title: Changes in Cell Adhesiveness and Physicochemical Properties of Cross-Linked Albumin Films after Ultraviolet Irradiation.
abstract: We discovered the unique cell adhesive properties of ultraviolet (UV)-irradiated albumin films. Albumin films prepared using a cross-linking reagent with epoxy groups maintained native albumin properties, such as resistance to cell adhesion. Interestingly, the cell adhesive properties of films varied depending upon the UV irradiation time; specifically, cell adhesiveness increased until 2 h of UV irradiation, when the cell number attached to the film was similar to that of culture dishes, and then cell adhesiveness decreased until 20 h of UV irradiation, after which the surface returned to the initial non-adhesive state. To elucidate the molecular mechanisms underlying this phenomenon, we examined the effect of UV irradiation on albumin film properties. The following changes occurred in response to UV irradiation: decreased α-helical structure, cleavage of albumin peptide bonds, and increased hydrophilicity and oxygen content of the albumin film surface. In addition, we found a positive correlation between the degree of cell adhesion and the amount of fibronectin adsorbed on the film. Taken together, UV-induced changes in films highly affect the amount of cell adhesion proteins adsorbed on the films depending upon the irradiation time, which determines cell adhesion behavior.
authors.affiliation: National Institute of Advanced Industrial Science and Technology (AIST) , 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan.
authors.forename: Hironori
authors.initials: H
authors.lastname: Yamazoe
authors.affiliation: National Institute of Advanced Industrial Science and Technology (AIST) , 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan.|Department of Applied Chemistry and Bioengineering, Graduate School of Engineering, Osaka City University , 3-3-138 Sugimoto, Sumiyoshi-ku, Osaka 558-8585, Japan.
authors.forename: Hisashi
authors.initials: H
authors.lastname: Nakanishi
authors.affiliation: Osaka Municipal Technical Research Institute , 1-6-50 Morinomiya, Joto-ku, Osaka 536-8553, Japan.
authors.forename: Yukiyasu
authors.initials: Y
authors.lastname: Kashiwagi
authors.affiliation: Osaka Municipal Technical Research Institute , 1-6-50 Morinomiya, Joto-ku, Osaka 536-8553, Japan.
authors.forename: Masami
authors.initials: M
authors.lastname: Nakamoto
authors.affiliation: Department of Applied Chemistry and Bioengineering, Graduate School of Engineering, Osaka City University , 3-3-138 Sugimoto, Sumiyoshi-ku, Osaka 558-8585, Japan.
authors.forename: Akira
authors.initials: A
authors.lastname: Tachibana
authors.affiliation: National Institute of Advanced Industrial Science and Technology (AIST) , 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan.
authors.forename: Yoshihisa
authors.initials: Y
authors.lastname: Hagihara
authors.affiliation: Department of Applied Chemistry and Bioengineering, Graduate School of Engineering, Osaka City University , 3-3-138 Sugimoto, Sumiyoshi-ku, Osaka 558-8585, Japan.
authors.forename: Toshizumi
authors.initials: T
authors.lastname: Tanabe
mesh_terms: D000268:Adhesiveness; D000418:Albumins / Q000737:chemistry*; D008567:Membranes, Artificial; D014466:Ultraviolet Rays
chemical_list: D000418:Albumins; D008567:Membranes, Artificial