title: Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant.
abstract: Ruthenium (Ru) thin films were grown on thermally-grown SiO2 substrates by plasma enhanced atomic layer deposition (PEALD) using a sequential supply of a new betadiketonate Ru metallorganic precursor, dicarbonyl-bis(5-methyl-2,4-hexanediketonato) Ru(II) (C16H22O6Ru) with a high vapor pressure and NH3 plasma as a reactant at the substrate temperature ranging from 175 and 310 degrees C. A self-limited film growth was confirmed at the deposition temperature of 225 degrees C and the growth rate was 0.063 nm/cycle on the SiO2 substrate with very short number of incubation cycles (approximately 10 cycles). The resistivity of PEALD-Ru films was dependent on the microstructural features characterized by grain size and crystallinity, which could be controlled by varying the deposition temperature. Ru film with the resistivity of -20 μΩ-cm and high density of 11.5 g/cm3 was obtained at the deposition temperature as low as 225 degrees C. It formed polycrystalline structure with hexagonal-close-packed phase that was confirmed by X-ray diffractometry and transmission electronic microscopy analysis. Step coverage of PEALD-Ru film deposited with the optimum condition was good (-75%) at the very small-sized trench (aspect ratio: -4.5 and the top opening size of 25 nm).
authors.forename: Jae-Hun
authors.initials: JH
authors.lastname: Jung
authors.forename: Seung-Joon
authors.initials: SJ
authors.lastname: Lee
authors.forename: Hyun-Jung
authors.initials: HJ
authors.lastname: Lee
authors.forename: Min Young
authors.initials: MY
authors.lastname: Lee
authors.forename: Taehoon
authors.initials: T
authors.lastname: Cheon
authors.forename: So Ik
authors.initials: SI
authors.lastname: Bae
authors.forename: Masayuki
authors.initials: M
authors.lastname: Saito
authors.forename: Kazuharu
authors.initials: K
authors.lastname: Suzuki
authors.forename: Shunichi
authors.initials: S
authors.lastname: Nabeya
authors.forename: Jeongyeop
authors.initials: J
authors.lastname: Lee
authors.forename: Sangdeok
authors.initials: S
authors.lastname: Kim
authors.forename: Seungjin
authors.initials: S
authors.lastname: Yeom
authors.forename: Jong Hyun
authors.initials: JH
authors.lastname: Seo
authors.forename: Soo-Hyun
authors.initials: SH
authors.lastname: Kim