title: Optical Enhancement in Optoelectronic Devices Using Refractive Index Grading Layers.
abstract: We enhanced the optical transmittance of a multilayer barrier film by inserting a refractive index grading layer (RIGL). The result indicates that the Fresnel reflection, induced by the difference of refractive indices between Si(x)N(y) and SiO2, is reduced by the RIGL. To eliminate the Fresnel reflection while maintaining high transmittance, the optimized design of grading structures with the RIGL was conducted using an optical simulator. With the RIGL, we achieved averaged transmittance in the visible wavelength region by 89.6%. It is found that the optimized grading structure inserting the multilayer barrier film has a higher optical transmittance (89.6%) in the visible region than that of a no grading sample (82.6%). Furthermore, luminance is enhanced by 14.5% (from 10,190 to 11,670 cd m(-2) at 30 mA cm(-2)) when the grading structure is applied to organic light-emitting diodes. Finally, the results offer new opportunities in development of multilayer barrier films, which assist industrialization of very cost-effective flexible organic electronic devices.
authors.affiliation: Department of Materials Science and Engineering, Division of Advanced Materials Science, Pohang University of Science and Technology (POSTECH) , Pohang, Gyeongbuk 790-784, Korea.
authors.forename: Illhwan
authors.initials: I
authors.lastname: Lee
authors.affiliation: Department of Materials Science and Engineering, Division of Advanced Materials Science, Pohang University of Science and Technology (POSTECH) , Pohang, Gyeongbuk 790-784, Korea.
authors.forename: Jae Yong
authors.initials: JY
authors.lastname: Park
authors.affiliation: Department of Materials Science and Engineering, Division of Advanced Materials Science, Pohang University of Science and Technology (POSTECH) , Pohang, Gyeongbuk 790-784, Korea.
authors.forename: Seungo
authors.initials: S
authors.lastname: Gim
authors.affiliation: Department of Materials Science and Engineering, Division of Advanced Materials Science, Pohang University of Science and Technology (POSTECH) , Pohang, Gyeongbuk 790-784, Korea.
authors.forename: Kisoo
authors.initials: K
authors.lastname: Kim
authors.affiliation: Samsung Display Company, Limited , Giheung-Gu, Yongin, Gyeonggi 446-711, Korea.
authors.forename: Sang-Hwan
authors.initials: SH
authors.lastname: Cho
authors.affiliation: Samsung Display Company, Limited , Giheung-Gu, Yongin, Gyeonggi 446-711, Korea.
authors.forename: Chung Sock
authors.initials: CS
authors.lastname: Choi
authors.affiliation: Samsung Display Company, Limited , Giheung-Gu, Yongin, Gyeonggi 446-711, Korea.
authors.forename: Seung-Yong
authors.initials: SY
authors.lastname: Song
authors.affiliation: Department of Materials Science and Engineering, Division of Advanced Materials Science, Pohang University of Science and Technology (POSTECH) , Pohang, Gyeongbuk 790-784, Korea.
authors.forename: Jong-Lam
authors.initials: JL
authors.lastname: Lee
keywords: Fresnel reflection; OLED; multilayer barrier film; refractive index grading; thin-film passivation