title: Drift transport of helical spin coherence with tailored spin-orbit interactions.
abstract: Most future information processing techniques using electron spins in non-magnetic semiconductors will require both the manipulation and transfer of spins without their coherence being lost. The spin-orbit effective magnetic field induced by drifting electrons enables us to rotate the electron spins in the absence of an external magnetic field. However, the fluctuations in the effective magnetic field originating from the random scattering of electrons also cause undesirable spin decoherence, which limits the length scale of the spin transport. Here we demonstrate the drift transport of electron spins adjusted to a robust spin structure, namely a persistent spin helix. We find that the persistent spin helix enhances the spatial coherence of drifting spins, resulting in maximized spin decay length near the persistent spin helix condition. Within the enhanced distance of the spin transport, the transport path of electron spins can be modulated by employing time-varying in-plane voltages.
authors.affiliation: NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan.
authors.forename: Y
authors.initials: Y
authors.lastname: Kunihashi
authors.affiliation: NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan.
authors.forename: H
authors.initials: H
authors.lastname: Sanada
authors.affiliation: NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan.
authors.forename: H
authors.initials: H
authors.lastname: Gotoh
authors.affiliation: NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan.
authors.forename: K
authors.initials: K
authors.lastname: Onomitsu
authors.affiliation: Department of Materials Science, Tohoku University, 6-6-02 Aramaki-Aza Aoba, Aoba-ku, Sendai 980-8579, Japan.
authors.forename: M
authors.initials: M
authors.lastname: Kohda
authors.affiliation: Department of Materials Science, Tohoku University, 6-6-02 Aramaki-Aza Aoba, Aoba-ku, Sendai 980-8579, Japan.
authors.forename: J
authors.initials: J
authors.lastname: Nitta
authors.affiliation: NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan.
authors.forename: T
authors.initials: T
authors.lastname: Sogawa