title: Tunnel electroresistance through organic ferroelectrics.
abstract: Organic electronics is emerging for large-area applications such as photovoltaic cells, rollable displays or electronic paper. Its future development and integration will require a simple, low-power organic memory, that can be written, erased and readout electrically. Here we demonstrate a non-volatile memory in which the ferroelectric polarisation state of an organic tunnel barrier encodes the stored information and sets the readout tunnel current. We use high-sensitivity piezoresponse force microscopy to show that films as thin as one or two layers of ferroelectric poly(vinylidene fluoride) remain switchable with low voltages. Submicron junctions based on these films display tunnel electroresistance reaching 1,000% at room temperature that is driven by ferroelectric switching and explained by electrostatic effects in a direct tunnelling regime. Our findings provide a path to develop low-cost, large-scale arrays of organic ferroelectric tunnel junctions on silicon or flexible substrates.
authors.affiliation: National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China.|University of Chinese Academy of Sciences, Beijing 100049, China.|Laboratoire Structures, Propriétés et Modélisation des Solides, CentraleSupélec, CNRS-UMR8580, Université Paris-Saclay, Châtenay-Malabry 92295, France.
authors.forename: B B
authors.initials: BB
authors.lastname: Tian
authors.affiliation: National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China.
authors.forename: J L
authors.initials: JL
authors.lastname: Wang
authors.affiliation: Unité Mixte de Physique, CNRS, Thales, Univ. Paris-Sud, Université Paris-Saclay, Palaiseau 91767, France.
authors.forename: S
authors.initials: S
authors.lastname: Fusil
authors.affiliation: Laboratoire Structures, Propriétés et Modélisation des Solides, CentraleSupélec, CNRS-UMR8580, Université Paris-Saclay, Châtenay-Malabry 92295, France.
authors.forename: Y
authors.initials: Y
authors.lastname: Liu
authors.affiliation: National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China.|University of Chinese Academy of Sciences, Beijing 100049, China.
authors.forename: X L
authors.initials: XL
authors.lastname: Zhao
authors.affiliation: National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China.
authors.forename: S
authors.initials: S
authors.lastname: Sun
authors.affiliation: National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China.
authors.forename: H
authors.initials: H
authors.lastname: Shen
authors.affiliation: National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China.
authors.forename: T
authors.initials: T
authors.lastname: Lin
authors.affiliation: National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China.
authors.forename: J L
authors.initials: JL
authors.lastname: Sun
authors.affiliation: Key Laboratory of Polar Materials and Devices, Ministry of Education, East China Normal University, Shanghai 200241, China.
authors.forename: C G
authors.initials: CG
authors.lastname: Duan
authors.affiliation: Unité Mixte de Physique, CNRS, Thales, Univ. Paris-Sud, Université Paris-Saclay, Palaiseau 91767, France.
authors.forename: M
authors.initials: M
authors.lastname: Bibes
authors.affiliation: Unité Mixte de Physique, CNRS, Thales, Univ. Paris-Sud, Université Paris-Saclay, Palaiseau 91767, France.
authors.forename: A
authors.initials: A
authors.lastname: Barthélémy
authors.affiliation: Laboratoire Structures, Propriétés et Modélisation des Solides, CentraleSupélec, CNRS-UMR8580, Université Paris-Saclay, Châtenay-Malabry 92295, France.
authors.forename: B
authors.initials: B
authors.lastname: Dkhil
authors.affiliation: Unité Mixte de Physique, CNRS, Thales, Univ. Paris-Sud, Université Paris-Saclay, Palaiseau 91767, France.
authors.forename: V
authors.initials: V
authors.lastname: Garcia
authors.affiliation: National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China.
authors.forename: X J
authors.initials: XJ
authors.lastname: Meng
authors.affiliation: National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China.|Key Laboratory of Polar Materials and Devices, Ministry of Education, East China Normal University, Shanghai 200241, China.
authors.forename: J H
authors.initials: JH
authors.lastname: Chu