title: [Risk analysis and assessment of occupational hazard fromindiumand its compounds in manufacture of liquid crystal display panel].
abstract: OBJECTIVE
  To understand the exposed positions and levels of indium and its compounds in manufacture of liquid crystal displays, and to evaluate the degree of occupational hazard from indium and its compounds.
  
  
  METHODS
  On-site investigation of occupational health, occupational hazard monitoring, and occupational health examination were used to evaluate the degree of occupational hazard from indium and its compounds in three manufacturers of liquid crystal display panel in Shenzhen, Guangdong, China.
  
  
  RESULTS
  The time-weighted average (TWA) and short-term exposure limit (STEL) concentrations of indium and its compounds to which sputtering machine operating positions were exposed were less than 0.002~0.004 mg/m³ and 0.006~0.007 mg/m³, respectively, both of which complied with the National Hygienic Standard (PC-TWA = 0.1 mg/m³; PC-STEL = 0.3 mg/m³); the TWA and STEL concentrations of indium and its compounds to which grinding positions were exposed were 0.114~2.98 mg/m³ and 0.31~10.02 mg/m³, respectively, both of which exceeded the National Hygienic Standard with the highest concentration 33-fold higher than the standard. No significant health damages were found in exposed workers according to the results of occupational health examination.
  
  
  CONCLUSIONS
  The grinding positions are the key to the control of occupational hazard from indium and its compounds in manufacture of liquid crystal display panel. The workers should be equipped with the anti-particulate full-face respirator, which is an effective way to prevent occupational hazard from indium and its compounds.
authors.affiliation: Shenzhen Protection and Treatment Center for Occupational Diseases, Shen Zhen 518001, China.
authors.forename: Haili
authors.initials: H
authors.lastname: Qiu
authors.affiliation: Shenzhen Protection and Treatment Center for Occupational Diseases, Shen Zhen 518001, China.
authors.forename: Wei
authors.initials: W
authors.lastname: Zhou
authors.affiliation: Shenzhen Protection and Treatment Center for Occupational Diseases, Shen Zhen 518001, China; E-mail: lizhimin567@sina.com.
authors.forename: Zhimin
authors.initials: Z
authors.lastname: Li
authors.affiliation: Shenzhen Protection and Treatment Center for Occupational Diseases, Shen Zhen 518001, China.
authors.forename: Dongchao
authors.initials: D
authors.lastname: Tian
authors.affiliation: Shenzhen Protection and Treatment Center for Occupational Diseases, Shen Zhen 518001, China.
authors.forename: Shaofan
authors.initials: S
authors.lastname: Weng
authors.affiliation: Shenzhen Protection and Treatment Center for Occupational Diseases, Shen Zhen 518001, China.
authors.forename: Juntao
authors.initials: J
authors.lastname: He
mesh_terms: D000395:Air Pollutants, Occupational / Q000633:toxicity*; D002681:China; D003626:Data Display; D006801:Humans; D007204:Indium / Q000633:toxicity*; D050866:Liquid Crystals; D016273:Occupational Exposure / Q000032:analysis*; D016272:Occupational Health; D018570:Risk Assessment; D020711:Threshold Limit Values
chemical_list: D000395:Air Pollutants, Occupational; D007204:Indium