title: Electrically charged selectivity of poly-para-xylylene deposition.
abstract: The bottom-up patterning approach provides intrinsic advantages associated with unlimited resolution but is limited by the materials available for selection. A general and simple approach towards the selective deposition of poly-para-xylylenes is introduced in this communication. The chemical vapour deposition (CVD) of poly-para-xylylenes is inhibited on the high-energy surfaces of electrically charged conducting substrates. This technology provides an approach to selectively deposit poly-para-xylylenes irrespective of the substituted functionality and to pattern these polymer thin films from the bottom up.
authors.affiliation: Department of Chemical Engineering, National Taiwan University, Taipei, 10617, Taiwan. hsychen@ntu.edu.tw.
authors.forename: Chih-Yu
authors.initials: CY
authors.lastname: Wu
authors.forename: Ho-Yi
authors.initials: HY
authors.lastname: Sun
authors.forename: Wei-Chieh
authors.initials: WC
authors.lastname: Liang
authors.forename: Hung-Lun
authors.initials: HL
authors.lastname: Hsu
authors.forename: Hsin-Ying
authors.initials: HY
authors.lastname: Ho
authors.forename: Yu-Ming
authors.initials: YM
authors.lastname: Chen
authors.forename: Hsien-Yeh
authors.initials: HY
authors.lastname: Chen