title: Metal-Organic Framework Thin Films as Platforms for Atomic Layer Deposition of Cobalt Ions To Enable Electrocatalytic Water Oxidation.
abstract: Thin films of the metal-organic framework (MOF) NU-1000 were grown on conducting glass substrates. The films uniformly cover the conducting glass substrates and are composed of free-standing sub-micrometer rods. Subsequently, atomic layer deposition (ALD) was utilized to deposit Co(2+) ions throughout the entire MOF film via self-limiting surface-mediated reaction chemistry. The Co ions bind at aqua and hydroxo sites lining the channels of NU-1000, resulting in three-dimensional arrays of separated Co ions in the MOF thin film. The Co-modified MOF thin films demonstrate promising electrocatalytic activity for water oxidation.
authors.affiliation: Department of Chemistry, Northwestern University , 2145 Sheridan Road, Evanston, Illinois 60208, United States.|Department of Chemical Engineering, National Taiwan University , No. 1, Sec. 4, Roosevelt Road, Taipei 10617, Taiwan.
authors.forename: Chung-Wei
authors.initials: CW
authors.lastname: Kung
authors.affiliation: Department of Chemistry, Northwestern University , 2145 Sheridan Road, Evanston, Illinois 60208, United States.
authors.forename: Joseph E
authors.initials: JE
authors.lastname: Mondloch
authors.affiliation: Department of Chemistry, Northwestern University , 2145 Sheridan Road, Evanston, Illinois 60208, United States.
authors.forename: Timothy C
authors.initials: TC
authors.lastname: Wang
authors.affiliation: Department of Chemistry, Northwestern University , 2145 Sheridan Road, Evanston, Illinois 60208, United States.|Department of Chemistry, Warsaw University of Technology , Noakowskiego 3, 00-664 Warsaw, Poland.
authors.forename: Wojciech
authors.initials: W
authors.lastname: Bury
authors.affiliation: Department of Chemistry, Northwestern University , 2145 Sheridan Road, Evanston, Illinois 60208, United States.|Argonne National Laboratory , 9700 South Cass Avenue, Argonne, Illinois 60439, United States.
authors.forename: William
authors.initials: W
authors.lastname: Hoffeditz
authors.affiliation: Department of Chemistry, Northwestern University , 2145 Sheridan Road, Evanston, Illinois 60208, United States.|Argonne National Laboratory , 9700 South Cass Avenue, Argonne, Illinois 60439, United States.
authors.forename: Benjamin M
authors.initials: BM
authors.lastname: Klahr
authors.affiliation: Department of Chemistry, Northwestern University , 2145 Sheridan Road, Evanston, Illinois 60208, United States.
authors.forename: Rachel C
authors.initials: RC
authors.lastname: Klet
authors.affiliation: Argonne National Laboratory , 9700 South Cass Avenue, Argonne, Illinois 60439, United States.
authors.forename: Michael J
authors.initials: MJ
authors.lastname: Pellin
authors.affiliation: Department of Chemistry, Northwestern University , 2145 Sheridan Road, Evanston, Illinois 60208, United States.|Department of Chemistry, Faculty of Science, King Abdulaziz University , Jeddah, Saudi Arabia.
authors.forename: Omar K
authors.initials: OK
authors.lastname: Farha
authors.affiliation: Department of Chemistry, Northwestern University , 2145 Sheridan Road, Evanston, Illinois 60208, United States.|Argonne National Laboratory , 9700 South Cass Avenue, Argonne, Illinois 60439, United States.
authors.forename: Joseph T
authors.initials: JT
authors.lastname: Hupp
keywords: atomic layer deposition; cobalt oxide; electrocatalyst; metal−organic frameworks; pyrene; water oxidation