title: Greener approach for the extraction of copper metal from electronic waste.
abstract: Technology innovations resulted into a major move from agricultural to industrial economy in last few decades. Consequently, generation of waste electronic and electrical equipments (WEEE) has been increased at a significant rate. WEEE contain large amount of precious and heavy metals and therefore, can be considered a potential secondary resource to overcome the scarcity of metals. Also, presence of these metals may affect the ecosystem due to lack of adequate management of WEEE. Building upon our previous experimental investigations for metal extraction from spent catalyst, present study explores the concept of green technology for WEEE management. Efforts have been made to recover base metal from a printed circuit board using eco-friendly chelation technology and results were compared with the conventional acid leaching method. 83.8% recovery of copper metal was achieved using chelation technology whereas only 27% could be recovered using acid leaching method in absence of any oxidant at optimum reaction conditions. Various characterization studies (energy dispersive X-ray analysis, scanning electron microscopy, X-ray diffraction, inductive coupled plasma spectrophotometry) of Printed Circuit Board (PCB) and residues were performed for qualitative and quantitative analysis of samples. Significant metal extraction, more than 96% recovery of chelating agent, recycling of reactant in next chelation cycle and nearly zero discharge to the environment are the major advantages of the proposed green process which articulate the transcendency of chelation technology over other conventional approaches. Kinetic investigation suggests diffusion controlled process as the rate determining step for the chelate assisted recovery of copper from WEEE with activation energy of 22kJ/mol.
authors.affiliation: Department of Chemical Engineering, Indian Institute of Technology, Delhi, India.
authors.forename: Prashant
authors.initials: P
authors.lastname: Jadhao
authors.affiliation: Department of Chemical Engineering, Indian Institute of Technology, Delhi, India.
authors.forename: Garima
authors.initials: G
authors.lastname: Chauhan
authors.affiliation: Department of Chemical Engineering, Indian Institute of Technology, Delhi, India.
authors.forename: K K
authors.initials: KK
authors.lastname: Pant
authors.affiliation: Department of Chemical Engineering, Indian Institute of Technology, Delhi, India. Electronic address: drkdpn@gmail.com.
authors.forename: K D P
authors.initials: KD
authors.lastname: Nigam
mesh_terms: D002614:Chelating Agents / Q000737:chemistry; D003201:Computers; D003300:Copper / Q000302:isolation & purification*; D004492:Edetic Acid / Q000737:chemistry; D059029:Electronic Waste; D055772:Green Chemistry Technology / Q000379:methods*; D006863:Hydrogen-Ion Concentration; D007700:Kinetics; D008855:Microscopy, Electron, Scanning; D013052:Spectrometry, X-Ray Emission; D013696:Temperature; D014961:X-Ray Diffraction
chemical_list: D002614:Chelating Agents; D003300:Copper; D004492:Edetic Acid
keywords: Acid leaching; Chelating agent; Kinetics; Metal extraction; WEEE