title: The simultaneous enhancement of photorefraction and optical damage resistance in MgO and Bi2O3 co-doped LiNbO3 crystals.
abstract: For a long time that optical damage was renamed as photorefraction, here we find that the optical damage resistance and photorefraction can be simultaneously enhanced in MgO and Bi2O3 co-doped LiNbO3 (LN:Bi,Mg). The photorefractive response time of LN:Bi,Mg was shortened to 170 ms while the photorefractive sensitivity reached up to 21 cm(2)/J. Meanwhile, LN:Bi,Mg crystals could withstand a light intensity higher than 10(6)  W/cm(2) without apparent optical damage. Our experimental results indicate that photorefraction doesn't equal to optical damage. The underground mechanism was analyzed and attributed to that diffusion dominates the transport process of charge carriers, that is to say photorefraction causes only slight optical damage under diffusion mechanism, which is very important for the practical applications of photorefractive crystals, such as in holographic storage, integrated optics and 3D display.
authors.affiliation: School of Physics, Nankai University, Tianjin 300071, China.|Collaborative Innovation Center of Chemical Science and Engineering (Tianjin), Tianjin 300072, China.
authors.forename: Dahuai
authors.initials: D
authors.lastname: Zheng
authors.affiliation: MOE Key Laboratory of Weak-Light Nonlinear Photonics and TEDA Applied Physics School, Nankai University, Tianjin 300457, China.|R&D Center, Taishan Sports Industry Group, Leling 253600, China.|Collaborative Innovation Center of Chemical Science and Engineering (Tianjin), Tianjin 300072, China.
authors.forename: Yongfa
authors.initials: Y
authors.lastname: Kong
authors.affiliation: School of Physics, Nankai University, Tianjin 300071, China.
authors.forename: Shiguo
authors.initials: S
authors.lastname: Liu
authors.affiliation: School of Physics, Nankai University, Tianjin 300071, China.|Collaborative Innovation Center of Chemical Science and Engineering (Tianjin), Tianjin 300072, China.
authors.forename: Muling
authors.initials: M
authors.lastname: Chen
authors.affiliation: MOE Key Laboratory of Weak-Light Nonlinear Photonics and TEDA Applied Physics School, Nankai University, Tianjin 300457, China.
authors.forename: Shaolin
authors.initials: S
authors.lastname: Chen
authors.affiliation: MOE Key Laboratory of Weak-Light Nonlinear Photonics and TEDA Applied Physics School, Nankai University, Tianjin 300457, China.
authors.forename: Ling
authors.initials: L
authors.lastname: Zhang
authors.affiliation: MOE Key Laboratory of Weak-Light Nonlinear Photonics and TEDA Applied Physics School, Nankai University, Tianjin 300457, China.|Vienna University, Faculty of Physics, A-1090 Wien, Austria.
authors.forename: Romano
authors.initials: R
authors.lastname: Rupp
authors.affiliation: School of Physics, Nankai University, Tianjin 300071, China.|MOE Key Laboratory of Weak-Light Nonlinear Photonics and TEDA Applied Physics School, Nankai University, Tianjin 300457, China.|Collaborative Innovation Center of Chemical Science and Engineering (Tianjin), Tianjin 300072, China.
authors.forename: Jingjun
authors.initials: J
authors.lastname: Xu
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