title: Visible-Light-Sensitive Photocatalysts: Nanocluster-Grafted Titanium Dioxide for Indoor Environmental Remediation.
abstract: Photocatalytic degradation of organic compounds requires photoexcited holes with strong oxidative power in the valence band (VB) of semiconductors. Although numerous types of doped semiconductors, such as nitrogen-doped TiO2, have been studied as visible-light-sensitive photocatalysts, the quantum yields of these materials were very low because of the limited oxidation power of holes in the nitrogen level above the VB. Recently, we developed visible-light-sensitive Cu(II) and Fe(III) nanocluster-grafted TiO2 using a facile impregnation method and demonstrated that visible-light absorption occurs at the interface between the nanoclusters and TiO2, as electrons in the VB of TiO2 are excited to the nanoclusters under visible-light irradiation. In addition, photogenerated holes in the VB of TiO2 efficiently oxidize organic contaminants, and the excited electrons that accumulate in nanoclusters facilitate the multielectron reduction of oxygen. Notably, Cu(II) and Fe(III) nanocluster-grafted TiO2 photocatalyst has the highest quantum yield among reported photocatalysts and has antiviral, self-cleaning, and air purification properties under illumination by indoor light fixtures equipped with white fluorescent bulbs or white light-emitting diodes.
authors.affiliation: Graduate School of Science and Engineering, Tokyo Institute of Technology , 2-12-1 Ookayama, Meguro-ku, Tokyo 152-8552, Japan.
authors.forename: Masahiro
authors.initials: M
authors.lastname: Miyauchi
authors.affiliation: Clean Energy Research Center, University of Yamanashi , 4-3-11 Takeda, Kofu, Yamanashi 400-8511, Japan.
authors.forename: Hiroshi
authors.initials: H
authors.lastname: Irie
authors.affiliation: Research Center for Advanced Science and Technology, The University of Tokyo , 4-6-1 Komaba, Meguro-ku, Tokyo 153-8904, Japan.
authors.forename: Min
authors.initials: M
authors.lastname: Liu
authors.affiliation: Research Center for Advanced Science and Technology, The University of Tokyo , 4-6-1 Komaba, Meguro-ku, Tokyo 153-8904, Japan.
authors.forename: Xiaoqing
authors.initials: X
authors.lastname: Qiu
authors.affiliation: Research Center for Advanced Science and Technology, The University of Tokyo , 4-6-1 Komaba, Meguro-ku, Tokyo 153-8904, Japan.
authors.forename: Huogen
authors.initials: H
authors.lastname: Yu
authors.affiliation: Research Center for Advanced Science and Technology, The University of Tokyo , 4-6-1 Komaba, Meguro-ku, Tokyo 153-8904, Japan.
authors.forename: Kayano
authors.initials: K
authors.lastname: Sunada
authors.affiliation: Research Center for Advanced Science and Technology, The University of Tokyo , 4-6-1 Komaba, Meguro-ku, Tokyo 153-8904, Japan.|Department of Applied Chemistry, School of Engineering, The University of Tokyo , 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan.
authors.forename: Kazuhito
authors.initials: K
authors.lastname: Hashimoto