title: Self limiting atomic layer deposition of Al2O3 on perovskite surfaces: a reality?
abstract: The feasibility of self-saturated atomic layer deposition of Al2O3 on an organolead halide perovskite (MAPbI3-xClx) surface through a well known trimethylaluminium (TMA)-water (H2O) chemistry is studied. Though the sequential dosages of reactants form films on the perovskite surfaces, a self saturated growth is never observed. Self-saturation leads to the degradation of the material. Both experimental and density functional theory calculations are carried out for complete understanding of the growth mechanism of self-limiting Al2O3 on the perovskite surface.
authors.affiliation: Department of Energy Science and Engineering, Indian Institute of Technology Bombay, Mumbai-400076, India. shaibal.sarkar@iitb.ac.in.
authors.forename: Devika
authors.initials: D
authors.lastname: Choudhury
authors.affiliation: Department of Chemistry, Indian Institute of Technology Bombay, Mumbai-400076, India.
authors.forename: Gopalan
authors.initials: G
authors.lastname: Rajaraman
authors.affiliation: Department of Energy Science and Engineering, Indian Institute of Technology Bombay, Mumbai-400076, India. shaibal.sarkar@iitb.ac.in.
authors.forename: Shaibal K
authors.initials: SK
authors.lastname: Sarkar