title: Focused electron beam induced etching of copper in sulfuric acid solutions.
abstract: We show here that copper can be locally etched by an electron-beam induced reaction in a liquid. Aqueous sulfuric acid (H2SO4) is utilized as the etchant and all experiments are conducted in an environmental scanning electron microscope. The extent of etch increases with liquid thickness and dose, and etch resolution improves with H2SO4 concentration. This approach shows the feasibility of liquid phase etching for material selectivity and has the potential for circuit editing.
authors.affiliation: Department of Electrical and Computer Engineering, University of Kentucky, 453 F. Paul Anderson Tower, Lexington, KY 40506, USA.
authors.forename: Lindsay
authors.initials: L
authors.lastname: Boehme
authors.forename: Matthew
authors.initials: M
authors.lastname: Bresin
authors.forename: Aurélien
authors.initials: A
authors.lastname: Botman
authors.forename: James
authors.initials: J
authors.lastname: Ranney
authors.forename: J Todd
authors.initials: JT
authors.lastname: Hastings