title: Velocity Control of 180° Domain Walls in Ferroelectric Thin Films by Electrode Modification.
abstract: The velocity of individual 180° domain walls in thin ferroelectric films of PbZr0.1Ti0.9O3 is strongly dependent on the thickness of the top Pt electrode made by electron-beam induced deposition (EBID). We show that when the thickness is varied in the range <100 nm the domain wall velocity is seen to change by 7 orders of magnitude. We attribute this huge range of velocities to the similarly large range of resistivities for the EBID Pt electrode as extrapolated from four-point probe measurements. The domain wall motion is governed by the supply of charges to the domain wall, determined by the top electrode resistivity, and which is described using a modified Stefan Problem model. This has significant implications for the feasibility of ferroelectric domain wall nanoelectronics, wherein the speed of operation will be limited by the maximum velocity of the propagating domain wall front. Furthermore, by introducing sections of either modified thickness or width along the length of a "line" electrode, the domain wall velocity can be changed at these locations, opening up possibilities for dynamic regimes.
authors.affiliation: Ceramics Laboratory, EPFL - Swiss Federal Institute of Technology , Lausanne, CH-1015, Switzerland.
authors.forename: L J
authors.initials: LJ
authors.lastname: McGilly
authors.affiliation: Ceramics Laboratory, EPFL - Swiss Federal Institute of Technology , Lausanne, CH-1015, Switzerland.
authors.forename: L
authors.initials: L
authors.lastname: Feigl
authors.affiliation: Ceramics Laboratory, EPFL - Swiss Federal Institute of Technology , Lausanne, CH-1015, Switzerland.|DPMC-MaNEP, University of Geneva , 24 Quai Ernest Ansermet, 1211 Geneva 4, Switzerland.
authors.forename: T
authors.initials: T
authors.lastname: Sluka
authors.affiliation: Ceramics Laboratory, EPFL - Swiss Federal Institute of Technology , Lausanne, CH-1015, Switzerland.|Novosibirsk State University , 2 Pirogova street, 630090 Novosibirsk, Russia.
authors.forename: P
authors.initials: P
authors.lastname: Yudin
authors.affiliation: Ceramics Laboratory, EPFL - Swiss Federal Institute of Technology , Lausanne, CH-1015, Switzerland.
authors.forename: A K
authors.initials: AK
authors.lastname: Tagantsev
authors.affiliation: Ceramics Laboratory, EPFL - Swiss Federal Institute of Technology , Lausanne, CH-1015, Switzerland.
authors.forename: N
authors.initials: N
authors.lastname: Setter
keywords: EBID; Ferroelectric; PZT; domain walls; polarization switching; thin film