title: Static and dynamic electronic characterization of organic monolayers grafted on a silicon surface.
abstract: Organic layers chemically grafted on silicon offer excellent interfaces that may open up the way for new organic-inorganic hybrid nanoelectronic devices. However, technological achievements rely on the precise electronic characterization of such organic layers. We have prepared ordered grafted organic monolayers (GOMs) on Si(111), sometimes termed self-assembled monolayers (SAMs), by a hydrosilylation reaction with either a 7-carbon or an 11-carbon alkyl chain, with further modification to obtain amine-terminated surfaces. X-ray photoelectron spectroscopy (XPS) is used to determine the band bending (∼ 0.3 eV), and ultraviolet photoelectron spectroscopy (UPS) to measure the work function (∼ 3.4 eV) and the HOMO edge. Scanning tunneling microscopy (STM) confirms that the GOM surface is clean and smooth. Finally, conductive AFM is used to measure electron transport through the monolayer and to identify transition between the tunneling and the field emission regimes. These organic monolayers offer a promising alternative to silicon dioxide thin films for fabricating metal-insulator-semiconductor (MIS) junctions. We show that gold nanoparticles can be covalently attached to mimic metallic nano-electrodes and that the electrical quality of the GOMs is completely preserved in the process.
authors.affiliation: Sorbonne Universités, UPMC Univ Paris 06, CNRS-UMR 7588, Institut des NanoSciences de Paris, F-75005, Paris, France. Olivier.pluchery@insp.jussieu.fr.
authors.forename: O
authors.initials: O
authors.lastname: Pluchery
authors.affiliation: Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA and Applied Science and Technology Graduate Program, University of California at Berkeley, Berkeley, CA 94720, USA.
authors.forename: Y
authors.initials: Y
authors.lastname: Zhang
authors.affiliation: Sorbonne Universités, UPMC Univ Paris 06, CNRS-UMR 7614, Laboratoire de Chimie Physique, Matière et Rayonnement, F-75005, Paris, France.
authors.forename: R
authors.initials: R
authors.lastname: Benbalagh
authors.affiliation: Sorbonne Universités, UPMC Univ Paris 06, CNRS-UMR 7588, Institut des NanoSciences de Paris, F-75005, Paris, France. Olivier.pluchery@insp.jussieu.fr and Laboratory for Surface and Nanostructure Modification, Department of Materials Science and Engineering, University of Texas at Dallas, 800 West Campbell Road, Dallas, Texas 75080, USA.
authors.forename: L
authors.initials: L
authors.lastname: Caillard
authors.affiliation: Sorbonne Universités, UPMC Univ Paris 06, CNRS-UMR 7614, Laboratoire de Chimie Physique, Matière et Rayonnement, F-75005, Paris, France.
authors.forename: J J
authors.initials: JJ
authors.lastname: Gallet
authors.affiliation: Sorbonne Universités, UPMC Univ Paris 06, CNRS-UMR 7614, Laboratoire de Chimie Physique, Matière et Rayonnement, F-75005, Paris, France.
authors.forename: F
authors.initials: F
authors.lastname: Bournel
authors.affiliation: Sorbonne Universités, UPMC Univ Paris 06, CNRS-UMR 7197, Laboratoire de Réactivité de Surface, F-75005 Paris, France.
authors.forename: A-F
authors.initials: AF
authors.lastname: Lamic-Humblot
authors.affiliation: Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA.
authors.forename: M
authors.initials: M
authors.lastname: Salmeron
authors.affiliation: Laboratory for Surface and Nanostructure Modification, Department of Materials Science and Engineering, University of Texas at Dallas, 800 West Campbell Road, Dallas, Texas 75080, USA.
authors.forename: Y J
authors.initials: YJ
authors.lastname: Chabal
authors.affiliation: Sorbonne Universités, UPMC Univ Paris 06, CNRS-UMR 7614, Laboratoire de Chimie Physique, Matière et Rayonnement, F-75005, Paris, France.
authors.forename: F
authors.initials: F
authors.lastname: Rochet