title: Parasitic analysis and π-type Butterworth-Van Dyke model for complementary-metal-oxide-semiconductor Lamb wave resonator with accurate two-port Y-parameter characterizations.
abstract: The parasitic effects from electromechanical resonance, coupling, and substrate losses were collected to derive a new two-port equivalent-circuit model for Lamb wave resonators, especially for those fabricated on silicon technology. The proposed model is a hybrid π-type Butterworth-Van Dyke (PiBVD) model that accounts for the above mentioned parasitic effects which are commonly observed in Lamb-wave resonators. It is a combination of interdigital capacitor of both plate capacitance and fringe capacitance, interdigital resistance, Ohmic losses in substrate, and the acoustic motional behavior of typical Modified Butterworth-Van Dyke (MBVD) model. In the case studies presented in this paper using two-port Y-parameters, the PiBVD model fitted significantly better than the typical MBVD model, strengthening the capability on characterizing both magnitude and phase of either Y11 or Y21. The accurate modelling on two-port Y-parameters makes the PiBVD model beneficial in the characterization of Lamb-wave resonators, providing accurate simulation to Lamb-wave resonators and oscillators.
authors.affiliation: School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore.
authors.forename: Yong
authors.initials: Y
authors.lastname: Wang
authors.affiliation: School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore.
authors.forename: Wang Ling
authors.initials: WL
authors.lastname: Goh
authors.affiliation: Institute of Microelectronics, Agency for Science, Technology and Research (A*STAR), Singapore.
authors.forename: Kevin T-C
authors.initials: KT
authors.lastname: Chai
authors.affiliation: Key Laboratory for Optoelectronic Technology and Systems, Defense Key Disciplines Lab of Novel Micro-Nano Devices and System Technology, International R&D Center of Micro-Nano Systems and New Materials Technology, Chongqing University, Chongqing, China.
authors.forename: Xiaojing
authors.initials: X
authors.lastname: Mu
authors.affiliation: School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore.
authors.forename: Yan
authors.initials: Y
authors.lastname: Hong
authors.affiliation: Excelitas Technologies, Singapore.
authors.forename: Piotr
authors.initials: P
authors.lastname: Kropelnicki
authors.affiliation: School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, South Korea.
authors.forename: Minkyu
authors.initials: M
authors.lastname: Je