title: 3D nanostructures fabricated by advanced stencil lithography.
abstract: This letter reports on a novel fabrication method for 3D metal nanostructures using high-throughput nanostencil lithography. Aperture clogging, which occurs on the stencil membranes during physical vapor deposition, is leveraged to create complex topographies on the nanoscale. The precision of the 3D nanofabrication method is studied in terms of geometric parameters and material types. The versatility of the technique is demonstrated by various symmetric and chiral patterns made of Al and Au.
authors.affiliation: EPFL STI IMT LMIS1, CH-1015 Lausanne, Switzerland. juergen.brugger@epfl.ch and The University of Tokyo IIS CIRMM, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan.
authors.forename: F
authors.initials: F
authors.lastname: Yesilkoy
authors.affiliation: EPFL STI IMT LMIS1, CH-1015 Lausanne, Switzerland. juergen.brugger@epfl.ch.
authors.forename: V
authors.initials: V
authors.lastname: Flauraud
authors.affiliation: EPFL STI IMT LMIS1, CH-1015 Lausanne, Switzerland. juergen.brugger@epfl.ch.
authors.forename: M
authors.initials: M
authors.lastname: Rüegg
authors.affiliation: The University of Tokyo IIS CIRMM, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan.
authors.forename: B J
authors.initials: BJ
authors.lastname: Kim
authors.affiliation: EPFL STI IMT LMIS1, CH-1015 Lausanne, Switzerland. juergen.brugger@epfl.ch.
authors.forename: J
authors.initials: J
authors.lastname: Brugger