title: Amorphous Ultrathin SnO2 Films by Atomic Layer Deposition on Graphene Network as Highly Stable Anodes for Lithium-Ion Batteries.
abstract: Amorphous SnO2 (a-SnO2) thin films were conformally coated onto the surface of reduced graphene oxide (G) using atomic layer deposition (ALD). The electrochemical characteristics of the a-SnO2/G nanocomposites were then determined using cyclic voltammetry and galvanostatic charge/discharge curves. Because the SnO2 ALD films were ultrathin and amorphous, the impact of the large volume expansion of SnO2 upon cycling was greatly reduced. With as few as five formation cycles best reported in the literature, a-SnO2/G nanocomposites reached stable capacities of 800 mAh g(-1) at 100 mA g(-1) and 450 mAh g(-1) at 1000 mA g(-1). The capacity from a-SnO2 is higher than the bulk theoretical values. The extra capacity is attributed to additional interfacial charge storage resulting from the high surface area of the a-SnO2/G nanocomposites. These results demonstrate that metal oxide ALD on high surface area conducting carbon substrates can be used to fabricate high power and high capacity electrode materials for lithium-ion batteries.
authors.affiliation: Wuhan ATMK Super EnerG Technologies, Inc., #7-5 JiaYuan Road, Wuhan 430073, China.
authors.forename: Ming
authors.initials: M
authors.lastname: Xie
authors.affiliation: Department of Mechanical, Aerospace, and Nuclear Engineering, Rensselaer Polytechnic Institute , 110 Eighth Street, Troy, New York 12180, United States.
authors.forename: Xiang
authors.initials: X
authors.lastname: Sun
authors.affiliation: Department of Chemistry and Biochemistry and Department of Mechanical Engineering, University of Colorado at Boulder , Boulder, Colorado 80309, United States.
authors.forename: Steven M
authors.initials: SM
authors.lastname: George
authors.affiliation: Natural Science Department, Lawrence Technological University , Southfield, Michigan 48075, United States.
authors.forename: Changgong
authors.initials: C
authors.lastname: Zhou
authors.affiliation: Department of Mechanical, Aerospace, and Nuclear Engineering, Rensselaer Polytechnic Institute , 110 Eighth Street, Troy, New York 12180, United States.
authors.forename: Jie
authors.initials: J
authors.lastname: Lian
authors.affiliation: College of Chemistry, Chongqing Normal University , Chongqing 401311, China.
authors.forename: Yun
authors.initials: Y
authors.lastname: Zhou
keywords: amorphous SnO2; atomic layer deposition; conformal; critical size; interfacial capacity