title: Direct Patterning of Organic Functional Polymers through Conventional Photolithography and Noninvasive Cross-Link Agents.
abstract: A new technique for direct patterning of functional organic polymers using commercial photolithography setups with a minimal loss of the materials' performances is reported. This result is achieved through novel cross-link agents made by boron- and fluorine-containing heterocycles that can react between themselves upon UV- and white-light exposure.
authors.affiliation: ISIS & icFRC, University of Strasbourg & CNRS, 8 Allée Gaspard Monge, 67000, Strasbourg, France.
authors.forename: Marco A
authors.initials: MA
authors.lastname: Squillaci
authors.affiliation: School of Chemistry and Chemical Engineering, Shanghai Jiao Tong University, Shanghai, 200240, P. R. China.
authors.forename: Feng
authors.initials: F
authors.lastname: Qiu
authors.affiliation: ISIS & icFRC, University of Strasbourg & CNRS, 8 Allée Gaspard Monge, 67000, Strasbourg, France.
authors.forename: Alessandro
authors.initials: A
authors.lastname: Aliprandi
authors.affiliation: School of Chemistry and Chemical Engineering, Shanghai Jiao Tong University, Shanghai, 200240, P. R. China.
authors.forename: Fan
authors.initials: F
authors.lastname: Zhang
authors.affiliation: School of Chemistry and Chemical Engineering, Shanghai Jiao Tong University, Shanghai, 200240, P. R. China.|Center for Advancing Electronics Dresden (CFAED) and Department of Chemistry and Food Chemistry, Technische Universität Dresden, Mommsenstraße 4, 01062, Dresden, Germany.
authors.forename: Xinliang
authors.initials: X
authors.lastname: Feng
authors.affiliation: ISIS & icFRC, University of Strasbourg & CNRS, 8 Allée Gaspard Monge, 67000, Strasbourg, France.
authors.forename: Paolo
authors.initials: P
authors.lastname: Samorì
keywords: boron-cored chromophores; fluorous materials; organic electronics; patterning; photoresists