title: Selective Formation of Conductive Network by Radical-Induced Oxidation.
abstract: Cd-based coordination networks having channels were formed selectively by using a redox-active aromatic ligand 2,5,8-tri(4-pyridyl)1,3-diazaphenalene (TPDAP, H(+)1(-)). An electron-conductive network having a π-π stacking columnar structure of TPDAP formed in the presence of a trace amount of TPDAP radical (1(•)). In contrast, a nonconductive network having a dimer unit of H(+)1(-) formed in the absence of 1(•). These results suggest the presence of a unique oxidation mechanism of TPDAP induced by formation of H(+)1(-)-1(•) dimer, which was initiated by a trace amount of 1(•). The dimerization increased HOMO level of H(+)1(-) moiety within the dimer to generate further radicals that could not form when H(+)1(-) was well isolated in CH3OH.
authors.affiliation: The Division of Advanced Materials Science, Pohang University of Science and Technology (POSTECH) , 77 Cheongam-ro, Namgu, Pohang 790-784, Korea.
authors.forename: Jin Young
authors.initials: JY
authors.lastname: Koo
authors.affiliation: The Division of Advanced Materials Science, Pohang University of Science and Technology (POSTECH) , 77 Cheongam-ro, Namgu, Pohang 790-784, Korea.
authors.forename: Yumi
authors.initials: Y
authors.lastname: Yakiyama
authors.affiliation: The Division of Advanced Materials Science, Pohang University of Science and Technology (POSTECH) , 77 Cheongam-ro, Namgu, Pohang 790-784, Korea.
authors.forename: Gil Ryeong
authors.initials: GR
authors.lastname: Lee
authors.affiliation: Department of Chemistry, Pohang University of Science and Technology (POSTECH) , 77 Cheongam-ro, Namgu, Pohang 790-784, Korea.
authors.forename: Jinho
authors.initials: J
authors.lastname: Lee
authors.affiliation: Center for Artificial Low Dimensional Electronic Systems, Institute for Basic Science (IBS) , 77 Cheongam-ro, Pohang 790-784, Korea.|Department of Chemistry, Pohang University of Science and Technology (POSTECH) , 77 Cheongam-ro, Namgu, Pohang 790-784, Korea.
authors.forename: Hee Cheul
authors.initials: HC
authors.lastname: Choi
authors.affiliation: Department of Applied Chemistry, Faculty of Engineering, Aichi Institute of Technology , Yachigusa 1247, Yakusa, Toyota 470-0392, Japan.
authors.forename: Yasushi
authors.initials: Y
authors.lastname: Morita
authors.affiliation: The Division of Advanced Materials Science, Pohang University of Science and Technology (POSTECH) , 77 Cheongam-ro, Namgu, Pohang 790-784, Korea.
authors.forename: Masaki
authors.initials: M
authors.lastname: Kawano