title: Perpendicularly oriented sub-10-nm block copolymer lamellae by atmospheric thermal annealing for one minute.
abstract: The directed self-assembly (DSA) of block co-polymers (BCPs) can realize next-generation lithography for semiconductors and a variety of soft materials. It is imperative to simultaneously achieve many requirements such as a high resolution, orientation control of micro-domains, etch selectivity, rapid and mild annealing, a low cost, and compatibility with manufacturing for developing suitable BCPs. Here, we describe a new design for modified polysiloxane-based BCPs targeted for sub-10-nm-wide lines, which are able to form perpendicularly oriented lamellar structures in thin films. The hydroxyl groups in the side chains introduced in the polysiloxane block provide a good balance with the polystyrene surface free energy, thereby leading to the perpendicular orientation. Moreover, this orientation can be completed in only one minute at 130 °C in an air atmosphere. Oxygen plasma etching for the thin films results in the achievement of a line width of 8.5 nm.
authors.affiliation: Department of Organic and Polymeric Materials, Tokyo Institute of Technology, 2-12-1-S8-36 O-okayama, Meguro-ku, Tokyo 152-8552, Japan.|Tokyo Ohka Kogyo Co., Ltd, 1590 Tabata, Samukawa-machi, Koza-Gun, Kanagawa 253-0114, Japan.
authors.forename: Takehiro
authors.initials: T
authors.lastname: Seshimo
authors.affiliation: Department of Organic and Polymeric Materials, Tokyo Institute of Technology, 2-12-1-S8-36 O-okayama, Meguro-ku, Tokyo 152-8552, Japan.
authors.forename: Rina
authors.initials: R
authors.lastname: Maeda
authors.affiliation: Department of Organic and Polymeric Materials, Tokyo Institute of Technology, 2-12-1-S8-36 O-okayama, Meguro-ku, Tokyo 152-8552, Japan.
authors.forename: Rin
authors.initials: R
authors.lastname: Odashima
authors.affiliation: Department of Organic and Polymeric Materials, Tokyo Institute of Technology, 2-12-1-S8-36 O-okayama, Meguro-ku, Tokyo 152-8552, Japan.
authors.forename: Yutaka
authors.initials: Y
authors.lastname: Takenaka
authors.affiliation: Tokyo Ohka Kogyo Co., Ltd, 1590 Tabata, Samukawa-machi, Koza-Gun, Kanagawa 253-0114, Japan.
authors.forename: Daisuke
authors.initials: D
authors.lastname: Kawana
authors.affiliation: Tokyo Ohka Kogyo Co., Ltd, 1590 Tabata, Samukawa-machi, Koza-Gun, Kanagawa 253-0114, Japan.
authors.forename: Katsumi
authors.initials: K
authors.lastname: Ohmori
authors.affiliation: Department of Organic and Polymeric Materials, Tokyo Institute of Technology, 2-12-1-S8-36 O-okayama, Meguro-ku, Tokyo 152-8552, Japan.|Precursory Research for Embryonic Science and Technology (PREST), Japan Science and Technology Agency (JST), 4-1-8 Honcho, Kawaguchi, Saitama 332-0012, Japan.
authors.forename: Teruaki
authors.initials: T
authors.lastname: Hayakawa