Fine-Tunable Absorption of Uniformly Aligned Polyurea Thin Films for Optical Filters Using Sequentially Self-Limited Molecular Layer Deposition.
Development of methods enabling the preparation of uniformly aligned polymer thin films at the molecular level is a prerequisite for realizing their optoelectronic characteristics as innovative materials; however, these methods often involve a compromise between scalability and accuracy. In this study, we have grown uniformly aligned polyurea thin films on a SiO2 substrate using molecular layer deposition (MLD) based on sequential and self-limiting surface reactions. By integrating plane-polarized Fourier-transform infrared, Raman spectroscopic tools, and density functional theory calculations, we demonstrated the uniform alignment of polyurea MLD films. Furthermore, the selective-wavelength absorption characteristics of thickness-controlled MLD films were investigated by integrating optical measurements and finite-difference time-domain simulations of reflection spectra, resulting from their thickness-dependent fine resonance with photons, which could be used as color filters in optoelectronics.
Department of Chemistry, Sookmyung Women's University , Seoul 140-742, Korea.
Yi-Seul
YS
Park
Department of Chemistry, Sookmyung Women's University , Seoul 140-742, Korea.
Sung-Eun
SE
Choi
Department of Chemistry, Sookmyung Women's University , Seoul 140-742, Korea.
Hyein
H
Kim
Department of Chemistry, Sookmyung Women's University , Seoul 140-742, Korea.
Jin Seok
JS
Lee
alignment; fine resonance; molecular layer deposition; polyurea; self-limiting surface reaction