title: Resistance switching behavior of atomic layer deposited SrTiO3 film through possible formation of Sr2Ti6O13 or Sr1Ti11O20 phases.
abstract: Identification of microstructural evolution of nanoscale conducting phase, such as conducting filament (CF), in many resistance switching (RS) devices is a crucial factor to unambiguously understand the electrical behaviours of the RS-based electronic devices. Among the diverse RS material systems, oxide-based redox system comprises the major category of these intriguing electronic devices, where the local, along both lateral and vertical directions of thin films, changes in oxygen chemistry has been suggested to be the main RS mechanism. However, there are systems which involve distinctive crystallographic phases as CF; the Magnéli phase in TiO2 is one of the very well-known examples. The current research reports the possible presence of distinctive local conducting phase in atomic layer deposited SrTiO3 RS thin film. The conducting phase was identified through extensive transmission electron microscopy studies, which indicated that oxygen-deficient Sr2Ti6O13 or Sr1Ti11O20 phase was presumably present mainly along the grain boundaries of SrTiO3 after the unipolar set switching in Pt/TiN/SrTiO3/Pt structure. A detailed electrical characterization revealed that the samples showed typical bipolar and complementary RS after the memory cell was unipolar reset.
authors.affiliation: Department of Materials Science and Engineering and Inter-university Semiconductor Research Center, Seoul National University, Seoul 151-744, Korea.
authors.forename: Woongkyu
authors.initials: W
authors.lastname: Lee
authors.affiliation: Department of Materials Science and Engineering and Inter-university Semiconductor Research Center, Seoul National University, Seoul 151-744, Korea.
authors.forename: Sijung
authors.initials: S
authors.lastname: Yoo
authors.affiliation: Department of Materials Science and Engineering and Inter-university Semiconductor Research Center, Seoul National University, Seoul 151-744, Korea.
authors.forename: Kyung Jean
authors.initials: KJ
authors.lastname: Yoon
authors.affiliation: Department of Materials Science and Engineering and Inter-university Semiconductor Research Center, Seoul National University, Seoul 151-744, Korea.|Center for Electronic Materials, Korea Institute of Science and Technology, Seoul 136-791, Korea.
authors.forename: In Won
authors.initials: IW
authors.lastname: Yeu
authors.affiliation: Advanced Analysis Center, Korea Institute of Science and Technology, Seoul 136-791, Korea.
authors.forename: Hye Jung
authors.initials: HJ
authors.lastname: Chang
authors.affiliation: Center for Electronic Materials, Korea Institute of Science and Technology, Seoul 136-791, Korea.
authors.forename: Jung-Hae
authors.initials: JH
authors.lastname: Choi
authors.affiliation: Peter Gruenberg Institute (PGI-7), Forschungszentrum Juelich GmbH, and Juelich-Aachen Research Alliance (JARA-FIT), Juelich, Germany.
authors.forename: Susanne
authors.initials: S
authors.lastname: Hoffmann-Eifert
authors.affiliation: Peter Gruenberg Institute (PGI-7), Forschungszentrum Juelich GmbH, and Juelich-Aachen Research Alliance (JARA-FIT), Juelich, Germany.
authors.forename: Rainer
authors.initials: R
authors.lastname: Waser
authors.affiliation: Department of Materials Science and Engineering and Inter-university Semiconductor Research Center, Seoul National University, Seoul 151-744, Korea.
authors.forename: Cheol Seong
authors.initials: CS
authors.lastname: Hwang
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