is possible to obtain two types of WZ-GaN/3C-SiC heterostructure nanowires by means of carefully controlling the corresponding CVD reactions. Here, the stacking faults, initially formed in 3C-SiC nanowires, play a key role in guiding the epitaxial growth of WZ-GaN as they represent surface areas of the 3C-SiC nanowires that feature a higher surface energy. A dedicated structural analysis of the interfacial region by means of high-resolution transmission electron microscopy (HRTEM) revealed that the disordering of the atom arrangements in the SiC defect area promotes a lattice-matching with respect to the WZ-GaN phase, which results in a preferential nucleation. All WZ-GaN crystal domains exhibit an epitaxial growth on 3C-SiC featuring a crystallographic relationship of [12̅10](WZ-GaN) //[011̅](3C-SiC), (0001)(WZ-GaN)//(111)(3C-SiC), and d(WZ-GaN(0001)) ≈ 2d(3C-SiC(111)). The approach to utilize structural defects of a nanowire core to induce a preferential nucleation of foreign shells generally opens up a number of opportunities for the epitaxial growth of a wide range of semiconductor nanostructures which are otherwise impossible to acquire. Consequently, this concept possesses tremendous potential for the applications of semiconductor heterostructures in various fields such as optics, electrics, electronics, and photocatalysis for energy harvesting and environment processing.
authors.forename: Baodan
authors.initials: B
authors.lastname: Liu
authors.forename: Bing
authors.initials: B
authors.lastname: Yang
authors.forename: Fang
authors.initials: F
authors.lastname: Yuan
authors.forename: Qingyun
authors.initials: Q
authors.lastname: Liu
authors.forename: Dan
authors.initials: D
authors.lastname: Shi
authors.forename: Chunhai
authors.initials: C
authors.lastname: Jiang
authors.forename: Jinsong
authors.initials: J
authors.lastname: Zhang
authors.affiliation: Institute of Materials Engineering, University of Siegen, Germany , Paul-Bonatz-Strasse 9-11, 57076 Siegen, Germany.
authors.forename: Thorsten
authors.initials: T
authors.lastname: Staedler
authors.affiliation: Institute of Materials Engineering, University of Siegen, Germany , Paul-Bonatz-Strasse 9-11, 57076 Siegen, Germany.
authors.forename: Xin
authors.initials: X
authors.lastname: Jiang
keywords: 3C-SiC; Wurtzite GaN; confined epitaxial growth; core−shell heterostructure; stacking faults