title: Basal Plane Fluorination of Graphene by XeF2 via a Radical Cation Mechanism.
abstract: Graphene fluorination with XeF2 is an attractive method to introduce a nonzero bandgap to graphene under mild conditions for potential electro-optical applications. Herein, we use well-defined graphene nanostructures as a model system to study the reaction mechanism of graphene fluorination by XeF2. Our combined experimental and theoretical studies show that the reaction can proceed through a radical cation mechanism, leading to fluorination and sp(3)-hybridized carbon in the basal plane.
authors.affiliation: Department of Chemistry, Indiana University , Bloomington, Indiana 47405, United States.
authors.forename: Yijun
authors.initials: Y
authors.lastname: Liu
authors.affiliation: Department of Chemistry, Indiana University , Bloomington, Indiana 47405, United States.
authors.forename: Benjamin W
authors.initials: BW
authors.lastname: Noffke
authors.affiliation: Department of Chemistry, Indiana University , Bloomington, Indiana 47405, United States.
authors.forename: Xiaoxiao
authors.initials: X
authors.lastname: Qiao
authors.affiliation: Department of Chemistry, Indiana University , Bloomington, Indiana 47405, United States.
authors.forename: Qiqi
authors.initials: Q
authors.lastname: Li
authors.affiliation: Department of Chemistry, Indiana University , Bloomington, Indiana 47405, United States.
authors.forename: Xinfeng
authors.initials: X
authors.lastname: Gao
authors.affiliation: Department of Chemistry, Indiana University , Bloomington, Indiana 47405, United States.
authors.forename: Krishnan
authors.initials: K
authors.lastname: Raghavachari
authors.affiliation: Department of Chemistry, Indiana University , Bloomington, Indiana 47405, United States.
authors.forename: Liang-shi
authors.initials: LS
authors.lastname: Li
keywords: Graphene; fluorination; mechanism; oxidation; radical cation