title: Continuous-Gradient Plasmonic Nanostructures Fabricated by Evaporation on a Partially Exposed Rotating Substrate.
abstract: A continuous-gradient approach of material evaporation is employed to fabricate nanostructures with varying geometric parameters, such as thickness, lateral positioning, and orientation on a single substrate. The method developed for mask lithography allows continuous tuning of the physical properties of a sample. The technique is highly valuable in simplifying the overall optimization process for constructing metasurfaces.
authors.affiliation: Department of Physics, Chalmers University of Technology, S41296, Gothenburg, Sweden.
authors.forename: Robin
authors.initials: R
authors.lastname: Ogier
authors.affiliation: Department of Physics, Chalmers University of Technology, S41296, Gothenburg, Sweden.
authors.forename: Lei
authors.initials: L
authors.lastname: Shao
authors.affiliation: Department of Physics, Chalmers University of Technology, S41296, Gothenburg, Sweden.
authors.forename: Mikael
authors.initials: M
authors.lastname: Svedendahl
authors.affiliation: Department of Physics, Chalmers University of Technology, S41296, Gothenburg, Sweden.
authors.forename: Mikael
authors.initials: M
authors.lastname: Käll
keywords: continuous parameter tuning; electron-beam evaporation; gradient metasurfaces; hole-mask colloidal lithography; plasmonic nanostructures