title: Fabrication of Periodic Plasmonic Structures Using Interference Lithography and Chalcogenide Photoresist.
abstract: This study reports on the employment of the interference lithography (IL) technique, using photoresist based on the chalcogenide glass (ChG) films, for fabrication of one-dimensional (gratings) and two-dimensional (arrays) periodic plasmonic structures on the surface of glass plates. The IL technique was optimized for patterning of the Au and Al layers and formation of gratings and arrays with a spatial frequency of 2000 mm(-1). Optical properties of obtained structures were studied using measurements of spectral and angular dependence of transmission and reflection of polarized light. It was shown that the spectral and angular position of the surface plasmon polariton and local surface plasmon resonance, which are observed in these samples, can be adjusted over a wide range by selecting the geometric parameters of structures and technological modes of their manufacturing.
authors.affiliation: V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, 45, Prospect Nauky, 03028, Kyiv, Ukraine. danko-va@ukr.net.
authors.forename: Viktor
authors.initials: V
authors.lastname: Dan'ko
authors.affiliation: V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, 45, Prospect Nauky, 03028, Kyiv, Ukraine. dmitruk@isp.kiev.ua.
authors.forename: Mykola
authors.initials: M
authors.lastname: Dmitruk
authors.affiliation: V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, 45, Prospect Nauky, 03028, Kyiv, Ukraine. indutnyy@isp.kiev.ua.
authors.forename: Ivan
authors.initials: I
authors.lastname: Indutnyi
authors.affiliation: V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, 45, Prospect Nauky, 03028, Kyiv, Ukraine. mamykin@isp.kiev.ua.
authors.forename: Sergii
authors.initials: S
authors.lastname: Mamykin
authors.affiliation: V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, 45, Prospect Nauky, 03028, Kyiv, Ukraine. m-victor-2011@ukr.net.
authors.forename: Victor
authors.initials: V
authors.lastname: Myn'ko
authors.affiliation: V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, 45, Prospect Nauky, 03028, Kyiv, Ukraine. lukaniukm@ukr.net.
authors.forename: Mariia
authors.initials: M
authors.lastname: Lukaniuk
authors.affiliation: V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, 45, Prospect Nauky, 03028, Kyiv, Ukraine. spe@isp.kiev.ua.
authors.forename: Petro
authors.initials: P
authors.lastname: Shepeliavyi
authors.affiliation: V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, 45, Prospect Nauky, 03028, Kyiv, Ukraine. plyt@isp.kiev.ua.
authors.forename: Petro
authors.initials: P
authors.lastname: Lytvyn
keywords: Chalcogenide photoresist; Interference lithography; Plasmon resonance; Plasmonic structures