title: A graphene superficial layer for the advanced electroforming process.
abstract: Advances in electroplating technology facilitate the progress of modern electronic devices, including computers, microprocessors and other microelectronic devices. Metal layers with high electrical and thermal conductivities are essential for high speed and high power devices. In this paper, we report an effective route to fabricate free-standing metal films using graphene as a superficial layer in the electroforming process. Chemical vapor deposition (CVD) graphene grown on a Cu foil was used as a template, which provides high electrical conductivity and low adhesive force with the template, thus enabling an effective electroforming process. The required force for delamination of the electroplated Cu layer from graphene is more than one order smaller than the force required for removing graphene from the Cu foil. We also demonstrated that the electroformed free-standing Cu thin films could be utilized for patterning microstructures and incorporated onto a flexible substrate for LEDs. This innovative process could be beneficial for the advancement of flexible electronics and optoelectronics, which require a wide range of mechanical and physical properties.
authors.affiliation: Soft Innovative Materials Research Center, Institute of Advanced Composite Materials, Korea Institute of Science and Technology, Joellabuk-do 55324, Republic of Korea. sanghyun.lee@kist.re.kr.
authors.forename: Hokyun
authors.initials: H
authors.lastname: Rho
authors.forename: Mina
authors.initials: M
authors.lastname: Park
authors.forename: Seungmin
authors.initials: S
authors.lastname: Lee
authors.forename: Sukang
authors.initials: S
authors.lastname: Bae
authors.forename: Tae-Wook
authors.initials: TW
authors.lastname: Kim
authors.forename: Jun-Seok
authors.initials: JS
authors.lastname: Ha
authors.forename: Sang Hyun
authors.initials: SH
authors.lastname: Lee