title: Plasma-on-chip device for stable irradiation of cells cultured in media with a low-temperature atmospheric pressure plasma.
abstract: We have developed a micro electromechanical systems (MEMS) device which enables plasma treatment for cells cultured in media. The device, referred to as the plasma-on-chip, comprises microwells and microplasma sources fabricated together in a single chip. The microwells have through-holes between the microwells and microplasma sources. Each microplasma source is located on the backside of each microwells. The reactive components generated by the microplasma sources pass through the through-holes and reach cells cultured in the microwells. In this study, a plasma-on-chip device was modified for a stable plasma treatment. The use of a dielectric barrier discharge (DBD) technique allowed a stable plasma treatment up to 3 min. The plasma-on-chip with the original electrode configuration typically had the maximum stable operation time of around 1 min. Spectral analysis of the plasma identified reactive species such as O and OH radicals that can affect the activity of cells. Plasma treatment was successfully performed on yeast (Saccharomyces cerevisiae) and green algae (Chlorella) cells. While no apparent change was observed with yeast, the treatment degraded the activity of the Chlorella cells and decreased their fluorescence. The device has the potential to help understand interactions between plasma and cells.
authors.affiliation: Department of Advanced Science and Technology, Toyota Technological Institute, Nagoya 468-8511, Japan.
authors.forename: Tomohiro
authors.initials: T
authors.lastname: Okada
authors.affiliation: Department of Advanced Science and Technology, Toyota Technological Institute, Nagoya 468-8511, Japan.
authors.forename: Chun-Yao
authors.initials: CY
authors.lastname: Chang
authors.affiliation: Graduate School of Materials Science, Nara Institute of Science and Technology, Ikoma, Nara 630-0192, Japan.
authors.forename: Mime
authors.initials: M
authors.lastname: Kobayashi
authors.affiliation: terraplasma GmbH, Lichtenbergstraße 8, 85748 Garching, Germany.
authors.forename: Tetsuji
authors.initials: T
authors.lastname: Shimizu
authors.affiliation: Department of Advanced Science and Technology, Toyota Technological Institute, Nagoya 468-8511, Japan.
authors.forename: Minoru
authors.initials: M
authors.lastname: Sasaki
authors.affiliation: Department of Advanced Science and Technology, Toyota Technological Institute, Nagoya 468-8511, Japan. Electronic address: kumagai.shinya@toyota-ti.ac.jp.
authors.forename: Shinya
authors.initials: S
authors.lastname: Kumagai
mesh_terms: D001274:Atmospheric Pressure; D002708:Chlorella / Q000166:cytology*; D002857:Chromium / Q000737:chemistry; D003080:Cold Temperature; D003470:Culture Media; D004867:Equipment Design; D006046:Gold / Q000737:chemistry; D017665:Hydroxyl Radical / Q000737:chemistry; D055617:Micro-Electrical-Mechanical Systems; D008839:Microelectrodes; D010100:Oxygen / Q000737:chemistry; D058626:Plasma Gases / Q000737:chemistry*; D012441:Saccharomyces cerevisiae / Q000166:cytology*; D012825:Silicon / Q000737:chemistry
chemical_list: D003470:Culture Media; D058626:Plasma Gases; D002857:Chromium; D017665:Hydroxyl Radical; D006046:Gold; D010100:Oxygen; D012825:Silicon
keywords: Low-temperature atmospheric pressure plasma; Micro/nano electromechanical systems; Plasma medicine; Plasma-on-chip; Single cell analysis