title: In Situ Mitigation of Subsurface and Peripheral Focused Ion Beam Damage via Simultaneous Pulsed Laser Heating.
abstract: Focused helium and neon ion (He(+)/Ne(+)) beam processing has recently been used to push resolution limits of direct-write nanoscale synthesis. The ubiquitous insertion of focused He(+)/Ne(+) beams as the next-generation nanofabrication tool-of-choice is currently limited by deleterious subsurface and peripheral damage induced by the energetic ions in the underlying substrate. The in situ mitigation of subsurface damage induced by He(+)/Ne(+) ion exposures in silicon via a synchronized infrared pulsed laser-assisted process is demonstrated. The pulsed laser assist provides highly localized in situ photothermal energy which reduces the implantation and defect concentration by greater than 90%. The laser-assisted exposure process is also shown to reduce peripheral defects in He(+) patterned graphene, which makes this process an attractive candidate for direct-write patterning of 2D materials. These results offer a necessary solution for the applicability of high-resolution direct-write nanoscale material processing via focused ion beams.
authors: Materials Science and Engineering Department, University of Tennessee, Knoxville, TN, 37996, USA.
authors: Michael G
authors: MG
authors: Stanford
authors: Materials Science and Engineering Department, University of Tennessee, Knoxville, TN, 37996, USA.
authors: Brett B
authors: BB
authors: Lewis
authors: Nanofabrication Research Laboratory, Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN, 37381, USA.
authors: Vighter
authors: V
authors: Iberi
authors: Materials Science and Engineering Department, University of Tennessee, Knoxville, TN, 37996, USA.|Nanofabrication Research Laboratory, Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN, 37381, USA.
authors: Jason D
authors: JD
authors: Fowlkes
authors: Intel Corporation Santa Clara, MS: SC9-68, 2200 Mission College Blvd, CA, 95054, USA.
authors: Shida
authors: S
authors: Tan
authors: Intel Corporation Santa Clara, MS: SC9-68, 2200 Mission College Blvd, CA, 95054, USA.
authors: Rick
authors: R
authors: Livengood
authors: Materials Science and Engineering Department, University of Tennessee, Knoxville, TN, 37996, USA.|Nanofabrication Research Laboratory, Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN, 37381, USA.
authors: Philip D
authors: PD
authors: Rack
keywords: direct-write processing; graphene milling; ion beams; laser heating; subsurface damage mitigation