title: Stacking Fault Enriching the Electronic and Transport Properties of Few-Layer Phosphorenes and Black Phosphorus.
abstract: Interface engineering is critical for enriching the electronic and transport properties of two-dimensional materials. Here, we identify a new stacking, named Aδ, in few-layer phosphorenes (FLPs) and black phosphorus (BP) based on first-principles calculation. With its low formation energy, the Aδ stacking could exist in FLPs and BP as a stacking fault. The presence of the Aδ stacking fault induces a direct to indirect transition of the band gap in FLPs. It also affects the carrier mobilities by significantly increasing the carrier effective masses. More importantly, the Aδ stacking enables the fabrication of a whole spectrum of lateral junctions with all the type-I, II, and III alignments simply through the manipulation of the van der Waals stacking without resorting to any chemical modification. This is achieved by the widely tunable electron affinity and ionization potential of FLPs and BP with the Aδ stacking.
authors.affiliation: Key Laboratory of Microelectromechanical Systems of the Ministry of Education, Southeast University , Nanjing 210096, China.|Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute , Troy, New York 12180, United States.
authors.forename: Shuangying
authors.initials: S
authors.lastname: Lei
authors.affiliation: Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute , Troy, New York 12180, United States.
authors.forename: Han
authors.initials: H
authors.lastname: Wang
authors.affiliation: Key Laboratory of Microelectromechanical Systems of the Ministry of Education, Southeast University , Nanjing 210096, China.
authors.forename: Lan
authors.initials: L
authors.lastname: Huang
authors.affiliation: Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute , Troy, New York 12180, United States.
authors.forename: Yi-Yang
authors.initials: YY
authors.lastname: Sun
authors.affiliation: Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute , Troy, New York 12180, United States.
authors.forename: Shengbai
authors.initials: S
authors.lastname: Zhang
keywords: Black phosphorus; lateral junction; phosphorene; stacking fault; transport