title: A simple approach to atom probe sample preparation by using shadow masks.
abstract: Here, we present a new method that utilises shadow masks in a broad ion beam system to prepare atom probe samples. It is particularly suited to non-conductors and materials with surface layers such as surface oxides, implanted layers or thin films. This new approach bypasses the focused ion beam (FIB) lift-out step, increasing the sample throughput, dramatically reducing the required FIB beam time and decreasing the complexity of sample preparation.
authors.affiliation: Australian Centre for Microscopy and Microanalysis, The University of Sydney, 2006, Australia.
authors.forename: Peter
authors.initials: P
authors.lastname: Felfer
authors.affiliation: Australian Centre for Microscopy and Microanalysis, The University of Sydney, 2006, Australia.
authors.forename: Ingrid
authors.initials: I
authors.lastname: McCarroll
authors.affiliation: Materials Department, University of California, Santa Barbara, 93106-5050, USA.
authors.forename: Chandra
authors.initials: C
authors.lastname: Macauley
authors.affiliation: Australian Centre for Microscopy and Microanalysis, The University of Sydney, 2006, Australia.
authors.forename: Julie M
authors.initials: JM
authors.lastname: Cairney
keywords: Atom probe tomography; Broad ion beam; Focused ion beam; Sample preparation