title: Metasurface-based broadband hologram with high tolerance to fabrication errors.
abstract: With new degrees of freedom to achieve full control of the optical wavefront, metasurfaces could overcome the fabrication embarrassment faced by the metamaterials. In this paper, a broadband hologram using metasurface consisting of elongated nanoapertures array with different orientations has been experimentally demonstrated. Owing to broadband characteristic of the polarization-dependent scattering, the performance is verified at working wavelength ranging from 405 nm to 914 nm. Furthermore, the tolerance to the fabrication errors, which include the length and width of the elongated aperture, the shape deformation and the phase noise, has been theoretically investigated to be as large as 10% relative to the original hologram. We believe the method proposed here is promising in emerging applications such as holographic display, optical information processing and lithography technology etc.
authors.affiliation: State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Science, P.O. Box 350, Chengdu 610209, China.|University of Chinese Academy of Sciences, Beijing 100049, China.
authors.forename: Xiaohu
authors.initials: X
authors.lastname: Zhang
authors.affiliation: State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Science, P.O. Box 350, Chengdu 610209, China.|University of Chinese Academy of Sciences, Beijing 100049, China.
authors.forename: Jinjin
authors.initials: J
authors.lastname: Jin
authors.affiliation: State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Science, P.O. Box 350, Chengdu 610209, China.
authors.forename: Yanqin
authors.initials: Y
authors.lastname: Wang
authors.affiliation: State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Science, P.O. Box 350, Chengdu 610209, China.
authors.forename: Mingbo
authors.initials: M
authors.lastname: Pu
authors.affiliation: State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Science, P.O. Box 350, Chengdu 610209, China.
authors.forename: Xiong
authors.initials: X
authors.lastname: Li
authors.affiliation: State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Science, P.O. Box 350, Chengdu 610209, China.
authors.forename: Zeyu
authors.initials: Z
authors.lastname: Zhao
authors.affiliation: State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Science, P.O. Box 350, Chengdu 610209, China.
authors.forename: Ping
authors.initials: P
authors.lastname: Gao
authors.affiliation: State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Science, P.O. Box 350, Chengdu 610209, China.
authors.forename: Changtao
authors.initials: C
authors.lastname: Wang
authors.affiliation: State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Science, P.O. Box 350, Chengdu 610209, China.
authors.forename: Xiangang
authors.initials: X
authors.lastname: Luo
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