title: Physical Modeling of Gate-Controlled Schottky Barrier Lowering of Metal-Graphene Contacts in Top-Gated Graphene Field-Effect Transistors.
abstract: A new physical model of the gate controlled Schottky barrier height (SBH) lowering in top-gated graphene field-effect transistors (GFETs) under saturation bias condition is proposed based on the energy conservation equation with the balance assumption. The theoretical prediction of the SBH lowering agrees well with the experimental data reported in literatures. The reduction of the SBH increases with the increasing of gate voltage and relative dielectric constant of the gate oxide, while it decreases with the increasing of oxide thickness, channel length and acceptor density. The magnitude of the reduction is slightly enhanced under high drain voltage. Moreover, it is found that the gate oxide materials with large relative dielectric constant (>20) have a significant effect on the gate controlled SBH lowering, implying that the energy relaxation of channel electrons should be taken into account for modeling SBH in GFETs.
authors.affiliation: School of Computer &Communication Engineering, University of Science &Technology Beijing, 30 Xueyuan Road, Haidian District Beijing 100083, P. R. China.
authors.forename: Ling-Feng
authors.initials: LF
authors.lastname: Mao
authors.affiliation: School of Computer &Communication Engineering, University of Science &Technology Beijing, 30 Xueyuan Road, Haidian District Beijing 100083, P. R. China.
authors.forename: Huansheng
authors.initials: H
authors.lastname: Ning
authors.affiliation: Institute of Microelectronics, Chinese Academy Science 100029, Beijing, P. R. China.
authors.forename: Zong-Liang
authors.initials: ZL
authors.lastname: Huo
authors.affiliation: Institute of Microelectronics, Peking University, 100871, Beijing, P. R. China.
authors.forename: Jin-Yan
authors.initials: JY
authors.lastname: Wang