title: Investigations on Substrate Temperature-Induced Growth Modes of Organic Semiconductors at Dielectric/semiconductor Interface and Their Correlation with Threshold Voltage Stability in Organic Field-Effect Transistors.
abstract: Influence of substrate temperature on growth modes of copper phthalocyanine (CuPc) thin films at the dielectric/semiconductor interface in organic field effect transistors (OFETs) is investigated. Atomic force microscopy (AFM) imaging at the interface reveals a change from 'layer+island' to "island" growth mode with increasing substrate temperatures, further confirmed by probing the buried interfaces using X-ray reflectivity (XRR) and positron annihilation spectroscopic (PAS) techniques. PAS depth profiling provides insight into the details of molecular ordering while positron lifetime measurements reveal the difference in packing modes of CuPc molecules at the interface. XRR measurements show systematic increase in interface width and electron density correlating well with the change from layer + island to coalesced huge 3D islands at higher substrate temperatures. Study demonstrates the usefulness of XRR and PAS techniques to study growth modes at buried interfaces and reveals the influence of growth modes of semiconductor at the interface on hole and electron trap concentrations individually, thereby affecting hysteresis and threshold voltage stability. Minimum hole trapping is correlated to near layer by layer formation close to the interface at 100 °C and maximum to the island formation with large voids between the grains at 225 °C.
authors.forename: Narayanan
authors.initials: N
authors.lastname: Padma
authors.forename: Priya
authors.initials: P
authors.lastname: Maheshwari
authors.forename: Debarati
authors.initials: D
authors.lastname: Bhattacharya
authors.forename: Raj B
authors.initials: RB
authors.lastname: Tokas
authors.forename: Shashwati
authors.initials: S
authors.lastname: Sen
authors.affiliation: The Institute of Scientific and Industrial Research, Osaka University , Ibaraki, Osaka, Japan.
authors.forename: Yoshihide
authors.initials: Y
authors.lastname: Honda
authors.forename: Saibal
authors.initials: S
authors.lastname: Basu
authors.forename: Pradeep Kumar
authors.initials: PK
authors.lastname: Pujari
authors.forename: T V Chandrasekhar
authors.initials: TV
authors.lastname: Rao
keywords: OFET; X ray reflectivity; growth mode of CuPc; positron annihilation spectroscopy; substrate temperature; threshold voltage stability