title: Electron Rephasing in a Laser-Wakefield Accelerator.
abstract: An important limit for energy gain in laser-plasma wakefield accelerators is the dephasing length, after which the electron beam reaches the decelerating region of the wakefield and starts to decelerate. Here, we propose to manipulate the phase of the electron beam in the wakefield, in order to bring the beam back into the accelerating region, hence increasing the final beam energy. This rephasing is operated by placing an upward density step in the beam path. In a first experiment, we demonstrate the principle of this technique using a large energy spread electron beam. Then, we show that it can be used to increase the energy of monoenergetic electron beams by more than 50%.
authors.affiliation: Laboratoire d'Optique Appliquée, ENSTA ParisTech - CNRS UMR7639 - École Polytechnique, Chemin de la Hunière, 91761 Palaiseau, France.
authors.forename: E
authors.initials: E
authors.lastname: Guillaume
authors.affiliation: Laboratoire d'Optique Appliquée, ENSTA ParisTech - CNRS UMR7639 - École Polytechnique, Chemin de la Hunière, 91761 Palaiseau, France.|Centro de Laseres Pulsados, Parque Cientfico, 37185 Villamayor, Salamanca, Spain.
authors.forename: A
authors.initials: A
authors.lastname: Döpp
authors.affiliation: Laboratoire d'Optique Appliquée, ENSTA ParisTech - CNRS UMR7639 - École Polytechnique, Chemin de la Hunière, 91761 Palaiseau, France.
authors.forename: C
authors.initials: C
authors.lastname: Thaury
authors.affiliation: Laboratoire d'Optique Appliquée, ENSTA ParisTech - CNRS UMR7639 - École Polytechnique, Chemin de la Hunière, 91761 Palaiseau, France.
authors.forename: K
authors.initials: K
authors.lastname: Ta Phuoc
authors.affiliation: Laboratoire d'Optique Appliquée, ENSTA ParisTech - CNRS UMR7639 - École Polytechnique, Chemin de la Hunière, 91761 Palaiseau, France.
authors.forename: A
authors.initials: A
authors.lastname: Lifschitz
authors.affiliation: Institute of Physics ASCR, v.v.i. (FZU), ELI Beamlines project, Na Slovance 2, 18221 Prague, Czech Republic.|Czech Technical University in Prague, FNSPE, Brehova 7, 11519 Prague, Czech Republic.
authors.forename: G
authors.initials: G
authors.lastname: Grittani
authors.affiliation: Laboratoire d'Optique Appliquée, ENSTA ParisTech - CNRS UMR7639 - École Polytechnique, Chemin de la Hunière, 91761 Palaiseau, France.
authors.forename: J-P
authors.initials: JP
authors.lastname: Goddet
authors.affiliation: Laboratoire d'Optique Appliquée, ENSTA ParisTech - CNRS UMR7639 - École Polytechnique, Chemin de la Hunière, 91761 Palaiseau, France.
authors.forename: A
authors.initials: A
authors.lastname: Tafzi
authors.affiliation: Max-Planck-Institut für Quantenoptik, Hans-Kopfermann-Strasse 1, 85748 Garching, Germany.
authors.forename: S W
authors.initials: SW
authors.lastname: Chou
authors.affiliation: Max-Planck-Institut für Quantenoptik, Hans-Kopfermann-Strasse 1, 85748 Garching, Germany.
authors.forename: L
authors.initials: L
authors.lastname: Veisz
authors.affiliation: Laboratoire d'Optique Appliquée, ENSTA ParisTech - CNRS UMR7639 - École Polytechnique, Chemin de la Hunière, 91761 Palaiseau, France.
authors.forename: V
authors.initials: V
authors.lastname: Malka