title: Silicon photonic waveguide metrology using Mach-Zehnder interferometers.
abstract: We propose a procedure for characterizing fabrication deviations within a chip and among different chips in a wafer in silicon photonics technology. In particular, independent measurements of SOI thickness and waveguide width deviations can be mapped through the wafer, allowing a precise and non-destructive characterization of how these variations are distributed along the surface of the wafer. These deviations are critical for most wavelength-dependent integrated devices, like microring resonators, filters, etc. We also show that the technique allows for the characterization of proximity effects.
authors.forename: C J
authors.initials: CJ
authors.lastname: Oton
authors.forename: C
authors.initials: C
authors.lastname: Manganelli
authors.forename: F
authors.initials: F
authors.lastname: Bontempi
authors.forename: M
authors.initials: M
authors.lastname: Fournier
authors.forename: D
authors.initials: D
authors.lastname: Fowler
authors.forename: C
authors.initials: C
authors.lastname: Kopp