title: Growth Assisted by Glancing Angle Deposition: A New Technique to Fabricate Highly Porous Anisotropic Thin Films.
abstract: We report a new methodology based on glancing angle deposition (GLAD) of an organic molecule in combination with perpendicular growth of a second inorganic material. The resulting thin films retain a very well-defined tilted columnar microstructure characteristic of GLAD with the inorganic material embedded inside the columns. We refer to this new methodology as growth assisted by glancing angle deposition or GAGLAD, since the material of interest (here, the inorganic) grows in the form of tilted columns, though it is deposited under a nonglancing configuration. As a "proof of concept", we have used silver and zinc oxide as the perpendicularly deposited material since they usually form ill-defined columnar microstructures at room temperature by GLAD. By means of our GAGLAD methodology, the typical tilted columnar microstructure can be developed for materials that otherwise do not form ordered structures under conventional GLAD. This simple methodology broadens significantly the range of materials where control of the microstructure can be achieved by tuning the geometrical deposition parameters. The two examples presented here, Ag/Alq3 and ZnO/Alq3, have been deposited by physical vapor deposition (PVD) and plasma enhanced chemical vapor deposition (PECVD), respectively: two different vacuum techniques that illustrate the generality of the proposed technique. The two type of hybrid samples present very interesting properties that demonstrate the potentiality of GAGLAD. On one hand, the Ag/Alq3 samples present highly optical anisotropic properties when they are analyzed with linearly polarized light. To our knowledge, these Ag/Alq3 samples present the highest angular selectivity reported in the visible range. On the other hand, ZnO/Alq3 samples are used to develop highly porous ZnO thin films by using Alq3 as sacrificial material. In this way, antireflective ZnO samples with very low refractive index and extinction coefficient have been obtained.
authors.affiliation: nanotech@surfaces Laboratory, ‡Joining Technologies and Corrosion Laboratory, §Electron Microscopy Center, and ∥Department of Advanced Materials and Surfaces, Empa, Swiss Federal Laboratories for Materials Science and Technology , Ueberlandstrasse 129, CH-8600 Duebendorf, Switzerland.
authors.forename: Juan Ramon
authors.initials: JR
authors.lastname: Sanchez-Valencia
authors.affiliation: nanotech@surfaces Laboratory, ‡Joining Technologies and Corrosion Laboratory, §Electron Microscopy Center, and ∥Department of Advanced Materials and Surfaces, Empa, Swiss Federal Laboratories for Materials Science and Technology , Ueberlandstrasse 129, CH-8600 Duebendorf, Switzerland.
authors.forename: Remi
authors.initials: R
authors.lastname: Longtin
authors.affiliation: nanotech@surfaces Laboratory, ‡Joining Technologies and Corrosion Laboratory, §Electron Microscopy Center, and ∥Department of Advanced Materials and Surfaces, Empa, Swiss Federal Laboratories for Materials Science and Technology , Ueberlandstrasse 129, CH-8600 Duebendorf, Switzerland.
authors.forename: Marta D
authors.initials: MD
authors.lastname: Rossell
authors.affiliation: nanotech@surfaces Laboratory, ‡Joining Technologies and Corrosion Laboratory, §Electron Microscopy Center, and ∥Department of Advanced Materials and Surfaces, Empa, Swiss Federal Laboratories for Materials Science and Technology , Ueberlandstrasse 129, CH-8600 Duebendorf, Switzerland.
authors.forename: Pierangelo
authors.initials: P
authors.lastname: Gröning
keywords: GAGLAD; GLAD; anisotropy; hybrid materials; porous thin films