title: New method of plasma immersion ion implantation and also deposition of industrial components using tubular fixture and plasma generated inside the tube by high voltage pulses.
abstract: A new method of Plasma Immersion Ion Implantation (PIII) and deposition (PIII and D) for treating industrial components in the batch mode has been developed. A metal tubular fixture is used to allocate the components inside, around, and along the tube, exposing only the parts of each component that are to be ion implanted to the plasma. Hollow cathode-like plasma is generated only inside the tube filled with the desired gas, by applying high negative voltage pulses to the hollow cylindrical fixture which is insulated from the vacuum chamber walls. This is a very convenient method of batch processing of industrial parts by ion implantation, in which a large number of small to medium sized components can be treated by PIII and PIII and D, very quickly, efficiently, and also at low cost.
authors.affiliation: Associated Laboratory of Plasma, National Institute for Space Research, São José dos Campos, SP 12227-010, Brazil.
authors.forename: Mario
authors.initials: M
authors.lastname: Ueda
authors.affiliation: Associated Laboratory of Plasma, National Institute for Space Research, São José dos Campos, SP 12227-010, Brazil.
authors.forename: Ataide Ribeiro
authors.initials: AR
authors.lastname: da Silva
authors.affiliation: Associated Laboratory of Plasma, National Institute for Space Research, São José dos Campos, SP 12227-010, Brazil.
authors.forename: Elver J D M
authors.initials: EJ
authors.lastname: Pillaca
authors.affiliation: Associated Laboratory of Plasma, National Institute for Space Research, São José dos Campos, SP 12227-010, Brazil.
authors.forename: Samantha F M
authors.initials: SF
authors.lastname: Mariano
authors.affiliation: Associated Laboratory of Plasma, National Institute for Space Research, São José dos Campos, SP 12227-010, Brazil.
authors.forename: Rogério de Moraes
authors.initials: Rde M
authors.lastname: Oliveira
authors.affiliation: Associated Laboratory of Plasma, National Institute for Space Research, São José dos Campos, SP 12227-010, Brazil.
authors.forename: José Osvaldo
authors.initials: JO
authors.lastname: Rossi
authors.affiliation: Department of Physics, Federal University of Paraná, Curitiba, PR 81531990, Brazil.
authors.forename: Carlos Mauricio
authors.initials: CM
authors.lastname: Lepienski
authors.affiliation: Institut Pprime -UPR 3346 CNRS-Université de Poitiers-ENSMA, Poitiers 86073, France.
authors.forename: Luc
authors.initials: L
authors.lastname: Pichon