title: [Effects of indium exposure on relative content of mitochondrial ND1 gene in human peripheral blood lymphocytes in vitro].
abstract: OBJECTIVE
  To study the effects of indium exposure on the relative content of mitochondrial ND1 gene in lymphocytes.
  
  
  METHODS
  Venous blood was obtained from 14 healthy workers and anticoagulated with heparin. Blood lymphocytes were separated and divided into three tube cultures. For two tubes in the exposed group, indium chloride was added to final concentrations of 0.2 mmol/L and 0.8 mmol/L, respectively. For one tube in the control group, an equal volume of normal saline solution was added. After incubation for 72 h, the relative content of mitochondrial gene in each group was determined using quantitative real-time PCR.
  
  
  RESULTS
  Lymphocytes exposed to 0.8 mmol/L indium chloride had a significantly higher relative content of mitochondrial gene than those exposed to 0.2 mmol/L indium chloride and those in the control group (P < 0.05, P < 0.05).
  
  
  CONCLUSIONS
  Lymphocytes exposed to a high concentration of indium and its compounds have an elevated relative content of mitochondrial ND1 gene, indicating increased oxidative DNA damage induced by exposure to a high concentration of indium and its compounds.
authors.affiliation: Shenzhen Prevention and Treatment Center for Occupation Diseases, Shenzhen 518001, China.
authors.forename: Dianpeng
authors.initials: D
authors.lastname: Wang
authors.affiliation: Shenzhen Prevention and Treatment Center for Occupation Diseases, Shenzhen 518001, China.
authors.forename: Xiangli
authors.initials: X
authors.lastname: Yang
authors.affiliation: Shenzhen Prevention and Treatment Center for Occupation Diseases, Shenzhen 518001, China.
authors.forename: Yanfang
authors.initials: Y
authors.lastname: Zhang
authors.affiliation: Shenzhen Prevention and Treatment Center for Occupation Diseases, Shenzhen 518001, China.
authors.forename: Haiyan
authors.initials: H
authors.lastname: Tang
authors.affiliation: Shenzhen Prevention and Treatment Center for Occupation Diseases, Shenzhen 518001, China.
authors.forename: Zhimin
authors.initials: Z
authors.lastname: Zhang
authors.affiliation: Shenzhen Prevention and Treatment Center for Occupation Diseases, Shenzhen 518001, China; E-mail: lizhimin567@sina.com.
authors.forename: Zhimin
authors.initials: Z
authors.lastname: Li
authors.affiliation: Shenzhen Prevention and Treatment Center for Occupation Diseases, Shenzhen 518001, China.
authors.forename: Changye
authors.initials: C
authors.lastname: Hui
authors.affiliation: Shenzhen Prevention and Treatment Center for Occupation Diseases, Shenzhen 518001, China.
authors.forename: Juan
authors.initials: J
authors.lastname: Yi
authors.affiliation: Shenzhen Prevention and Treatment Center for Occupation Diseases, Shenzhen 518001, China.
authors.forename: Wen
authors.initials: W
authors.lastname: Zhang
mesh_terms: D004249:DNA Damage / Q000187:drug effects; D004272:DNA, Mitochondrial / Q000235:genetics*; D006801:Humans; D007204:Indium / Q000633:toxicity*; D008214:Lymphocytes / Q000187:drug effects*; D009245:NADH Dehydrogenase / Q000235:genetics; D016273:Occupational Exposure
chemical_list: D004272:DNA, Mitochondrial; D007204:Indium; C020758:indium trichloride; D009245:NADH Dehydrogenase; C515075:NADH dehydrogenase subunit 1, human