title: Substrate tolerant direct block copolymer nanolithography.
abstract: Block copolymer (BC) self-assembly constitutes a powerful platform for nanolithography. However, there is a need for a general approach to BC lithography that critically considers all the steps from substrate preparation to the final pattern transfer. We present a procedure that significantly simplifies the main stream BC lithography process, showing a broad substrate tolerance and allowing for efficient pattern transfer over wafer scale. PDMS-rich poly(styrene-b-dimethylsiloxane) (PS-b-PDMS) copolymers are directly applied on substrates including polymers, silicon and graphene. A single oxygen plasma treatment enables formation of the oxidized PDMS hard mask, PS block removal and polymer or graphene substrate patterning.
authors.affiliation: Department of Micro- and Nanotechnology, Technical University of Denmark, DK-2800 Kgs. Lyngby, Denmark. sond@nanotech.dtu.dk.
authors.forename: Tao
authors.initials: T
authors.lastname: Li
authors.affiliation: Department of Micro- and Nanotechnology, Technical University of Denmark, DK-2800 Kgs. Lyngby, Denmark. sond@nanotech.dtu.dk and Center for Nanostructured Graphene (CNG), Technical University of Denmark, DK-2800 Kgs. Lyngby, Denmark.
authors.forename: Zhongli
authors.initials: Z
authors.lastname: Wang
authors.affiliation: Department of Micro- and Nanotechnology, Technical University of Denmark, DK-2800 Kgs. Lyngby, Denmark. sond@nanotech.dtu.dk and Center for Nanostructured Graphene (CNG), Technical University of Denmark, DK-2800 Kgs. Lyngby, Denmark.
authors.forename: Lars
authors.initials: L
authors.lastname: Schulte
authors.affiliation: Department of Micro- and Nanotechnology, Technical University of Denmark, DK-2800 Kgs. Lyngby, Denmark. sond@nanotech.dtu.dk and Center for Nanostructured Graphene (CNG), Technical University of Denmark, DK-2800 Kgs. Lyngby, Denmark.
authors.forename: Sokol
authors.initials: S
authors.lastname: Ndoni