title: Correlation of p-doping in CVD Graphene with Substrate Surface Charges.
abstract: Correlations between the level of p-doping exhibited in large area chemical vapour deposition (CVD) graphene field effect transistor structures (gFETs) and residual charges created by a variety of surface treatments to the silicon dioxide (SiO2) substrates prior to CVD graphene transfer are measured. Beginning with graphene on untreated thermal oxidised silicon, a minimum conductivity (σ(min)) occurring at gate voltage V(g) = 15 V (Dirac Point) is measured. It was found that more aggressive treatments (O2 plasma and UV Ozone treatments) further increase the gate voltage of the Dirac point up to 65 V, corresponding to a significant increase of the level of p-doping displayed in the graphene. An electrowetting model describing the measured relationship between the contact angle (θ) of a water droplet applied to the treated substrate/graphene surface and an effective gate voltage from a surface charge density is proposed to describe biasing of V(g) at σ(min) and was found to fit the measurements with multiplication of a correction factor, allowing effective non-destructive approximation of substrate added charge carrier density using contact angle measurements.
authors.affiliation: Department of Materials, Imperial College London, London SW7 2AZ, UK.|National Physical Laboratory, Teddington, Middlesex, TW11 0LW, UK.
authors.forename: S
authors.initials: S
authors.lastname: Goniszewski
authors.affiliation: Department of Materials, Imperial College London, London SW7 2AZ, UK.
authors.forename: M
authors.initials: M
authors.lastname: Adabi
authors.affiliation: Department of Materials, Imperial College London, London SW7 2AZ, UK.|National Physical Laboratory, Teddington, Middlesex, TW11 0LW, UK.
authors.forename: O
authors.initials: O
authors.lastname: Shaforost
authors.affiliation: Department of Materials, Imperial College London, London SW7 2AZ, UK.
authors.forename: S M
authors.initials: SM
authors.lastname: Hanham
authors.affiliation: Department of Materials, Imperial College London, London SW7 2AZ, UK.|National Physical Laboratory, Teddington, Middlesex, TW11 0LW, UK.
authors.forename: L
authors.initials: L
authors.lastname: Hao
authors.affiliation: Department of Materials, Imperial College London, London SW7 2AZ, UK.
authors.forename: N
authors.initials: N
authors.lastname: Klein