title: Phthalimide Compounds Containing a Trifluoromethylphenyl Group and Electron-Donating Aryl Groups: Color-Tuning and Enhancement of Triboluminescence.
abstract: Trifluoromethylphenyl-substituted phthalimide derivatives favorably form triboluminescence (TL) active noncentrosymmetric crystals. Oligothienyl-, oligophenyl-, and naphthyl-substituted phthalimide derivatives were successfully developed as a series of metal free TL compounds. X-ray crystal structure analyses of bithienyl and naphthyl derivatives revealed noncentrosymmetric layer structures in the same direction. Introduction of suitable electron rich π-units such as thienyl groups enhances their photoluminescence and TL characteristics, and the colors can be also controlled in the visible region. A rigid naphthyl-substituted imide derivative exhibits extremely high TL performance.
authors.affiliation: Department of Applied Chemistry, Graduate School of Engineering, University of Hyogo , Himeji, Hyogo 671-2280, Japan.
authors.forename: Jun-ichi
authors.initials: J
authors.lastname: Nishida
authors.affiliation: Department of Electronic Chemistry, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology , Yokohama, Kanagawa 226-8502, Japan.
authors.forename: Hokuto
authors.initials: H
authors.lastname: Ohura
authors.affiliation: Department of Applied Chemistry, Graduate School of Engineering, University of Hyogo , Himeji, Hyogo 671-2280, Japan.
authors.forename: Yasuyuki
authors.initials: Y
authors.lastname: Kita
authors.affiliation: Department of Electronic Chemistry, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology , Yokohama, Kanagawa 226-8502, Japan.
authors.forename: Hiroyuki
authors.initials: H
authors.lastname: Hasegawa
authors.affiliation: Department of Applied Chemistry, Graduate School of Engineering, University of Hyogo , Himeji, Hyogo 671-2280, Japan.
authors.forename: Takeshi
authors.initials: T
authors.lastname: Kawase
authors.affiliation: Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST) , Tsukuba, Ibaraki 305-8565, Japan.
authors.forename: Noriyuki
authors.initials: N
authors.lastname: Takada
authors.affiliation: Rigaku Corporation , Tokyo 196-8666, Japan.
authors.forename: Hiroyasu
authors.initials: H
authors.lastname: Sato
authors.affiliation: Material Analysis Suzukake-dai Center, Technical Department, Tokyo Institute of Technology , Yokohama, Kanagawa 226-8503, Japan.
authors.forename: Yoshihisa
authors.initials: Y
authors.lastname: Sei
authors.affiliation: Department of Electronic Chemistry, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology , Yokohama, Kanagawa 226-8502, Japan.
authors.forename: Yoshiro
authors.initials: Y
authors.lastname: Yamashita