title: Pr-based metallic glass films used as resist for phase-change lithography.
abstract: Metallic glass film of Pr60Al10Ni10Cu20is proposed to be used as a resist of phase-change lithography (PCL). PCL is a mask-less lithography technology by using laser-direct-writing to create the intended nanopatterns. Thermal distribution in the PrAlNiCu film after exposure is calculated by finite element method (FEM). Thin films are exposed by continuous-wave laser and selective etched by nitric-acid solution, and the patterns are discerned by optical and atomic force microscope. The etching rate of as-deposited PrAlNiCu is thus nearly five times of the crystalline film. These results indicate that PrAlNiCu metallic glass film is a promising resist for phase-change lithography.
authors.forename: Teng
authors.initials: T
authors.lastname: Luo
authors.forename: Zhen
authors.initials: Z
authors.lastname: Li
authors.forename: Qiang
authors.initials: Q
authors.lastname: He
authors.forename: Xiangshui
authors.initials: X
authors.lastname: Miao