title: Quantitative metrics for assessment of chemical image quality and spatial resolution.
abstract: BACKGROUND
  Currently objective/quantitative descriptions of the quality and spatial resolution of mass spectrometry derived chemical images are not standardized. Development of these standardized metrics is required to objectively describe the chemical imaging capabilities of existing and/or new mass spectrometry imaging technologies. Such metrics would allow unbiased judgment of intra-laboratory advancement and/or inter-laboratory comparison for these technologies if used together with standardized surfaces.
  
  
  METHODS
  Two image metrics, viz., "chemical image contrast" (ChemIC) based on signal-to-noise related statistical measures on chemical image pixels and "corrected resolving power factor" (cRPF) constructed from statistical analysis of mass-to-charge chronograms across features of interest in an image, were developed. These metrics, quantifying chemical image quality and spatial resolution, respectively, were used to evaluate chemical images of a model photoresist patterned surface collected using a laser ablation/liquid vortex capture mass spectrometry imaging system under different instrument operational parameters.
  
  
  RESULTS
  The calculated ChemIC and cRPF metrics determined in an unbiased fashion the relative ranking of chemical image quality obtained with the laser ablation/liquid vortex capture mass spectrometry imaging system. These rankings were used to show that both chemical image contrast and spatial resolution deteriorated with increasing surface scan speed, increased lane spacing and decreasing size of surface features.
  
  
  CONCLUSIONS
  ChemIC and cRPF, respectively, were developed and successfully applied for the objective description of chemical image quality and spatial resolution of chemical images collected from model surfaces using a laser ablation/liquid vortex capture mass spectrometry imaging system. Published in 2016. This article is a U.S. Government work and is in the public domain in the USA.
authors.affiliation: Mass Spectrometry and Laser Spectroscopy Group, Chemical Sciences Division, Oak Ridge National Laboratory, Oak Ridge, TN, 37831-6131, USA.
authors.forename: Vilmos
authors.initials: V
authors.lastname: Kertesz
authors.affiliation: Mass Spectrometry and Laser Spectroscopy Group, Chemical Sciences Division, Oak Ridge National Laboratory, Oak Ridge, TN, 37831-6131, USA.
authors.forename: John F
authors.initials: JF
authors.lastname: Cahill
authors.affiliation: Mass Spectrometry and Laser Spectroscopy Group, Chemical Sciences Division, Oak Ridge National Laboratory, Oak Ridge, TN, 37831-6131, USA.
authors.forename: Gary J
authors.initials: GJ
authors.lastname: Van Berkel