title: Structural, Optical and Electrical Properties of p-CuS:Cu(+)and n-CuS:Sn(4+) Films Deposited with a Chemical Bath Deposition.
abstract: This work presents the manufacturing and potential application of the CuS films in recent literature and patents and then focus on the chemical bath depostion of p-CuS: Cu(+)and n-CuS: Sn(4+) filmsat room temperature by controlling S/Cu molar ratio in the bath solution and doping Cu(+) and Sn(4+) cations, respectively. The CuS:Cu(+)and CuS:Sn(4+) films with S/Cu molar ratio larger and less than the stoichiometric ratio showed p-type and n-type electrical conduction, respectively, and low electrical resistivity of~1.31×10(-3) Ω·cm and ~0.73-0.80×10(-3) Ω·cm, respectively. Moreover, the films had the average transmittance of ~20.1-30.1 % in 290-1100 nm. The direct allowed band gaps and indirect allowed optical band gap energies of the films were estimated to be in the ranges of ~2.58-2.63 eV and ~1.6-1.78 eV, respectively. The extinction coefficient, refractive index, dielectric constant, and optical conductivity of the films were calculated with the transmittance and reflectance spectra.
authors.affiliation: College of Material Science and Engineering, Shaanxi University of Science and Technology, (710021) China. hehy@sust.edu.cn.
authors.forename: Haiyan
authors.initials: H
authors.lastname: He
authors.forename: Jianfeng
authors.initials: J
authors.lastname: Huang
authors.forename: Jie
authors.initials: J
authors.lastname: Fei
authors.forename: Jing
authors.initials: J
authors.lastname: Lu