title: Polarized hard X-ray photoemission system with micro-positioning technique for probing ground-state symmetry of strongly correlated materials.
abstract: An angle-resolved linearly polarized hard X-ray photoemission spectroscopy (HAXPES) system has been developed to study the ground-state symmetry of strongly correlated materials. The linear polarization of the incoming X-ray beam is switched by a transmission-type phase retarder composed of two diamond (100) crystals. The best value of the degree of linear polarization was found to be -0.96, containing a vertical polarization component of 98%. A newly developed low-temperature two-axis manipulator enables easy polar and azimuthal rotations to select the detection direction of photoelectrons. The lowest temperature achieved was 9 K, offering the chance to access the ground state even for strongly correlated electron systems in cubic symmetry. A co-axial sample monitoring system with long-working-distance microscope enables the same region on the sample surface to be measured before and after rotation. Combining this sample monitoring system with a micro-focused X-ray beam by means of an ellipsoidal Kirkpatrick-Baez mirror (25 µm × 25 µm FWHM), polarized valence-band HAXPES has been performed on NiO for voltage application as resistive random access memory to demonstrate the micro-positioning technique and polarization switching.
authors.affiliation: Division of Materials Physics, Graduate School of Engineering Science, Osaka University, Toyonaka, Osaka 560-8531, Japan.
authors.forename: Hidenori
authors.initials: H
authors.lastname: Fujiwara
authors.affiliation: Division of Materials Physics, Graduate School of Engineering Science, Osaka University, Toyonaka, Osaka 560-8531, Japan.
authors.forename: Sho
authors.initials: S
authors.lastname: Naimen
authors.affiliation: SPring-8/RIKEN, Sayo, Hyogo 679-5148, Japan.
authors.forename: Atsushi
authors.initials: A
authors.lastname: Higashiya
authors.affiliation: Division of Materials Physics, Graduate School of Engineering Science, Osaka University, Toyonaka, Osaka 560-8531, Japan.
authors.forename: Yuina
authors.initials: Y
authors.lastname: Kanai
authors.affiliation: Division of Materials Physics, Graduate School of Engineering Science, Osaka University, Toyonaka, Osaka 560-8531, Japan.
authors.forename: Hiroshi
authors.initials: H
authors.lastname: Yomosa
authors.affiliation: Division of Materials Physics, Graduate School of Engineering Science, Osaka University, Toyonaka, Osaka 560-8531, Japan.
authors.forename: Kohei
authors.initials: K
authors.lastname: Yamagami
authors.affiliation: Division of Materials Physics, Graduate School of Engineering Science, Osaka University, Toyonaka, Osaka 560-8531, Japan.
authors.forename: Takayuki
authors.initials: T
authors.lastname: Kiss
authors.affiliation: SPring-8/RIKEN, Sayo, Hyogo 679-5148, Japan.
authors.forename: Toshiharu
authors.initials: T
authors.lastname: Kadono
authors.affiliation: SPring-8/RIKEN, Sayo, Hyogo 679-5148, Japan.
authors.forename: Shin
authors.initials: S
authors.lastname: Imada
authors.affiliation: SPring-8/RIKEN, Sayo, Hyogo 679-5148, Japan.
authors.forename: Atsushi
authors.initials: A
authors.lastname: Yamasaki
authors.affiliation: Department of Physics, College of Science and Technology, Nihon University, Chiyoda, Tokyo 101-0062, Japan.
authors.forename: Kouichi
authors.initials: K
authors.lastname: Takase
authors.affiliation: Graduate School of Science and Technology, Kansai University, Suita, Osaka 564-8680, Japan.
authors.forename: Shintaro
authors.initials: S
authors.lastname: Otsuka
authors.affiliation: Graduate School of Science and Technology, Kansai University, Suita, Osaka 564-8680, Japan.
authors.forename: Tomohiro
authors.initials: T
authors.lastname: Shimizu
authors.affiliation: Graduate School of Science and Technology, Kansai University, Suita, Osaka 564-8680, Japan.
authors.forename: Shoso
authors.initials: S
authors.lastname: Shingubara
authors.affiliation: SPring-8/RIKEN, Sayo, Hyogo 679-5148, Japan.
authors.forename: Shigemasa
authors.initials: S
authors.lastname: Suga
authors.affiliation: SPring-8/RIKEN, Sayo, Hyogo 679-5148, Japan.
authors.forename: Makina
authors.initials: M
authors.lastname: Yabashi
authors.affiliation: SPring-8/RIKEN, Sayo, Hyogo 679-5148, Japan.
authors.forename: Kenji
authors.initials: K
authors.lastname: Tamasaku
authors.affiliation: SPring-8/RIKEN, Sayo, Hyogo 679-5148, Japan.
authors.forename: Tetsuya
authors.initials: T
authors.lastname: Ishikawa
authors.affiliation: Division of Materials Physics, Graduate School of Engineering Science, Osaka University, Toyonaka, Osaka 560-8531, Japan.
authors.forename: Akira
authors.initials: A
authors.lastname: Sekiyama
keywords: hard X-ray photoemission; linear dichroism; low-temperature double-axis manipulator; micro-focused X-rays; phase retarder; sample monitoring system; strongly correlated electron systems