title: Atomic Layer Deposition of MnS: Phase Control and Electrochemical Applications.
abstract: Manganese sulfide (MnS) thin films were synthesized via atomic layer deposition (ALD) using gaseous manganese bis(ethylcyclopentadienyl) and hydrogen sulfide as precursors. At deposition temperatures ≤150 °C phase-pure γ-MnS thin films were deposited, while at temperatures >150 °C, a mixed phase consisting of both γ- and α-MnS resulted. In situ quartz crystal microbalance (QCM) studies validate the self-limiting behavior of both ALD half-reactions and, combined with quadrupole mass spectrometry (QMS), allow the derivation of a self-consistent reaction mechanism. Finally, MnS thin films were deposited on copper foil and tested as a Li-ion battery anode. The MnS coin cells showed exceptional cycle stability and near-theoretical capacity.
authors.affiliation: Department of Chemistry, University of Wisconsin-Stevens Point , Stevens Point, Wisconsin 54481, United States.
authors.forename: Shannon C
authors.initials: SC
authors.lastname: Riha
authors.affiliation: Department of Chemistry, University of Wisconsin-Stevens Point , Stevens Point, Wisconsin 54481, United States.
authors.forename: Alexandra A
authors.initials: AA
authors.lastname: Koegel
authors.affiliation: Energy Systems Division, Argonne National Laboratory , Argonne, Illinois 60439, United States.
authors.forename: Xiangbo
authors.initials: X
authors.lastname: Meng
authors.affiliation: Materials Science Division, Argonne National Laboratory , Argonne, Illinois 60439, United States.
authors.forename: In Soo
authors.initials: IS
authors.lastname: Kim
authors.affiliation: Energy Systems Division, Argonne National Laboratory , Argonne, Illinois 60439, United States.
authors.forename: Yanqiang
authors.initials: Y
authors.lastname: Cao
authors.affiliation: Materials Science Division, Argonne National Laboratory , Argonne, Illinois 60439, United States.
authors.forename: Michael J
authors.initials: MJ
authors.lastname: Pellin
authors.affiliation: Energy Systems Division, Argonne National Laboratory , Argonne, Illinois 60439, United States.
authors.forename: Jeffrey W
authors.initials: JW
authors.lastname: Elam
authors.affiliation: Materials Science Division, Argonne National Laboratory , Argonne, Illinois 60439, United States.
authors.forename: Alex B F
authors.initials: AB
authors.lastname: Martinson
keywords: ALD for batteries; MnS battery anode; atomic layer deposition; manganese sulfide; metal sulfide ALD; thin film batteries; α-MnS; γ-MnS