title: High-responsivity UV-Vis Photodetector Based on Transferable WS2 Film Deposited by Magnetron Sputtering.
abstract: The two-dimensional layered semiconducting tungsten disulfide (WS2) film exhibits great promising prospects in the photoelectrical applications because of its unique photoelectrical conversion property. Herein, in this paper, we report the simple and scalable fabrication of homogeneous, large-size and transferable WS2 films with tens-of-nanometers thickness through magnetron sputtering and post annealing process. The produced WS2 films with low resistance (4.2 kΩ) are used to fabricate broadband sensitive photodetectors in the ultraviolet to visible region. The photodetectors exhibit excellent photoresponse properties, with a high responsivity of 53.3 A/W and a high detectivity of 1.22 × 10(11) Jones at 365 nm. The strategy reported paves new way towards the large scale growth of transferable high quality, uniform WS2 films for various important applications including high performance photodetectors, solar cell, photoelectrochemical cell and so on.
authors.affiliation: Department of Applied Physics, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong.
authors.forename: Longhui
authors.initials: L
authors.lastname: Zeng
authors.affiliation: Department of Applied Physics, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong.
authors.forename: Lili
authors.initials: L
authors.lastname: Tao
authors.affiliation: Department of Applied Physics, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong.
authors.forename: Chunyin
authors.initials: C
authors.lastname: Tang
authors.affiliation: Department of Applied Physics, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong.
authors.forename: Bo
authors.initials: B
authors.lastname: Zhou
authors.affiliation: Department of Applied Physics, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong.
authors.forename: Hui
authors.initials: H
authors.lastname: Long
authors.affiliation: Department of Applied Physics, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong.
authors.forename: Yang
authors.initials: Y
authors.lastname: Chai
authors.affiliation: Department of Applied Physics, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong.
authors.forename: Shu Ping
authors.initials: SP
authors.lastname: Lau
authors.affiliation: Department of Applied Physics, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong.
authors.forename: Yuen Hong
authors.initials: YH
authors.lastname: Tsang
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