title: Near-field visualization of plasmonic lenses: an overall analysis of characterization errors.
abstract: Many factors influence the near-field visualization of plasmonic structures that are based on perforated elliptical slits. Here, characterization errors are experimentally analyzed in detail from both fabrication and measurement points of view. Some issues such as geometrical parameter, probe-sample surface interaction, misalignment, stigmation, and internal stress, have influence on the final near-field probing results. In comparison to the theoretical ideal case of near-field probing of the structures, numerical calculation is carried out on the basis of a finite-difference and time-domain (FDTD) algorithm so as to support the error analyses. The analyses performed on the basis of both theoretical calculation and experimental probing can provide a helpful reference for the researchers probing their plasmonic structures and nanophotonic devices.
authors.affiliation: School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu 610054, Sichuan Province, P. R. China.
authors.forename: Jing
authors.initials: J
authors.lastname: Wang
authors.affiliation: School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu 610054, Sichuan Province, P. R. China.
authors.forename: Yongqi
authors.initials: Y
authors.lastname: Fu
authors.affiliation: Key Laboratory of Precision Measuring Technology & Instruments, Centre of MicroNano Manufacturing Technology, Tianjin University, 300072, P. R. China.
authors.forename: Zongwei
authors.initials: Z
authors.lastname: Xu
authors.affiliation: Key Laboratory of Precision Measuring Technology & Instruments, Centre of MicroNano Manufacturing Technology, Tianjin University, 300072, P. R. China.
authors.forename: Fengzhou
authors.initials: F
authors.lastname: Fang
keywords: characterization; nanofabrication; near-field; plasmonic lenses; plasmonic structures