title: Tailored CVD graphene coating as a transparent and flexible gas barrier.
abstract: The chemical vapor deposition (CVD) method to obtain tailored graphene as a transparent and flexible gas barrier has been developed. By separating nucleation step from growth, we could reduce early graphene nucleation density and thus induce better stitching between domain boundaries in the second growth step. Furthermore, two step growth in conjunction with electrochemical polishing of Cu foils achieved large graphene domains and improved graphene quality with minimized defects. The performance of resulting graphene as a gas barrier was superior to the graphene obtained by one-step growth on polished or unpolished Cu foils. The CVD graphene reported here could open up the possibility for exploring graphene-based gas barrier due to the minimized density of defect area.
authors.affiliation: Soft Innovative Materials Research Center, Korea Institute of Science and Technology, Jeonbuk 565-905, Republic of Korea.
authors.forename: Tae Hoon
authors.initials: TH
authors.lastname: Seo
authors.affiliation: Soft Innovative Materials Research Center, Korea Institute of Science and Technology, Jeonbuk 565-905, Republic of Korea.|Department of Carbon materials, Chonsun University, Gwangju 501-759, Republic of Korea.
authors.forename: Seula
authors.initials: S
authors.lastname: Lee
authors.affiliation: Soft Innovative Materials Research Center, Korea Institute of Science and Technology, Jeonbuk 565-905, Republic of Korea.
authors.forename: Hyunjin
authors.initials: H
authors.lastname: Cho
authors.affiliation: School of Semiconductor and Chemical Engineering, Semiconductor Physics Research Center, Chonbuk National University, Jeonju 561-756, Republic of Korea.
authors.forename: S
authors.initials: S
authors.lastname: Chandramohan
authors.affiliation: School of Semiconductor and Chemical Engineering, Semiconductor Physics Research Center, Chonbuk National University, Jeonju 561-756, Republic of Korea.
authors.forename: Eun-Kyung
authors.initials: EK
authors.lastname: Suh
authors.affiliation: Department of Chemical Engineering, Dong-A University, Nakdong-Daero 550, Saha-gu, Busan 604-714, Republic of Korea.
authors.forename: Heon Sang
authors.initials: HS
authors.lastname: Lee
authors.affiliation: Soft Innovative Materials Research Center, Korea Institute of Science and Technology, Jeonbuk 565-905, Republic of Korea.
authors.forename: Su Kang
authors.initials: SK
authors.lastname: Bae
authors.affiliation: Soft Innovative Materials Research Center, Korea Institute of Science and Technology, Jeonbuk 565-905, Republic of Korea.
authors.forename: Soo Min
authors.initials: SM
authors.lastname: Kim
authors.affiliation: Photoelectronic Hybrid Research Center, Korea Institute of Science and Technology, Seoul 136-791, Republic of Korea.
authors.forename: Min
authors.initials: M
authors.lastname: Park
authors.affiliation: Department of Carbon materials, Chonsun University, Gwangju 501-759, Republic of Korea.
authors.forename: Jae Kwan
authors.initials: JK
authors.lastname: Lee
authors.affiliation: Soft Innovative Materials Research Center, Korea Institute of Science and Technology, Jeonbuk 565-905, Republic of Korea.
authors.forename: Myung Jong
authors.initials: MJ
authors.lastname: Kim