title: Analysis of the laser oxidation kinetics process of In-In(2)O(3) MTMO photomasks by laser direct writing.
abstract: One kind of novel grayscale photomask based on Metal-transparent-metallic-oxides (MTMOs) system fabricated by laser direct writing was demonstrated recently. Here, a multilayer oxidation model of In-In(2)O(3) film with a glass substrate was proposed to study the pulsed laser-induced oxidation mechanism. The distribution of the electromagnetic field in the film is calculated by the transfer matrix method. Temperature fields of the model are simulated based on the heat transfer equations with the Finite-Difference Time-Domain method. The oxidation kinetics process is studied based on the laser-induced Cabrera-Mott theory. The simulated oxidation processes are consistent with the experimental results, which mean that our laser-induced oxidation model can successfully interpret the fabrication mechanism of MTMO grayscale photomasks.
authors.forename: Feng
authors.initials: F
authors.lastname: Xia
authors.forename: Xinzheng
authors.initials: X
authors.lastname: Zhang
authors.forename: Meng
authors.initials: M
authors.lastname: Wang
authors.forename: Qian
authors.initials: Q
authors.lastname: Liu
authors.forename: Jingjun
authors.initials: J
authors.lastname: Xu