title: In situ temperature measurements of reaction spaces under microwave irradiation using photoluminescent probes.
abstract: We demonstrate two novel methods for the measurement of the temperatures of reaction spaces locally heated by microwaves, which have been applied here to two example systems, i.e., BaTiO3 particles covered with a SiO2 shell (BaTiO3-SiO2) and layered tungstate particles. Photoluminescent (PL) probes showing the temperature-sensitivity in their PL lifetimes are located in the nanospaces of the above systems. In the case of BaTiO3-SiO2 core-shell particles, rhodamine B is loaded into the mesopores of the SiO2 shell covering the BaTiO3 core, which generates the heat through the dielectric loss of microwaves. The inner nanospace temperature of the SiO2 shell is determined to be 28 °C higher than the bulk temperature under microwave irradiation at 24 W. On the other hand, Eu(3+) is immobilized in the interlayer space of layered tungstate as the PL probe, showing that the nanospace temperature of the interlayer is only 4 °C higher than the bulk temperature. This method for temperature-measurement is powerful for controlling microwave heating and elucidates the ambiguous mechanisms of microwave special effects often observed in chemical reactions, contributing greatly to the practical application of microwaves in chemistry and materials sciences.
authors.affiliation: Department of Applied Chemistry, Tokyo Institute of Technology, 2-12 Ookayama, Meguro, Tokyo 152-8552, Japan. tsubaki.s.aa@m.titech.ac.jp yuji-w@apc.titech.ac.jp.
authors.forename: Taishi
authors.initials: T
authors.lastname: Ano
authors.affiliation: Department of Applied Chemistry, Tokyo Institute of Technology, 2-12 Ookayama, Meguro, Tokyo 152-8552, Japan. tsubaki.s.aa@m.titech.ac.jp yuji-w@apc.titech.ac.jp.
authors.forename: Fuminao
authors.initials: F
authors.lastname: Kishimoto
authors.affiliation: Department of Applied Chemistry, Tokyo Institute of Technology, 2-12 Ookayama, Meguro, Tokyo 152-8552, Japan. tsubaki.s.aa@m.titech.ac.jp yuji-w@apc.titech.ac.jp.
authors.forename: Ryo
authors.initials: R
authors.lastname: Sasaki
authors.affiliation: Department of Applied Chemistry, Tokyo Institute of Technology, 2-12 Ookayama, Meguro, Tokyo 152-8552, Japan. tsubaki.s.aa@m.titech.ac.jp yuji-w@apc.titech.ac.jp.
authors.forename: Shuntaro
authors.initials: S
authors.lastname: Tsubaki
authors.affiliation: Department of Applied Chemistry, Tokyo Institute of Technology, 2-12 Ookayama, Meguro, Tokyo 152-8552, Japan. tsubaki.s.aa@m.titech.ac.jp yuji-w@apc.titech.ac.jp.
authors.forename: Masato M
authors.initials: MM
authors.lastname: Maitani
authors.affiliation: Department of Applied Chemistry, Tokyo Institute of Technology, 2-12 Ookayama, Meguro, Tokyo 152-8552, Japan. tsubaki.s.aa@m.titech.ac.jp yuji-w@apc.titech.ac.jp.
authors.forename: Eiichi
authors.initials: E
authors.lastname: Suzuki
authors.affiliation: Department of Applied Chemistry, Tokyo Institute of Technology, 2-12 Ookayama, Meguro, Tokyo 152-8552, Japan. tsubaki.s.aa@m.titech.ac.jp yuji-w@apc.titech.ac.jp.
authors.forename: Yuji
authors.initials: Y
authors.lastname: Wada