title: Multiscale Graphene Topographies Programmed by Sequential Mechanical Deformation.
abstract: Multigenerational graphene oxide architectures can be programmed by specific sequences of mechanical deformations. Each new deformation results in a progressively larger set of features decorated by smaller preexisting patterns, indicating a structural "memory." It is shown that these multiscale architectures are superhydrophobic and display excellent functionality as electrochemical electrodes.
authors.affiliation: School of Engineering, Institute for Molecular and Nanoscale Innovation, Brown University, Providence, RI, 02912, USA.
authors.forename: Po-Yen
authors.initials: PY
authors.lastname: Chen
authors.affiliation: School of Engineering, Institute for Molecular and Nanoscale Innovation, Brown University, Providence, RI, 02912, USA.
authors.forename: Jaskiranjeet
authors.initials: J
authors.lastname: Sodhi
authors.affiliation: School of Engineering, Institute for Molecular and Nanoscale Innovation, Brown University, Providence, RI, 02912, USA.
authors.forename: Yang
authors.initials: Y
authors.lastname: Qiu
authors.affiliation: School of Engineering, Institute for Molecular and Nanoscale Innovation, Brown University, Providence, RI, 02912, USA.
authors.forename: Thomas M
authors.initials: TM
authors.lastname: Valentin
authors.affiliation: School of Engineering, Institute for Molecular and Nanoscale Innovation, Brown University, Providence, RI, 02912, USA.
authors.forename: Ruben Spitz
authors.initials: RS
authors.lastname: Steinberg
authors.affiliation: School of Engineering, Institute for Molecular and Nanoscale Innovation, Brown University, Providence, RI, 02912, USA.
authors.forename: Zhongying
authors.initials: Z
authors.lastname: Wang
authors.affiliation: School of Engineering, Institute for Molecular and Nanoscale Innovation, Brown University, Providence, RI, 02912, USA.
authors.forename: Robert H
authors.initials: RH
authors.lastname: Hurt
authors.affiliation: School of Engineering, Institute for Molecular and Nanoscale Innovation, Brown University, Providence, RI, 02912, USA.
authors.forename: Ian Y
authors.initials: IY
authors.lastname: Wong
keywords: electrochemical activity; graphene; multiscale surface architectures; sequential patterning; superhydrophobicity