title: Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image.
abstract: A wavefront aberration measurement method for a hyper-NA lithographic projection lens by use of an aerial image based on principal component analysis is proposed. Aerial images of the hyper-NA lithographic projection lens are expressed accurately by using polarized light and a vector imaging model, as well as by considering the polarization properties. As a result, the wavefront aberrations of the hyper-NA lithographic projection lens are measured accurately. The lithographic simulator PROLITH is used to validate the accuracies of the wavefront aberration measurement and analyze the impact of the polarization rotation of illumination on the accuracy of the wavefront aberration measurement, as well as the degree of polarized light and the sample interval of aerial images. The result shows that the proposed method can retrieve 33 terms of Zernike coefficients (Z5-Z37) with a maximum error of less than 0.00085λ.
authors.forename: Boer
authors.initials: B
authors.lastname: Zhu
authors.forename: Xiangzhao
authors.initials: X
authors.lastname: Wang
authors.forename: Sikun
authors.initials: S
authors.lastname: Li
authors.forename: Guanyong
authors.initials: G
authors.lastname: Yan
authors.forename: Lina
authors.initials: L
authors.lastname: Shen
authors.forename: Lifeng
authors.initials: L
authors.lastname: Duan