Integration of tunable two-dimensional nanostructures on a chip by an improved nanosphere lithography method.
By uniform infiltration of a different material into monolayered polystyrene colloidal crystals and by flexibly combining the two materials as etching masks, we demonstrate an improved nanosphere lithography method that possesses the ability to produce a diverse range of tunable nano-patterns in a small area with good reproducibility. The factors that affect the infiltration height and uniformity are characterized and discussed. Annular gap arrays, close-packed ring arrays, and bowl arrays are demonstrated by this method. The geometry size of these nano-patterns can be tuned over the range 10 nm to ∼500 nm with steps of ∼5 nm during the fabrication progress. Formation mechanisms of the close-packed ring arrays are experimentally investigated. Because all the fabrication processes involved in this method are adaptable to sophisticated integrated circuit fabrication techniques, most of the nano-patterns produced by this method could be integrated on thin films, which is desirable for optics integration and array sensing.
Jiangsu Key Laboratory of Meteorological Observation and Information Processing, School of Electronic and Information Engineering, Nanjing University of Information Science and Technology, Nanjing 210044, People's Republic of China. Jiangsu Key Laboratory on Opto-Electronic Technology, School of Physical Science and Technology, Nanjing Normal University, Nanjing 210023, People's Republic of China.
Haibin
H
Ni
Ming
M
Wang
Hui
H
Hao
Jing
J
Zhou