title: Ultra-thin Graphitic Film: Synthesis and Physical Properties.
abstract: A scalable technique of chemical vapor deposition (CVD) growth of ultra-thin graphitic film is proposed. Ultra-thin graphitic films grown by a one-step CVD process on catalytic copper substrate have higher crystallinity than pyrolytic carbon grown on a non-catalytic surface and appear to be more robust than a graphene monolayer. The obtained graphitic material, not thicker than 8 nm, survives during the transfer process from a Cu substrate without a template polymer layer, typically used in the graphene transfer process to protect graphene. This makes the transfer process much more simple and cost-effective. Having electrical and optical properties compatible with what was observed for a few layers of CVD graphene, the proposed ultra-thin graphitic film offers new avenues for implementing 2D materials in real-world devices.
authors.affiliation: Institute of Photonics, University of Eastern Finland, Yliopistokatu 7, 80101, Joensuu, Finland.
authors.forename: Tommi
authors.initials: T
authors.lastname: Kaplas
authors.affiliation: Research Institute for Nuclear Problems, 11 Bobrujskaya Str., Minsk, 220030, Belarus. polina.kuzhir@gmail.com.|Ryazan State Radio Engineering University, 59/1 Gagarina Street, Ryazan, 390005, Russia. polina.kuzhir@gmail.com.
authors.forename: Polina
authors.initials: P
authors.lastname: Kuzhir
keywords: CVD synthesis; Graphene; Optical properties; Pyrolytic carbon; Sheet resistance; Thin film; Transfer process
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