Optimized 2D array of thin silicon pillars for efficient antireflective coatings in the visible spectrum.
Light reflection occuring at the surface of silicon wafers is drastically diminished by etching square pillars of height 110 nm and width 140 nm separated by a 100 nm gap distance in a square lattice. The design of the nanostructure is optimized to widen the spectral tolerance of the antireflective coatings over the visible spectrum for both fundamental polarizations. Angle and polarized resolved optical measurements report a light reflection remaining under 5% when averaged in the visible spectrum for both polarizations in a wide angular range. Light reflection remains almost insensitive to the light polarization even in oblique incidence.
Aix-Marseille Université, CNRS, Centrale Marseille, Institut Fresnel, UMR7249, 13013 Marseille, France.
Julien
J
Proust
Aix-Marseille Université, CNRS, Centrale Marseille, Institut Fresnel, UMR7249, 13013 Marseille, France.
Anne-Laure
AL
Fehrembach
Aix-Marseille Université, CNRS, CINAM, UMR 7325, 13288 Marseille, France.
Frédéric
F
Bedu
Aix-Marseille Université, CNRS, CINAM, UMR 7325, 13288 Marseille, France.
Igor
I
Ozerov
Aix-Marseille Université, CNRS, Centrale Marseille, Institut Fresnel, UMR7249, 13013 Marseille, France.
Nicolas
N
Bonod