title: Chemical vapour deposition of zeolitic imidazolate framework thin films.
abstract: Integrating metal-organic frameworks (MOFs) in microelectronics has disruptive potential because of the unique properties of these microporous crystalline materials. Suitable film deposition methods are crucial to leverage MOFs in this field. Conventional solvent-based procedures, typically adapted from powder preparation routes, are incompatible with nanofabrication because of corrosion and contamination risks. We demonstrate a chemical vapour deposition process (MOF-CVD) that enables high-quality films of ZIF-8, a prototypical MOF material, with a uniform and controlled thickness, even on high-aspect-ratio features. Furthermore, we demonstrate how MOF-CVD enables previously inaccessible routes such as lift-off patterning and depositing MOF films on fragile features. The compatibility of MOF-CVD with existing infrastructure, both in research and production facilities, will greatly facilitate MOF integration in microelectronics. MOF-CVD is the first vapour-phase deposition method for any type of microporous crystalline network solid and marks a milestone in processing such materials.
authors.affiliation: Department of Microbial and Molecular Systems, Centre for Surface Chemistry and Catalysis, KU Leuven-University of Leuven, Celestijnenlaan 200F, B-3001 Leuven, Belgium.|imec, Kapeldreef 75, B-3001 Leuven, Belgium.
authors.forename: Ivo
authors.identifier: http://orcid.org/0000-0003-3997-653X
authors.initials: I
authors.lastname: Stassen
authors.affiliation: CSIRO Manufacturing Flagship, Clayton, Victoria 3168, Australia.
authors.forename: Mark
authors.initials: M
authors.lastname: Styles
authors.affiliation: MBI, National University of Singapore T-Lab, 5A Engineering Drive 1, Singapore 117411, Singapore.
authors.forename: Gianluca
authors.identifier: http://orcid.org/0000-0001-9313-6748
authors.initials: G
authors.lastname: Grenci
authors.affiliation: Department of Chemistry, KU Leuven-University of Leuven, Celestijnenlaan 200F, B-3001 Leuven, Belgium.
authors.forename: Hans Van
authors.identifier: http://orcid.org/0000-0002-5983-0143
authors.initials: HV
authors.lastname: Gorp
authors.affiliation: Department of Chemistry, KU Leuven-University of Leuven, Celestijnenlaan 200F, B-3001 Leuven, Belgium.
authors.forename: Willem
authors.initials: W
authors.lastname: Vanderlinden
authors.affiliation: Department of Chemistry, KU Leuven-University of Leuven, Celestijnenlaan 200F, B-3001 Leuven, Belgium.
authors.forename: Steven De
authors.initials: SD
authors.lastname: Feyter
authors.affiliation: CSIRO Manufacturing Flagship, Clayton, Victoria 3168, Australia.
authors.forename: Paolo
authors.initials: P
authors.lastname: Falcaro
authors.affiliation: Department of Microbial and Molecular Systems, Centre for Surface Chemistry and Catalysis, KU Leuven-University of Leuven, Celestijnenlaan 200F, B-3001 Leuven, Belgium.
authors.forename: Dirk De
authors.initials: DD
authors.lastname: Vos
authors.affiliation: Department of Microbial and Molecular Systems, Centre for Surface Chemistry and Catalysis, KU Leuven-University of Leuven, Celestijnenlaan 200F, B-3001 Leuven, Belgium.|imec, Kapeldreef 75, B-3001 Leuven, Belgium.
authors.forename: Philippe
authors.initials: P
authors.lastname: Vereecken
authors.affiliation: Department of Microbial and Molecular Systems, Centre for Surface Chemistry and Catalysis, KU Leuven-University of Leuven, Celestijnenlaan 200F, B-3001 Leuven, Belgium.
authors.forename: Rob
authors.identifier: http://orcid.org/0000-0003-3178-5480
authors.initials: R
authors.lastname: Ameloot
mesh_terms: D005740:Gases; D007093:Imidazoles / Q000737:chemistry*; D008567:Membranes, Artificial; D008855:Microscopy, Electron, Scanning; D015394:Molecular Structure; D013499:Surface Properties; D014961:X-Ray Diffraction; D017641:Zeolites / Q000737:chemistry*
chemical_list: D005740:Gases; D007093:Imidazoles; D008567:Membranes, Artificial; D017641:Zeolites