title: Impact of Nanosize on Supercapacitance: Study of 1D Nanorods and 2D Thin-Films of Nickel Oxide.
abstract: We synthesized unique one-dimensional (1D) nanorods and two-dimensional (2D) thin-films of NiO on indium-tin-oxide thin-films using a hot-filament metal-oxide vapor deposition technique. The 1D nanorods have an average width and length of ∼100 and ∼500 nm, respectively, and the densely packed 2D thin-films have an average thickness of ∼500 nm. The 1D nanorods perform as parallel units for charge storing. However, the 2D thin-films act as one single unit for charge storing. The 2D thin-films possess a high specific capacitance of ∼746 F/g compared to 1D nanorods (∼230 F/g) using galvanostatic charge-discharge measurements at a current density of 3 A/g. Because the 1D NiO nanorods provide more plentiful surface areas than those of the 2D thin-films, they are fully active at the first few cycles. However, the capacitance retention of the 1D nanorods decays faster than that of the 2D thin-films. Also, the 1D NiO nanorods suffer from instability due to the fast electrochemical dissolution and high nanocontact resistance. Electrochemical impedance spectroscopy verifies that the low dimensionality of the 1D NiO nanorods induces the unavoidable effects that lead them to have poor supercapacitive performances. On the other hand, the slow electrochemical dissolution and small contact resistance in the 2D NiO thin-films favor to achieve high specific capacitance and great stability.
authors.affiliation: Department of Physics, National Dong Hwa University , Hualien 97401, Taiwan.
authors.forename: Ranjit A
authors.initials: RA
authors.lastname: Patil
authors.affiliation: Department of Physics, National Dong Hwa University , Hualien 97401, Taiwan.
authors.forename: Cheng-Ping
authors.initials: CP
authors.lastname: Chang
authors.affiliation: Department of Physics, National Dong Hwa University , Hualien 97401, Taiwan.
authors.forename: Rupesh S
authors.initials: RS
authors.lastname: Devan
authors.affiliation: Institute of Physics, Academia Sinica , Taipei 11529, Taiwan.
authors.forename: Yung
authors.initials: Y
authors.lastname: Liou
authors.affiliation: Department of Physics, National Dong Hwa University , Hualien 97401, Taiwan.
authors.forename: Yuan-Ron
authors.initials: YR
authors.lastname: Ma
keywords: 1D nanorod; 2D thin-film; electrochemical impedance; nanocontact resistance; nickel oxide; pseudocapacitance