title: Atomic/molecular layer deposition: a direct gas-phase route to crystalline metal-organic framework thin films.
abstract: Atomic/molecular layer deposition offers us an elegant way of fabricating crystalline copper(ii)terephthalate metal-organic framework (MOF) thin films on various substrate surfaces. The films are grown from two gaseous precursors with a digital atomic/molecular level control for the film thickness under relatively mild conditions in a simple and fast one-step process.
authors.affiliation: Department of Chemistry, Aalto University, Fi-00076 Aalto, Finland. maarit.karppinen@aalto.fi.
authors.forename: E
authors.initials: E
authors.lastname: Ahvenniemi
authors.affiliation: Department of Chemistry, Aalto University, Fi-00076 Aalto, Finland. maarit.karppinen@aalto.fi.
authors.forename: M
authors.initials: M
authors.lastname: Karppinen