DNA Photocleavage by Non-innocent Ligand-Based Ru(II) Complexes.
In this work, we demonstrate for the first time that [Ru(bpy)2(R-OQN)](+) complexes (bpy = 2,2'-bipyridine, R-OQN = 5-chloro-8-oxyquinolate or 5-bromo-8-oxyquinolate) are able to generate hydroxyl radicals and cleave DNA effectively upon visible light irradiation. The potent electron-donating ability of the R-OQN-based non-innocent ligands gives the complexes a high reducing capability, favoring the generation of superoxide anion radicals from which hydroxyl radicals may be generated. More interestingly, halogen substitution plays an important role. When the 5-Cl- or 5-Br-8-oxyquinolate ligand is replaced by 8-oxyquinolate or 5-CH3-8-oxyquinolate, the corresponding complexes lose their hydroxyl radical-generation and DNA photocleavage abilities. These findings open new applications for the non-innocent ligand-based Ru(II) complexes in the fields of biology and medicine, such as in photodynamic therapy (PDT).
Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences , Beijing 100190, P.R. China.|Graduate School of the Chinese Academy of Sciences , Beijing 100049, P.R. China.
Yangyang
Y
Zhang
Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences , Beijing 100190, P.R. China.
Qianxiong
Q
Zhou
Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences , Beijing 100190, P.R. China.|Graduate School of the Chinese Academy of Sciences , Beijing 100049, P.R. China.
Yue
Y
Zheng
Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences , Beijing 100190, P.R. China.|Graduate School of the Chinese Academy of Sciences , Beijing 100049, P.R. China.
Ke
K
Li
Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences , Beijing 100190, P.R. China.
Guoyu
G
Jiang
Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences , Beijing 100190, P.R. China.
Yuanjun
Y
Hou
Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences , Beijing 100190, P.R. China.
Baowen
B
Zhang
Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences , Beijing 100190, P.R. China.
Xuesong
X
Wang
D000097:Acetonitriles / Q000737:chemistry; D056831:Coordination Complexes / Q000737:chemistry*; D053837:DNA Cleavage / Q000528:radiation effects*; D004278:DNA, Superhelical / Q000737:chemistry*; D004121:Dimethyl Sulfoxide / Q000737:chemistry; D017665:Hydroxyl Radical / Q000737:chemistry; D008024:Ligands; D008027:Light; D017382:Reactive Oxygen Species / Q000737:chemistry; D012428:Ruthenium / Q000737:chemistry*
D000097:Acetonitriles; D056831:Coordination Complexes; D004278:DNA, Superhelical; D008024:Ligands; D017382:Reactive Oxygen Species; D017665:Hydroxyl Radical; D012428:Ruthenium; D004121:Dimethyl Sulfoxide; C032159:acetonitrile