title: X-ray nanodiffraction analysis of stress oscillations in a W thin film on through-silicon via.
abstract: Synchrotron X-ray nanodiffraction is used to analyse residual stress distributions in a 200 nm-thick W film deposited on the scalloped inner wall of a through-silicon via. The diffraction data are evaluated using a novel dedicated methodology which allows the quantification of axial and tangential stress components under the condition that radial stresses are negligible. The results reveal oscillatory axial stresses in the range of ∼445-885 MPa, with a distribution that correlates well with the scallop wavelength and morphology, as well as nearly constant tangential stresses of ∼800 MPa. The discrepancy with larger stress values obtained from a finite-element model, as well as from a blanket W film, is attributed to the morphology and microstructural nature of the W film in the via.
authors.affiliation: Department of Materials Physics, Montanuniversität Leoben , Leoben, Austria.
authors.forename: J
authors.initials: J
authors.lastname: Todt
authors.affiliation: Materials Center Leoben Forschung GmbH , Roseggerstrasse 12, Leoben, Austria.
authors.forename: H
authors.initials: H
authors.lastname: Hammer
authors.affiliation: Materials Center Leoben Forschung GmbH , Roseggerstrasse 12, Leoben, Austria.
authors.forename: B
authors.initials: B
authors.lastname: Sartory
authors.affiliation: European Synchrotron Radiation Facility , 6 Rue Jules Horowitz, Grenoble, France.
authors.forename: M
authors.initials: M
authors.lastname: Burghammer
authors.affiliation: ams AG , Unterpremstätten, Austria.
authors.forename: J
authors.initials: J
authors.lastname: Kraft
authors.affiliation: Department of Physical Metallurgy and Materials Testing, Montanuniversität Leoben , Austria.
authors.forename: R
authors.initials: R
authors.lastname: Daniel
authors.affiliation: Department of Materials Physics, Montanuniversität Leoben , Leoben, Austria.
authors.forename: J
authors.initials: J
authors.lastname: Keckes
authors.affiliation: Materials Center Leoben Forschung GmbH , Roseggerstrasse 12, Leoben, Austria.
authors.forename: S
authors.initials: S
authors.lastname: Defregger
keywords: X-ray nanodiffraction; residual stress; through-silicon via