title: Microscale Soft Patterning for Solution Processable Metal Oxide Thin Film Transistors.
abstract: We introduce a microscale soft pattering (MSP) route utilizing contact printing of chemically inert sub-nanometer thick low molecular weight (LMW) poly(dimethylsiloxane) (PDMS) layers. These PDMS layers serve as a release agent layer between the n-type Ohmic metal and metal oxide semiconductors (MOSs) and provide a layer that protects the MOS from water in the surrounding environment. The feasibility of our MSP route was experimentally demonstrated by fabricating solution processable In2O3, IZO, and IGZO TFTs with aluminum (Al), a typical n-type Ohmic metal. We have demonstrated patterning gaps as small as 13 μm. The TFTs fabricated using MSP showed higher field-effect-mobility and lower hysteresis in comparison with those made using conventional photolithography.
authors.affiliation: Department of Materials Science and Engineering, Yonsei University , 134 Shinchong-dong, Seoul 120-750, South Korea.|Samsung Display Co. Ltd. , Tangjeong, Chuncheongnam-Do 336-741, South Korea.
authors.forename: Sang Wook
authors.initials: SW
authors.lastname: Jung
authors.affiliation: Department of Materials Science and Engineering, Yonsei University , 134 Shinchong-dong, Seoul 120-750, South Korea.
authors.forename: Soo Sang
authors.initials: SS
authors.lastname: Chae
authors.affiliation: Department of Materials Science and Engineering, Yonsei University , 134 Shinchong-dong, Seoul 120-750, South Korea.
authors.forename: Jee Ho
authors.initials: JH
authors.lastname: Park
authors.affiliation: Department of Materials Science and Engineering, Yonsei University , 134 Shinchong-dong, Seoul 120-750, South Korea.
authors.forename: Jin Young
authors.initials: JY
authors.lastname: Oh
authors.affiliation: School of Chemical Engineering, Sungkyunkwan University , 2066 Seobu-ro, Jangan-gu, Suwon, Gyeonggi-do South Korea.
authors.forename: Suk Ho
authors.initials: SH
authors.lastname: Bhang
authors.affiliation: Department of Materials Science and Engineering, Yonsei University , 134 Shinchong-dong, Seoul 120-750, South Korea.
authors.forename: Hong Koo
authors.initials: HK
authors.lastname: Baik
authors.affiliation: Department of BioNano Technology, Gachon University , Seongnam, Gyeonggi-Do 461-701, South Korea.
authors.forename: Tae Il
authors.initials: TI
authors.lastname: Lee
keywords: contact printing; metal oxide semiconductor; metal patterning; soft-lithography; thin film transistor