title: Invited Article: Progress in coherent lithography using table-top extreme ultraviolet lasers.
abstract: Compact (table top) lasers emitting at wavelengths below 50 nm had expanded the spectrum of applications in the extreme ultraviolet (EUV). Among them, the high-flux, highly coherent laser sources enabled lithographic approaches with distinctive characteristics. In this review, we will describe the implementation of a compact EUV lithography system capable of printing features with sub-50 nm resolution using Talbot imaging. This compact system is capable of producing consistent defect-free samples in a reliable and effective manner. Examples of different patterns and structures fabricated with this method will be presented.
authors.affiliation: Electrical and Computer Engineering Department and NSF Engineering Research Center for Extreme Ultraviolet Science and Technology, Colorado State University, Fort Collins, Colorado 80523, USA.
authors.forename: W
authors.initials: W
authors.lastname: Li
authors.affiliation: Electrical and Computer Engineering Department and NSF Engineering Research Center for Extreme Ultraviolet Science and Technology, Colorado State University, Fort Collins, Colorado 80523, USA.
authors.forename: L
authors.initials: L
authors.lastname: Urbanski
authors.affiliation: Electrical and Computer Engineering Department and NSF Engineering Research Center for Extreme Ultraviolet Science and Technology, Colorado State University, Fort Collins, Colorado 80523, USA.
authors.forename: M C
authors.initials: MC
authors.lastname: Marconi