title: Multilength Scale Patterning of Functional Layers by Roll-to-Roll Ultraviolet-Light-Assisted Nanoimprint Lithography.
abstract: Top-down fabrication of nanostructures with high throughput is still a challenge. We demonstrate the fast (>10 m/min) and continuous fabrication of multilength scale structures by roll-to-roll UV-nanoimprint lithography on a 250 mm wide web. The large-area nanopatterning is enabled by a multicomponent UV-curable resist system (JRcure) with viscous, mechanical, and surface properties that are tunable over a wide range to either allow for usage as polymer stamp material or as imprint resist. The adjustable elasticity and surface chemistry of the resist system enable multistep self-replication of structured resist layers. Decisive for defect-free UV-nanoimprinting in roll-to-roll is the minimization of the surface energies of stamp and resist, and the stepwise reduction of the stiffness from one layer to the next is essential for optimizing the reproduction fidelity especially for nanoscale features. Accordingly, we demonstrate the continuous replication of 3D nanostructures and the high-throughput fabrication of multilength scale resist structures resulting in flexible polyethylenetherephtalate film rolls with superhydrophobic properties. Moreover, a water-soluble UV-imprint resist (JRlift) is introduced that enables residue-free nanoimprinting in roll-to-roll. Thereby we could demonstrate high-throughput fabrication of metallic patterns with only 200 nm line width.
authors.affiliation: JOANNEUM RESEARCH Forschungsgesellschaft mbH, Institute for Surface Technologies and Photonics , Franz-Pichlerstraße, 8160 Weiz, Austria.|Vienna University of Technology , Institute of Applied Synthetic Chemistry, Getreidemarkt 9, 1060 Wien, Austria.
authors.forename: Markus
authors.initials: M
authors.lastname: Leitgeb
authors.affiliation: JOANNEUM RESEARCH Forschungsgesellschaft mbH, Institute for Surface Technologies and Photonics , Franz-Pichlerstraße, 8160 Weiz, Austria.
authors.forename: Dieter
authors.initials: D
authors.lastname: Nees
authors.affiliation: JOANNEUM RESEARCH Forschungsgesellschaft mbH, Institute for Surface Technologies and Photonics , Franz-Pichlerstraße, 8160 Weiz, Austria.
authors.forename: Stephan
authors.initials: S
authors.lastname: Ruttloff
authors.affiliation: JOANNEUM RESEARCH Forschungsgesellschaft mbH, Institute for Surface Technologies and Photonics , Franz-Pichlerstraße, 8160 Weiz, Austria.
authors.forename: Ursula
authors.initials: U
authors.lastname: Palfinger
authors.affiliation: JOANNEUM RESEARCH Forschungsgesellschaft mbH, Institute for Surface Technologies and Photonics , Franz-Pichlerstraße, 8160 Weiz, Austria.
authors.forename: Johannes
authors.initials: J
authors.lastname: Götz
authors.affiliation: Vienna University of Technology , Institute of Applied Synthetic Chemistry, Getreidemarkt 9, 1060 Wien, Austria.
authors.forename: Robert
authors.initials: R
authors.lastname: Liska
authors.affiliation: JOANNEUM RESEARCH Forschungsgesellschaft mbH, Institute for Surface Technologies and Photonics , Franz-Pichlerstraße, 8160 Weiz, Austria.
authors.forename: Maria R
authors.initials: MR
authors.lastname: Belegratis
authors.affiliation: JOANNEUM RESEARCH Forschungsgesellschaft mbH, Institute for Surface Technologies and Photonics , Franz-Pichlerstraße, 8160 Weiz, Austria.
authors.forename: Barbara
authors.initials: B
authors.lastname: Stadlober
keywords: UV-curable resist; UV-nanoimprint lithography; biomimicry; high throughput; metal pattern; nanoimprinting