title: Advances in Nanoimprint Lithography.
abstract: Nanoimprint lithography (NIL), a molding process, can replicate features <10 nm over large areas with long-range order. We describe the early development and fundamental principles underlying the two most commonly used types of NIL, thermal and UV, and contrast them with conventional photolithography methods used in the semiconductor industry. We then describe current advances toward full commercial industrialization of UV-curable NIL (UV-NIL) technology for integrated circuit production. We conclude with brief overviews of some emerging areas of research, from photonics to biotechnology, in which the ability of NIL to fabricate structures of arbitrary geometry is providing new paths for development. As with previous innovations, the increasing availability of tools and techniques from the semiconductor industry is poised to provide a path to bring these innovations from the lab to everyday life.
authors.affiliation: Canon Nanotechnologies, Inc., Austin, Texas 78758; email: vtruskett@cnt.canon.com.
authors.forename: Matthew C
authors.initials: MC
authors.lastname: Traub
authors.affiliation: Canon Nanotechnologies, Inc., Austin, Texas 78758; email: vtruskett@cnt.canon.com.
authors.forename: Whitney
authors.initials: W
authors.lastname: Longsine
authors.affiliation: Canon Nanotechnologies, Inc., Austin, Texas 78758; email: vtruskett@cnt.canon.com.
authors.forename: Van N
authors.initials: VN
authors.lastname: Truskett
mesh_terms: D054802:Molecular Imprinting; D049329:Nanostructures / Q000737:chemistry; D036103:Nanotechnology; D055095:Optics and Photonics; D012666:Semiconductors; D013499:Surface Properties; D013696:Temperature; D023822:Tissue Engineering; D014466:Ultraviolet Rays
keywords: J-FIL; Jet and Flash Imprint Lithography; UV-NIL; UV-curable nanoimprint lithography; nanofabrication; thermal NIL