title: Three Dimensional Sculpturing of Vertical Nanowire Arrays by Conventional Photolithography.
abstract: Ordered nanoarchitectures have attracted an intense research interest recently because of their promising device applications. They are always fabricated by self-assembling building blocks such as nanowires, nanodots. This kind of bottom up approaches is limited in poor control over height, lateral resolution, aspect ratio, and patterning. Here, we break these limits and realize 3D sculpturing of vertical ZnO nanowire arrays (NAs) based on the conventional photolithography approach. These are achieved by immersing nanowire NAs in thick photoresist (PR) layers, which enable the cutting and patterning of ZnO NAs as well as the tailoring of NAs. Our strategy of 3D sculpturing of NAs promisingly paves the way for designing novel NAs-based nanoarchitectures.
authors.affiliation: Department of Materials Science and Engineering and Shenzhen Key Laboratory of Nanoimprint Technology, South University of Science and Technology, Shenzhen 518055, China.
authors.forename: Run
authors.initials: R
authors.lastname: Shi
authors.affiliation: Department of Materials Science and Engineering and Shenzhen Key Laboratory of Nanoimprint Technology, South University of Science and Technology, Shenzhen 518055, China.
authors.forename: Chengzi
authors.initials: C
authors.lastname: Huang
authors.affiliation: Department of Materials Science and Engineering and Shenzhen Key Laboratory of Nanoimprint Technology, South University of Science and Technology, Shenzhen 518055, China.
authors.forename: Linfei
authors.initials: L
authors.lastname: Zhang
authors.affiliation: School of Computing, Engineering and Mathematics, University of Western Sydney, Kingswood, NSW 2751, Australia.
authors.forename: Abbas
authors.initials: A
authors.lastname: Amini
authors.affiliation: School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China.
authors.forename: Kai
authors.initials: K
authors.lastname: Liu
authors.affiliation: Department of Materials Science and Engineering and Shenzhen Key Laboratory of Nanoimprint Technology, South University of Science and Technology, Shenzhen 518055, China.
authors.forename: Yuan
authors.initials: Y
authors.lastname: Shi
authors.affiliation: Department of Materials Science and Engineering and Shenzhen Key Laboratory of Nanoimprint Technology, South University of Science and Technology, Shenzhen 518055, China.
authors.forename: Shuhan
authors.initials: S
authors.lastname: Bao
authors.affiliation: Department of Physics, Hong Kong University of Science and Technology, Hong Kong, China.
authors.forename: Ning
authors.initials: N
authors.lastname: Wang
authors.affiliation: Department of Materials Science and Engineering and Shenzhen Key Laboratory of Nanoimprint Technology, South University of Science and Technology, Shenzhen 518055, China.
authors.forename: Chun
authors.initials: C
authors.lastname: Cheng