title: Silver Ink Formulations for Sinter-free Printing of Conductive Films.
abstract: Inkjet printing offers an attractive method for the deposition of metal interconnects in electronic systems and enables a low-cost, environmentally friendly route to manufacture. However, virtually all current metal inkjet processes require post-deposition sintering treatments to achieve the optimum electrical conductivity, because the growth mechanism involves coalescence of discrete nanoparticles. A manufacturing process that reduces the number of steps by directly printing silver, removing the need to sinter the printed metal, would be highly advantageous. Here we describe a, sinter-free process that results in the direct printing of crystalline silver. This process exploits the chemistries developed for Atomic Layer Deposition (ALD), to form the basis of a new ink formulation, which we term; Reactive Organometallic inks (ROM). These ROM ink formulations are capable of depositing low temperature, high conductivity metal films, without the need for subsequent sintering treatments. To reduce the temperature for direct formation of metallic Ag, we have added an alcohol as a catalytic reducing agent to dissociate the organometallic component. Silver films printed from our novel ROM ink, on a glass substrate at 120 °C, are electrically conductive with a typical resistivity as low as 39.2% that of bulk silver, without the need for sintering.
authors: University Liverpool, Department of Engineering, Liverpool L69 3GH, Merseyside, England.
authors: Kate
authors: K
authors: Black
authors: University Liverpool, Department of Engineering, Liverpool L69 3GH, Merseyside, England.
authors: Jetinder
authors: J
authors: Singh
authors: University Liverpool, Department of Engineering, Liverpool L69 3GH, Merseyside, England.
authors: Danielle
authors: D
authors: Mehta
authors: University Liverpool, Department of Engineering, Liverpool L69 3GH, Merseyside, England.
authors: Sarah
authors: S
authors: Sung
authors: University Liverpool, Department of Engineering, Liverpool L69 3GH, Merseyside, England.
authors: Christopher J
authors: CJ
authors: Sutcliffe
authors: University Liverpool, Department of Engineering, Liverpool L69 3GH, Merseyside, England.
authors: Paul R
authors: PR
authors: Chalker