title: Transfer of Chemically Modified Graphene with Retention of Functionality for Surface Engineering.
abstract: Single-layer graphene chemically reduced by the Birch process delaminates from a Si/SiOx substrate when exposed to an ethanol/water mixture, enabling transfer of chemically functionalized graphene to arbitrary substrates such as metals, dielectrics, and polymers. Unlike in previous reports, the graphene retains hydrogen, methyl, and aryl functional groups during the transfer process. This enables one to functionalize the receiving substrate with the properties of the chemically modified graphene (CMG). For instance, magnetic force microscopy shows that the previously reported magnetic properties of partially hydrogenated graphene remain after transfer. We also transfer hydrogenated graphene from its copper growth substrate to a Si/SiOx wafer and thermally dehydrogenate it to demonstrate a polymer- and etchant-free graphene transfer for potential use in transmission electron microscopy. Finally, we show that the Birch reduction facilitates delamination of CMG by weakening van der Waals forces between graphene and its substrate.
authors.affiliation: Chemistry Division, ‡Materials Science and Technology Division, and §Electronic Science and Technology Division, U.S. Naval Research Laboratory , Washington, D.C. 20375, United States.
authors.forename: Keith E
authors.initials: KE
authors.lastname: Whitener
authors.affiliation: Chemistry Division, ‡Materials Science and Technology Division, and §Electronic Science and Technology Division, U.S. Naval Research Laboratory , Washington, D.C. 20375, United States.
authors.forename: Woo-Kyung
authors.initials: WK
authors.lastname: Lee
authors.affiliation: Chemistry Division, ‡Materials Science and Technology Division, and §Electronic Science and Technology Division, U.S. Naval Research Laboratory , Washington, D.C. 20375, United States.
authors.forename: Nabil D
authors.initials: ND
authors.lastname: Bassim
authors.affiliation: Chemistry Division, ‡Materials Science and Technology Division, and §Electronic Science and Technology Division, U.S. Naval Research Laboratory , Washington, D.C. 20375, United States.
authors.forename: Rhonda M
authors.initials: RM
authors.lastname: Stroud
authors.affiliation: Chemistry Division, ‡Materials Science and Technology Division, and §Electronic Science and Technology Division, U.S. Naval Research Laboratory , Washington, D.C. 20375, United States.
authors.forename: Jeremy T
authors.initials: JT
authors.lastname: Robinson
authors.affiliation: Chemistry Division, ‡Materials Science and Technology Division, and §Electronic Science and Technology Division, U.S. Naval Research Laboratory , Washington, D.C. 20375, United States.
authors.forename: Paul E
authors.initials: PE
authors.lastname: Sheehan
keywords: Birch reduction; Surface functionalization; functionality transfer; magnetic graphene