title: Maskless, High-Precision, Persistent, and Extreme Wetting-Contrast Patterning in an Environmental Scanning Electron Microscope.
abstract: A maskless and programmable direct electron beam writing method is reported for making high-precision superhydrophilic-superhydrophobic wetting patterns with 152° contact angle contrast using an environmental scanning electron microscope (ESEM). The smallest linewidth achieved is below 1 μm. The reported effects of the electron beam induced local plasma may also influence a variety of microscopic wetting studies in ESEM.
authors.affiliation: Department of Electrical Engineering and Automation, School of Electrical Engineering, Aalto University, Otaniementie 17, Espoo, 02150, Finland.
authors.forename: Ville
authors.initials: V
authors.lastname: Liimatainen
authors.affiliation: Department of Micro- and Nanosciences, School of Electrical Engineering, Aalto University, Otaniementie 17, Espoo, 02150, Finland.
authors.forename: Ali
authors.initials: A
authors.lastname: Shah
authors.affiliation: Department of Forest Products Technology, School of Chemical Technology, Aalto University, Otaniementie 17, Espoo, 02150, Finland.
authors.forename: Leena-Sisko
authors.initials: LS
authors.lastname: Johansson
authors.affiliation: Department of Applied Physics, School of Science, Aalto University, Otaniementie 17, Espoo, 02150, Finland.
authors.forename: Nikolay
authors.initials: N
authors.lastname: Houbenov
authors.affiliation: Department of Electrical Engineering and Automation, School of Electrical Engineering, Aalto University, Otaniementie 17, Espoo, 02150, Finland.
authors.forename: Quan
authors.initials: Q
authors.lastname: Zhou