title: Mogul-Patterned Elastomeric Substrate for Stretchable Electronics.
abstract: A mogul-patterned stretchable substrate with multidirectional stretchability and minimal fracture of layers under high stretching is fabricated by double photolithography and soft lithography. Au layers and a reduced graphene oxide chemiresistor on a mogul-patterned poly(dimethylsiloxane) substrate are stable and durable under various stretching conditions. The newly designed mogul-patterned stretchable substrate shows great promise for stretchable electronics.
authors.affiliation: School of Advanced Materials Science & Engineering, Sungkyunkwan University, 2066 Seobu-ro, Jangan-gu, Suwon, Kyunggi-do, 16419, South Korea.
authors.forename: Han-Byeol
authors.initials: HB
authors.lastname: Lee
authors.affiliation: School of Advanced Materials Science & Engineering, Sungkyunkwan University, 2066 Seobu-ro, Jangan-gu, Suwon, Kyunggi-do, 16419, South Korea.
authors.forename: Chan-Wool
authors.initials: CW
authors.lastname: Bae
authors.affiliation: School of Advanced Materials Science & Engineering, Sungkyunkwan University, 2066 Seobu-ro, Jangan-gu, Suwon, Kyunggi-do, 16419, South Korea.
authors.forename: Le Thai
authors.initials: le T
authors.lastname: Duy
authors.affiliation: School of Advanced Materials Science & Engineering, Sungkyunkwan University, 2066 Seobu-ro, Jangan-gu, Suwon, Kyunggi-do, 16419, South Korea.
authors.forename: Il-Yung
authors.initials: IY
authors.lastname: Sohn
authors.affiliation: School of Advanced Materials Science & Engineering, Sungkyunkwan University, 2066 Seobu-ro, Jangan-gu, Suwon, Kyunggi-do, 16419, South Korea.
authors.forename: Do-Il
authors.initials: DI
authors.lastname: Kim
authors.affiliation: School of Mechanical Engineering, Sungkyunkwan University, 2066 Seobu-ro, Jangan-gu, Suwon, Kyunggi-do, 16419, South Korea.
authors.forename: You-Joon
authors.initials: YJ
authors.lastname: Song
authors.affiliation: School of Mechanical Engineering, Sungkyunkwan University, 2066 Seobu-ro, Jangan-gu, Suwon, Kyunggi-do, 16419, South Korea.
authors.forename: Youn-Jea
authors.initials: YJ
authors.lastname: Kim
authors.affiliation: School of Advanced Materials Science & Engineering, SKKU Advanced Institute of Nanotechnology (SAINT) and, Samsung Advanced Institute for Health Sciences & Technology (SAIHST), Sungkyunkwan University, 2066 Seobu-ro, Jangan-gu, Suwon, Kyunggi-do, 16419, South Korea.
authors.forename: Nae-Eung
authors.initials: NE
authors.lastname: Lee
mesh_terms: D004129:Dimethylpolysiloxanes / Q000737:chemistry; D004548:Elasticity; D020724:Elastomers; D004581:Electronics / Q000295:instrumentation* / Q000379:methods*; D006046:Gold / Q000737:chemistry; D006108:Graphite / Q000737:chemistry; D011108:Polymers / Q000737:chemistry*; D011327:Printing
chemical_list: D004129:Dimethylpolysiloxanes; D020724:Elastomers; D011108:Polymers; C036925:elastomeric polymer; D006046:Gold; D006108:Graphite
keywords: double photolithography; mogul-patterned substrate; reduced graphene oxide chemiresistor; soft lithography; stretchable