title: First operation and effect of a new tandem-type ion source based on electron cyclotron resonance.
abstract: A new tandem type source has been constructed on the basis of electron cyclotron resonance plasma for producing synthesized ion beams in Osaka University. Magnetic field in the first stage consists of all permanent magnets, i.e., cylindrically comb shaped one, and that of the second stage consists of a pair of mirror coil, a supplemental coil and the octupole magnets. Both stage plasmas can be individually operated, and produced ions in which is energy controlled by large bore extractor also can be transported from the first to the second stage. We investigate the basic operation and effects of the tandem type electron cyclotron resonance ion source (ECRIS). Analysis of ion beams and investigation of plasma parameters are conducted on produced plasmas in dual plasmas operation as well as each single operation. We describe construction and initial experimental results of the new tandem type ion source based on ECRIS with wide operation window for aiming at producing synthesized ion beams as this new source can be a universal source in future.
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Yushi
authors.initials: Y
authors.lastname: Kato
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Daiju
authors.initials: D
authors.lastname: Kimura
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Keisuke
authors.initials: K
authors.lastname: Yano
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Sho
authors.initials: S
authors.lastname: Kumakura
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Youta
authors.initials: Y
authors.lastname: Imai
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Takuya
authors.initials: T
authors.lastname: Nishiokada
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Tomoki
authors.initials: T
authors.lastname: Nagaya
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Shogo
authors.initials: S
authors.lastname: Hagino
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Takuro
authors.initials: T
authors.lastname: Otsuka
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Fuminobu
authors.initials: F
authors.lastname: Sato