title: On high-pass filter artifacts (they're real) and baseline correction (it's a good idea) in ERP/ERMF analysis.
authors.affiliation: Department of Linguistics, University of Illinois at Urbana-Champaign, Urbana, IL, United States; Neuroscience Program and Beckman Institute for Advanced Science and Technology, University of Illinois at Urbana-Champaign, Urbana, IL, United States. Electronic address: dstanner@gmail.com.
authors.forename: Darren
authors.initials: D
authors.lastname: Tanner
authors.affiliation: Neuroscience Program and Beckman Institute for Advanced Science and Technology, University of Illinois at Urbana-Champaign, Urbana, IL, United States.
authors.forename: James J S
authors.initials: JJ
authors.lastname: Norton
authors.affiliation: Departments of Hispanic and Italian Studies and Psychology, University of Illinois at Chicago, Chicago, IL, United States.
authors.forename: Kara
authors.initials: K
authors.lastname: Morgan-Short
authors.affiliation: Center for Mind & Brain and Department of Psychology, University of California, Davis, CA, United States.
authors.forename: Steven J
authors.initials: SJ
authors.lastname: Luck
mesh_terms: D016477:Artifacts; D005071:Evoked Potentials; D006801:Humans