title: Design of a 300-kV gas environmental transmission electron microscope equipped with a cold field emission gun.
abstract: A new in situ environmental transmission electron microscope (ETEM) was developed based on a 300 kV TEM with a cold field emission gun (CFEG). Particular caution was taken in the ETEM design to assure uncompromised imaging and analytical performance of the TEM. Because of the improved pumping system between the gun and column, the vacuum of CFEG was largely improved and the probe current was sufficiently stabilized to operate without tip flashing for 2-3 h or longer. A high brightness of 2.5 × 10(9) A/cm(2) sr was measured at 300 kV, verifying the high quality of the CFEG electron beam. A specially designed gas injection-heating holder was used in the in situ TEM study at elevated temperatures with or without gas around the TEM specimen. Using this holder in a 10 Pa gas atmosphere and specimen temperatures up to 1000°C, high-resolution ETEM performance and analysis were achieved.
authors.affiliation: Hitachi High Technologies Corporation, 882 Ichige, Hitachinaka, Ibaraki 312-8504, Japan shigeto.isakozawa.rj@hitachi-hightech.com.
authors.forename: Shigeto
authors.initials: S
authors.lastname: Isakozawa
authors.affiliation: Hitachi High Technologies Corporation, 882 Ichige, Hitachinaka, Ibaraki 312-8504, Japan.
authors.forename: Isao
authors.initials: I
authors.lastname: Nagaoki
authors.affiliation: Hitachi High Technologies Corporation, 882 Ichige, Hitachinaka, Ibaraki 312-8504, Japan.
authors.forename: Akira
authors.initials: A
authors.lastname: Watabe
authors.affiliation: Hitachi High Technologies Corporation, 882 Ichige, Hitachinaka, Ibaraki 312-8504, Japan.
authors.forename: Yasuhira
authors.initials: Y
authors.lastname: Nagakubo
authors.affiliation: Hitachi High Technologies Corporation, 882 Ichige, Hitachinaka, Ibaraki 312-8504, Japan.
authors.forename: Nobuhiro
authors.initials: N
authors.lastname: Saito
authors.affiliation: Hitachi High Technologies Corporation, 882 Ichige, Hitachinaka, Ibaraki 312-8504, Japan.
authors.forename: Hiroaki
authors.initials: H
authors.lastname: Matsumoto
authors.affiliation: Hitachi High Technologies America, 5960 Inglewood Drive, Pleasanton, CA 94588, USA.
authors.forename: Xiao Feng
authors.initials: XF
authors.lastname: Zhang
authors.affiliation: Hitachi High Technologies Corporation, 882 Ichige, Hitachinaka, Ibaraki 312-8504, Japan.
authors.forename: Yoshifumi
authors.initials: Y
authors.lastname: Taniguchi
authors.affiliation: Kougakuin University, 1-24-2 Nishishinjuku, Shinjuku, Tokyo 163-8677, Japan.
authors.forename: Norio
authors.initials: N
authors.lastname: Baba
keywords: 300 kV TEM; SEM/STEM images; brightness; cold field emission gun; environmental TEM; gas injection-heating holder